Antireflection film containing inorganic particles and manufacturing method thereof

1. An antireflection film comprising:

a hard coating layer; and

a low refractive index layer which is formed on one surface of the hard coating layer and includes a binder resin, and hollow inorganic nanoparticles and solid-type inorganic nanoparticles dispersed in the binder resin,

wherein at least 70% by volume of a total number of solid-type inorganic nanoparticles exists within 50% of a total thickness of the low refractive index layer from an interface between the hard coating layer and the low refractive index layer, and

wherein a ratio of a thickness of a shell layer of the hollow inorganic particles to a particle radius of the hollow inorganic particles is 0.3 or less, according to the following Equation 1:

Ratio of the thickness of the shell layer of the hollow inorganic nanoparticles to the particle radius of the hollow inorganic nanoparticles=(Thickness of the shell layer of the hollow inorganic nanoparticles)/(Radius of the hollow inorganic nanoparticles).  [Equation 1]

2. The antireflection film of claim 1 , wherein the thickness of the shell layer of the hollow inorganic nanoparticles is 0.1 nm to 60 nm.

3. The antireflection film of claim 1 , wherein the particle radius of the hollow inorganic nanoparticles is 35 nm to 100 nm.

4. The antireflection film of claim 1 , wherein at least 30% by volume of a total number of hollow inorganic nanoparticles exists farther from the interface between the hard coating layer and the low refractive index layer than the total number of solid-type inorganic nanoparticles in a thickness direction of the low refractive index layer.

5. The antireflection film of claim 1 , wherein at least 70% by volume of the total number of solid-type inorganic nanoparticles exists within 30% of the total thickness of the low refractive index layer from the interface between the hard coating layer and the low refractive index layer.

6. The antireflection film of claim 5 , wherein at least 70% by volume of a total number of hollow inorganic nanoparticles exists in a region where the total thickness of the low refractive index layer exceeds by 30% from the interface between the hard coating layer and the low refractive index layer.

7. The antireflection film of claim 1 , wherein the low refractive index layer comprises a first layer including at least 70% by volume of the total number of solid-type inorganic nanoparticles and a second layer including at least 70% by volume of a total number of hollow inorganic nanoparticles, and

wherein the first layer is positioned closer to the interface between the hard coating layer and the low refractive index layer than the second layer.

8. The antireflection film of claim 1 , wherein the antireflection film exhibits an average reflectivity of 0.8% or less in a visible light wavelength range of 380 nm to 780 nm.

9. The antireflection film of claim 1 , wherein a density of the solid-type inorganic nanoparticles is 0.50 g/cm 3 or more higher than a density of the hollow inorganic nanoparticles.

10. The antireflection film of claim 1 , wherein the solid-type inorganic nanoparticles have a radius of 0.5 nm to 100 nm.

11. The antireflection film of claim 1 , wherein the binder resin included in the low refractive index layer comprises a crosslinked (co)polymer between a (co)polymer of a photopolymerizable compound and a fluorine-containing compound containing a photoreactive functional group.

12. The antireflection film of claim 1 , wherein the hard coating layer comprises a binder resin including a photocurable resin; and an antistatic agent dispersed in the binder resin.

13. The antireflection film of claim 1 , further comprising a substrate bonded to an other surface of the hard coating layer.

14. A method for manufacturing the antireflection film of claim 1 , the method comprising the steps of: coating a resin composition for forming a low refractive index layer including a photocurable compound or a (co)polymer thereof, a fluorine-containing compound containing a photoreactive functional group, a photoinitiator, hollow inorganic nanoparticles and solid-type inorganic nanoparticles onto a hard coating layer and drying at a temperature of 35° C. to 100° C. to obtain a dried product; and

photocuring the dried product,

wherein ratio of a thickness of a shell layer of the hollow inorganic nanoparticles to a particle radius of the hollow inorganic particles is 0.3 or less according to the following Equation 1:

Ratio of thickness of the shell layer to radius of the hollow inorganic nanoparticles=(Thickness of the shell layer of the hollow inorganic nanoparticles)/(Radius of the hollow inorganic nanoparticles).  [Equation 1]

15. The method for manufacturing the antireflection film of claim 14 , wherein the thickness of the shell layer of the hollow inorganic nanoparticles is 0.1 nm to 60 nm.

16. The method for manufacturing the antireflection film of claim 14 , wherein the resin composition coated on the hard coating layer is dried at a temperature of 40° C. to 80° C.

17. The method for manufacturing the antireflection film of claim 14 , wherein the step of drying the resin composition coated on the hard coating layer at a temperature of 35° C. to 100° C. is performed for 10 seconds to 5 minutes.

18. The method for manufacturing the antireflection film of claim 14 , wherein a density of the solid-type inorganic nanoparticles is 0.50 g/cm 3 or more higher than a density of the hollow inorganic nanoparticles.

19. The method for manufacturing the antireflection film of claim 14 , wherein the solid-type inorganic nanoparticles have a density of 2.00 g/cm 3 to 4.00 g/cm 3 , and the hollow inorganic nanoparticles have a density of 1.20 g/cm 3 to 3.50 g/cm 3 .

20. The method for manufacturing the antireflection film of claim 14 , further comprising coating a polymer resin composition for forming a hard coating layer including a photocurable compound or a (co)polymer thereof, a photoinitiator and an antistatic agent onto a substrate and photocuring the same.