IP Library Granted Patent US 10,464,921
Granted Patent B2
US 10,464,921 · App. 15/760,738 · Granted Nov 5, 2019

Antifungal compound process

Inventors: David Dale Wirth (Oak Ridge, NC); Christopher M. Yates (Raleigh, NC); William J. Hoekstra (Durham, NC); Martin F. Bindl (Mannheim-Seckenheim, DE); Eduard Hartmann (Rodenbach, DE)
Assignee: Mycovia Pharmaceuticals, Inc.
C07D401/06B01J31/0244C07B53/00C07C303/44C07C309/30C07D213/30C07D453/02B01J2231/341C07B2200/07C07B2200/13
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Quick Facts
Patent No.
US 10,464,921
App. No.
15/760,738
Granted
Nov 5, 2019
Kind
B2
Abstract

The present invention relates to a process for preparing a compound of 5 or 5*, or a mixture thereof, that is useful as an antifungal agent. In particular, the invention seeks to provide new methodology for preparing compounds 7, 7* and 11, 11* and substituted derivatives thereof.

Claims (32)

1. A process to prepare a compound of Formula 1 or 1*, or mixture thereof:

the process comprising reacting a compound of Formula 2:

with nitromethane in the presence of a chiral catalyst of Formula 3:

wherein R 4 is H, optionally substituted alkyl, (C═O)-optionally substituted alkyl, (C═O)-optionally substituted aryl; and R 5 is H, optionally substituted alkyl, optionally substituted arylalkyl, or optionally substituted aryl;

to provide a compound of Formula 1 or 1*, or mixture thereof;

wherein each R is independently halo,

2. The process of claim 1 , further comprising enriching the enantiomeric purity of an enantiomeric compound mixture of Formula 1 and 1*, comprising:

(i) crystallizing said enantiomeric compound mixture with a chiral acid in a suitable solvent or solvent mixture, wherein:

the suitable solvent or solvent mixture is selected from acetonitrile, isopropanol, ethanol, water, methanol, or combinations thereof;

(ii) isolating the enantio-enriched chiral salt mixture; and

(iii) free-basing the enantio-enriched chiral salt mixture to provide the enantio-enriched compound mixture.

3. The process of claim 2 , further comprising reslurrying the enantio-enriched chiral salt mixture in a slurrying solvent or slurrying solvent mixture.

4. The process of claim 3 , wherein the slurrying solvent or slurrying solvent mixture is (a) acetonitrile or (b) a mixture of acetonitrile and methanol.

5. The process of claim 4 , wherein the mixture of acetonitrile and methanol comprises 80-90% acetonitrile and 10-20% methanol.

6. The process of claim 4 , wherein the mixture of acetonitrile and methanol comprises 80-90% acetonitrile and 10-20% methanol.

7. The process of claim 2 , wherein the chiral acid is selected from the group consisting of tartaric acid, di-benzoyltartaric acid, malic acid, camphoric acid, camphorsulfonic acid, ascorbic acid, and di-p-toluoyltartaric acid.

8. The process of claim 1 , wherein the chiral catalyst is

9. The process of claim 8 , wherein the mole percent of the chiral catalyst is selected from about 0.5-50, about 0.5-25, about 1-10, and about 5.

10. The process of claim 1 , wherein the number of equivalents of nitromethane is selected from about 1-25, about 5-15, and about 10.

11. The process of claim 1 , further comprising reducing a compound of Formula 1 or 1*, or mixture thereof:

to afford a compound of Formula 4 or 4*, or mixture thereof:

wherein each R is independently halo,

12. The process of claim 11 , further comprising enriching the enantiomeric purity of an enantiomeric compound mixture of Formula 1 and 1* and/or enriching the enantiomeric purity of an enantiomeric compound mixture of Formula 4 and 4*, comprising:

(i) crystallizing said enantiomeric compound mixture with a chiral acid in a suitable solvent or solvent mixture, wherein:

the suitable solvent or solvent mixture is selected from acetonitrile, isopropanol, ethanol, water, methanol, or combinations thereof;

(ii) isolating the enantio-enriched chiral salt mixture; and

(iii) free-basing the enantio-enriched chiral salt mixture to provide the enantio-enriched compound mixture.

13. The process of claim 11 , further comprising reslurrying the enantio-enriched chiral salt mixture in a slurrying solvent or slurrying solvent mixture.

14. The process of claim 12 , wherein the slurrying solvent or slurrying solvent mixture is (a) acetonitrile or (b) a mixture of acetonitrile and methanol.

15. The process of claim 13 , wherein the mixture of acetonitrile and methanol comprises 80-90% acetonitrile and 10-20% methanol.

16. The process of claim 14 , wherein the mixture of acetonitrile and methanol comprises 80-90% acetonitrile and 10-20% methanol.

17. The process of claim 12 , wherein the chiral acid is selected from the group consisting of tartaric acid, di-benzoyltartaric acid, malic acid, camphoric acid, camphorsulfonic acid, ascorbic acid, and di-p-toluoyltartaric acid.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 25, 2019
From: HOEKSTRA, WILLIAM J.; BINDL, MARTIN F.; HARTMANN, EDUARD; WIRTH, DAVID DALE; YATES, CHRISTOPHER M.
To: MYCOVIA PHARMACEUTICALS, INC.
Reel/Frame 049576/0132 →
Continuity (3)
Provisional Application 62220384 · Sep 18, 2015
Provisional Application 62275504 · Jan 6, 2016
Related Publication 20190194160A1 · Jun 27, 2019