Monolithic electrochromic window manufacturing methods

1. A method of forming an electrochromic (EC) pane unit, comprising:

forming a first conductive layer on a first substrate via a solution deposition process;

forming a first electrically conductive barrier layer on first conductive layer via a sol-gel process or by depositing barrier layer precursors;

forming a first electrode on the first electrically conductive barrier layer via a solution deposition process;

forming an electrolyte layer on the first electrode via a sol-gel process;

forming a second electrode on the electrolyte layer via a solution deposition process;

forming a second electrically conductive barrier layer on the second electrode via a sol-gel process or by depositing barrier layer precursors; and

forming a second conductive layer on the second electrically conductive barrier layer via a solution deposition process;

optionally attaching the first substrate to a second substrate; and

forming a low-emissive layer configured to reduce ultraviolet light transmission through the EC pane unit, on one of the first and second substrates, wherein:

the first electrically conductive barrier layer is configured to prevent electrochemical reactions between the first conductive layer and the first electrode; and

the second electrically conductive barrier layer is configured to prevent electrochemical reactions between the second conductive layer and the second electrode.

2. The method of claim 1 , wherein the electrolyte layer comprises tantalum oxide or lithium phosphorus oxynitride.

3. The method of claim 1 , further comprising curing at least one of the first electrode, the electrolyte layer, and the second electrode, using a thermal process.

4. The method of claim 3 , wherein:

the first and second electrodes are different ones of a working electrode and a counter electrode; and

the working electrode is configured to assume a bright state and a dark state, the dark state having a lower visible light transmittance than the bright state.

5. The method of claim 1 , wherein the first and second conductive layers comprise metallic nanowires and are substantially transparent to visible radiation.

6. The method of claim 5 , wherein the nanowires of each of the first and second electrodes are disposed in the form of a mesh or grid.

7. The method of claim 5 , wherein nanowires comprise silver or gold nanowires.

8. The method of claim 1 , further comprising:

curing the first conductive layer using a thermal process, prior to forming the first electrode; and

curing the second conductive layer using a thermal process.

9. The method of claim 1 , further comprising:

attaching the first substrate to the second substrate using a sealing separator, such that an internal space is formed between the first substrate and the second substrate.

10. The method of claim 9 , further comprising evacuating the internal space or filling the internal space with an inert gas.