IP Library Granted Patent US 11,590,472
Granted Patent B2
US 11,590,472 · App. 15/753,312 · Granted Feb 28, 2023

Methods and compositions for on-demand release of ClO

Inventors: Nicholas Abbott (Madison, WI); Rishabh Jain (Appleton, WI); Kevin Nelson (Neenah, WI); David Busche (Neenah, WI); David Lynn (Middleton, WI)
Assignees: Wisconsin Alumni Research Foundation; Bemis Company, Inc.
B01J19/123A23B7/144A61L2/20B32B1/02B32B7/12B32B15/08B32B15/082B32B15/085B32B15/20B32B27/08B32B27/18B32B27/20B32B27/28B32B27/30B32B27/304B32B27/306B32B27/32B32B27/322B32B27/34B32B27/36B65D1/00B65D65/40B65D81/24C01B11/024C08K3/24C08L23/12A61L2202/11B01J2219/0879B01J2219/1203B32B2255/10B32B2255/20B32B2255/205B32B2264/10B32B2307/40B32B2307/50B32B2307/71B32B2307/7242B32B2307/7244B32B2307/7246B32B2307/732B32B2307/748B32B2315/00B32B2323/10B32B2405/00B32B2439/06B32B2439/46B32B2439/70B32B2439/80C08L2203/16
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Quick Facts
Patent No.
US 11,590,472
App. No.
15/753,312
Granted
Feb 28, 2023
Kind
B2
Abstract

Compositions and methods for generating ClO 2 gas are disclosed. A composition that includes a chlorite salt is activated by exposure to ultraviolet light. After an optional storage period, the composition is then exposed to moisture, resulting in the generation of ClO 2 gas. Exemplary compositions include polymers in which the chlorite salt is dispersed. The polymers may be used to form films that can be used to package, e.g., food products, pharmaceutical products, medical devices, and/or laboratory devices. Upon exposure to ultraviolet light and moisture, the packaging releases controlled quantities of ClO 2 gas, which may disinfect and/or deodorize the packaged device or product.

Claims (20)

1. A method for generating chlorine dioxide from a composition comprising a polymer and a plurality of chlorite ions disposed in the polymer, the method comprising:

exposing the composition to ultraviolet (UV) light; and

exposing the composition to moisture, wherein exposing the composition to moisture comprises exposing the composition to humidified gas having a relative humidity within the range of 60% to 100%,

wherein the composition does not generate a significant amount of chlorine dioxide when exposed to the UV light alone and does not generate a significant amount of chlorine dioxide when exposed to the humidified gas alone.

2. A method according to claim 1 , wherein exposing the composition to ultraviolet light comprises exposing the composition to UV light having a wavelength in the range of about 240 nm to 280 nm.

3. A method according to claim 1 , wherein the composition comprises less than 10% by weight of an energy-activated catalyst and comprises 2% or less by weight of an acid-releasing agent.

4. A method according to claim 1 , wherein the composition comprises less than 5% by weight of an energy-activated catalyst and comprises 1% or less by weight of an acid-releasing agent.

5. A method according to claim 1 , wherein the composition comprises less than 2% by weight of an energy-activated catalyst and comprises 1% or less by weight of an acid-releasing agent.

6. A method according to claim 1 , wherein the plurality of chlorite ions are present in the composition in the form of a chlorite salt.

7. A method according to claim 6 , wherein the chlorite salt is sodium chlorite or potassium chlorite.

8. A method according to claim 6 , wherein the composition comprises a weight ratio of an energy-activated catalyst to chlorite salt of 1:5 or less and comprises a weight ratio of an acid-releasing compound to chlorite salt of 1:10 or less.

9. A method according to claim 6 , wherein the composition comprises a weight ratio of an energy-activated catalyst to chlorite salt of 1:10 or less and comprises a weight ratio of an acid-releasing compound to chlorite salt of 1:50 or less.

10. A method according to claim 1 , wherein the step of exposing the composition to UV light and the step of exposing the composition to moisture are performed simultaneously.

11. A method according to claim 1 , wherein the step of exposing the composition to UV light is performed prior to the step of exposing the composition to moisture.

12. A method according to claim 11 , wherein the step of exposing the composition to UV light and the step of exposing the composition to moisture are separated by an intervening period of time, wherein the intervening period of time is at least one minute.

13. A method according to claim 1 , further comprising drying the composition so that the composition has the moisture content of less than 500 ppm.

14. A method according to claim 13 , wherein the drying occurs prior to the step of exposing the composition to UV light.

15. The method of claim 1 , wherein the amount of chlorine dioxide generated from the composition upon exposure to moisture alone or UV light alone is at least 20 times less than when the composition is exposed to both UV light and moisture.

16. The method of claim 1 , wherein the amount of chlorine dioxide generated from the composition upon exposure to moisture alone or UV light alone is at least 50 times less than when the composition is exposed to both UV light and moisture.

17. The method of claim 1 , wherein the amount of chlorine dioxide generated from the composition upon exposure to moisture alone or UV light alone is at least 100 times less than when the composition is exposed to both UV light and moisture.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 21, 2019
From: NELSON, KEVIN; BUSCHE, DAVID
To: BEMIS COMPANY, INC.
Reel/Frame 048066/0856 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 12, 2018
From: LYNN, DAVID; ABBOTT, NICHOLAS
To: WISCONSIN ALUMNI RESEARCH FOUNDATION
Reel/Frame 045515/0269 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 12, 2018
From: JAIN, RISHABH
To: WISCONSIN ALUMNI RESEARCH FOUNDATION; BEMIS COMPANY INC.
Reel/Frame 045515/0459 →
Continuity (2)
Provisional Application 62206464 · Aug 18, 2015
Related Publication 20180243456A1 · Aug 30, 2018