Activated gas generation apparatus and film-formation treatment apparatus

1. An activated gas generation apparatus comprising:

a first electrode constituent part;

a second electrode constituent part provided below said first electrode constituent part; and

an AC power supply part applying an AC voltage to said first and second electrode constituent parts,

said AC power supply part applying said AC voltage to form a discharge space between said first and second electrode constituent parts, and to generate an activated gas obtained by activating a source gas supplied to said discharge space,

wherein:

said first electrode constituent part includes a first dielectric electrode and a first metal electrode selectively formed on an upper surface of said first dielectric electrode;

said second electrode constituent part includes a second dielectric electrode and a second metal electrode selectively formed on a bottom surface of said second dielectric electrode;

a space where said first and second dielectric electrodes face each other is defined as a dielectric space, a region in said dielectric space where said first and second metal electrodes overlap each other in plan view is defined as said discharge space;

said second metal electrode includes a pair of second partial metal electrodes formed so as to face each other with a central region of said second dielectric electrode interposed therebetween in plan view, and said pair of second partial metal electrodes have a first direction as an electrode formation direction and a second direction intersecting with said first direction, the pair of second partial metal electrodes facing each other along said second direction;

said first metal electrode includes a pair of first partial metal electrodes including a region overlapping with said pair of second partial metal electrodes in plan view, and

said second dielectric electrode includes a gas spray hole in said central region for spraying said activated gas to an outside, and a central region step part protrudes upward in said central region; and

said central region step part has a shorter width in said second direction as approaching said gas spray hole in plan view without overlapping with said gas spray hole in plan view.

2. The activated gas generation apparatus according to claim 1 ,

wherein:

said gas spray hole includes a plurality of gas spray holes along said first direction in said central region; and

said central region step part has a shorter width in said second direction as approaching each of said plurality of gas spray holes in plan view.

3. The activated gas generation apparatus according to claim 2 , wherein

a gap length in said discharge space is defined by a height of said central region step part.

4. The activated gas generation apparatus according to claim 3 ,

wherein:

said second dielectric electrode further includes a pair of end region step parts that protrude upward on both end sides in said first direction;

said pair of end region step parts extend in said second direction in plan view over an entire length in said second direction of said second dielectric electrode; and

the gap length in said discharge space is defined by the height of said central region step part and heights of said pair of end region step parts.

5. The activated gas generation apparatus according to claim 2 , wherein

a non-discharge distance which is a distance in said second direction from said discharge space to said plurality of gas spray holes is set to 10 mm or more.

6. The activated gas generation apparatus according to claim 5 , wherein

planar shapes of said first and second metal electrodes are provided such that a shortest distance in plan view between said discharge space and said central region step part is equal to or greater than a predetermined reference distance.

7. The activated gas generation apparatus according to claim 1 , wherein

planar shapes of said first and second metal electrodes are partially different from each other.

8. The activated gas generation apparatus according to claim 1 , wherein

a gas contact region which is a region in contact with the activated gas in said first and second electrode constituent parts is formed of quartz, alumina, silicon nitride or aluminum nitride as a constituent material.

9. The activated gas generation apparatus according to claim 1 , wherein

said source gas is a gas containing at least one of nitrogen, oxygen, fluorine, and hydrogen.

10. The activated gas generation apparatus according to claim 2 , wherein

shapes of said plurality of gas spray holes are set to be different from each other among said plurality of gas spray holes.

11. The activated gas generation apparatus according to claim 2 , wherein:

shapes of said plurality of gas spray holes are set to be equal to each other;

said second dielectric electrode further includes a plurality of separation step parts coupled to said central region step part and protrude upward;

said plurality of separation step parts extend in said second direction;

a gap length in said discharge space is defined by heights of said plurality of separation step parts; and

said plurality of separation step parts are formed such that said dielectric space is separated for each of said plurality of gas spray holes.

12. An activated gas generation apparatus comprising:

a first electrode constituent part;

a second electrode constituent part provided below said first electrode constituent part; and

an AC power supply part applying an AC voltage to said first and second electrode constituent parts,

said AC power supply part applying said AC voltage to form a discharge space between said first and second electrode constituent parts, and to generate an activated gas obtained by activating a source gas supplied to said discharge space,

wherein:

said first electrode constituent part includes a first dielectric electrode and a first metal electrode selectively formed on an upper surface of said first dielectric electrode;

said second electrode constituent part includes a second dielectric electrode and a second metal electrode selectively formed on a bottom surface of said second dielectric electrode;

a space where said first and second dielectric electrodes face each other is defined as a dielectric space, a region in said dielectric space where said first and second metal electrodes overlap each other in plan view is defined as said discharge space;

said first metal electrode includes a pair of first partial metal electrodes face each other with a central region of said first dielectric electrode interposed therebetween in plan view;

said pair of first partial metal electrodes have a first direction as an electrode formation direction and a second direction intersecting with said first direction, the first partial metal electrodes facing each other along said second direction;

said second metal electrode includes a pair of second partial metal electrodes including a region overlapping with said pair of first partial metal electrodes in plan view;

said second dielectric electrode includes a plurality of gas spray holes along said first direction in a region corresponding to said central region in plan view and each spraying said activated gas to an outside;

said first dielectric electrode includes a central region step part downward in said central region;

said central region step part overlaps all of said plurality of gas spray holes in plan view; and

a first space below said central region step part in said dielectric space is narrower than a second space outside said central region.

13. The activated gas generation apparatus according to claim 12 ,

wherein:

said first dielectric electrode further includes a pair of end region step parts protrude downward on both end sides in said first direction;

said pair of end region step parts extend in said second direction over an entire length of said first dielectric electrode in said second direction; and

a gap length in said discharge space is defined by heights of said pair of end region step parts.

14. A film-formation treatment apparatus comprising:

the activated gas generation apparatus according to claim 1 ; and

a film formation treatment chamber disposed below said second electrode constituent part and subjecting a substrate to be treated therein to a film formation treatment using an activated gas,

wherein said film formation treatment chamber is disposed so as to directly receive said activated gas sprayed from said gas spray hole of said activated gas generation apparatus.

15. The film-formation treatment apparatus according to claim 14 , wherein:

a pressure of said discharge space in said activated gas generation apparatus is set to 10 kPa to an atmospheric pressure; and

a pressure in said film formation treatment chamber is set to be equal to or lower than the pressure of said discharge space.