Photocurable coating composition for forming low refractive layer
The present invention relates to a photocurable coating composition for forming a low refractive layer, a method for preparing an antireflection film using the photocurable coating composition, and an anti-reflective film prepared by using the photocurable coating composition. According to the present invention, a low refractive layer is formed of a photocurable coating composition containing two or more types of photo-polymerizable compounds, a photoinitiator, surface-treated hollow inorganic nanoparticles, and surface-treated solid inorganic nanoparticles.
1. A photocurable coating composition for forming a low refractive layer, comprising two types of photopolymerizable compounds, a fluorine-containing compound including a photoreactive functional group, a photoinitiator, surface-treated hollow inorganic nanoparticles, and surface-treated solid inorganic nanoparticles,
wherein at least one photopolymerizable compound of the two types of photopolymerizable compounds is 3-(meth)acryloxypropyltrimethoxysilane, 3-(meth)acryloxypropyltriethoxysilane, 3-(meth)acryloxypropylmethyldimethoxysilane, 3-acryloxypropyltrimethoxysilane, or 3-acryloxypropyldiethoxysilane,
wherein the surface-treated hollow inorganic nanoparticles are present in an amount of 197 parts by weight based on 100 parts by weight of the two types of photopolymerizable compounds,
wherein the fluorine-containing compound including a photoreactive functional group includes a silicon content of 0.1% to 20% by weight based on the fluorine-containing compound including photoreactive functional group,
wherein the fluorine-containing compound including a photoreactive functional group is present in an amount of 79 parts by weight based on 100 parts by weight of the two types of photopolymerizable compounds, and
wherein a weight ratio of the at least one photopolymerizable compound of the two types of photopolymerizable compounds and the other type photopolymerizable compound of the two types of photopolymerizable compound other than the at least one photopolymerizable compound of the two types of photopolymerizable compound is 1.1 to 1.0.
2. The photocurable coating composition of claim 1 , wherein a density of the surface-treated hollow inorganic nanoparticles is 1.96 g/cm 3 , and wherein a density of the surface-treated solid inorganic nanoparticles is 2.65 g/cm 3 .
3. A method for preparing an antireflection film comprising the steps of:
coating the photocurable coating composition of claim 1 on a hard coating layer;
drying the photocurable coating composition coated on the hard coating layer to produce a dried product; and
photocuring the dried product.
4. The method for preparing the antireflection film of claim 3 , wherein the coating and drying of the photocurable coating composition is carried out at 35° C. to 100° C.
5. An antireflection film comprising:
a hard coating layer; and
a low refractive layer formed on one surface of the hard coating layer and including a photo-cured product of the photocurable coating composition of claim 1 ,
wherein 70% by volume or more of the surface-treated solid inorganic nanoparticles relative to the total volume of the surface-treated solid nanoparticles in the low refractive layer are present within 50% of a total thickness of the low refractive layer from an interface between the hard coating layer and the low refractive layer.
6. The antireflection film of claim 5 , wherein 30% by volume or more of the surface-treated hollow inorganic nanoparticles relative to the total volume of the surface-treated hollow inorganic nanoparticles in the low refractive layer are present at a greater distance relative to the interface between the hard coating layer and the low refractive layer in a thickness direction of the low refractive layer than any surface-treated solid inorganic nanoparticles in the low refractive laver.
7. The antireflection film of claim 5 , wherein the low refractive layer includes a first layer and a second layer,
wherein the first layer containing 70% by volume or more of the total amount of the surface-treated solid inorganic nanoparticles relative to the total volume of the surface-treated solid inorganic nanoparticles in the low refractive laver,
wherein the second layer containing 70% by volume or more of the surface-treated hollow inorganic nanoparticles relative to the total volume of the surface-treated hollow inorganic nanoparticles in the low refractive layer, and
wherein the first layer of the low refractive layer is located closer to the interface between the hard coating layer and the low refractive layer than the second layer of the low refractive laver.
8. The antireflection film of claim 5 , wherein an average reflectance of the antireflection film is 0.7% or less in the visible light wavelength band region of 380 nm to 780 nm.
9. The antireflection film of claim 5 , wherein 70% by volume or more of the surface-treated solid inorganic nanoparticles relative to the total volume of the surface-treated solid inorganic nanoparticles in the low refractive layer are present within 30% of the total thickness of the low refractive layer from the interface between the hard coating layer and the low refractive layer.
10. The antireflection film of claim 9 , wherein 70% by volume or more of the surface-treated hollow inorganic nanoparticles relative to the total volume of the surface-treated hollow inorganic nanoparticles in the low refractive layer are present in a region exceeding 30% of the total thickness of the low refractive layer from the interface between the hard coating layer and the low refractive layer.