Gamma irradiation of ion exchange resins to remove or trap halogenated impurities

1. A method of producing a treated ion exchange resin material, comprising:

providing ion exchange resin having of organic impurities in a vessel comprising a pre-treatment solution and a void space; and

exposing the ion exchange resin, the pre-treatment solution, and the void space within the vessel to high energy radiation to produce a treated ion exchange resin material having reduced organic impurities and a treated void space having reduced volatile organic species.

2. The method of claim 1 , wherein the high energy radiation is gamma irradiation.

3. The method of claim 1 , wherein the pre-treatment solution is purified water.

4. The method of claim 2 , wherein a source of gamma irradiation is cobalt 60.

5. The method of claim 1 , further comprising washing the treated ion exchange resin material to remove at least some soluble organic impurities from the treated ion exchange resin material.

6. The method of claim 1 , wherein the organic impurities comprise one or more of organochloride compounds, organosulfonate compounds, and total organic carbon compounds.

7. The method of claim 6 , wherein the organic impurities are selected from the group consisting of:

and combinations thereof.

8. The method of claim 7 , wherein the high intensity radiation produces the treated ion exchange resin material comprising less than about 10,000 ion intensity counts of the compound of formula (1).

9. The method of claim 2 , wherein the gamma irradiation is in a range of about 1 Gy to about 1 MGy.

10. The method of claim 9 , wherein the gamma irradiation is in a range of about 0.1 KGy to about 1 MGy.

11. The method of claim 10 , wherein the gamma irradiation is in a range of about 25 KGy to about 75 KGy.