Use of silyl bridged alkyl compounds for dense OSG films

1. A chemical vapor deposition method for depositing an organosilicate film on at least a part of a substrate, the process comprising the steps of:

providing a substrate within a vacuum chamber;

introducing into the vacuum chamber a gaseous structure forming composition comprising at least one organosilicon precursor selected from the group consisting of Formula (I) and Formula (II):

wherein,

R 1 , R 2 , R 3 , R 4 , R 5 , and R 6 are each independently selected from the group consisting of —CH 3 and —OR 8 , wherein R 8 is a C 1 -C 4 alkyl group;

R 7 is H or —CH 3 ;

x is 1 or 2; and

n is 1, 2, 3, or 4, wherein at least one R 7 is —CH 3 when n is 1;

applying energy to the gaseous structure forming composition in the vacuum chamber to induce reaction of the at least one organosilicon precursor to deposit a film on at least a portion of the substrate.

2. The chemical vapor deposition method of claim 1 wherein the film has a dielectric constant between 2.8 and 3.5.

3. The method of claim 2 wherein the film has a Young's modulus greater than 20 GPa and/or a nanoindentation hardness greater than 3.5 GPa.

4. The chemical vapor deposition method of claim 1 wherein the energy is plasma energy.

5. The chemical vapor deposition method of claim 1 further comprising the step of subjecting the film to a post treatment comprising UV radiation.

6. The chemical vapor deposition method of claim 5 wherein the film has a dielectric constant between 2.8 and 3.5.

7. The chemical vapor deposition method of claim 5 where the UV treatment is carried out at elevated temperatures preferably 200-500° C.

8. The chemical vapor deposition method of claim 5 where the UV treatment is carried out in a reactive environment comprising at least one selected from the group consisting of O 2 , H 2 , and NH 3 .

9. The method of claim 5 wherein the film has a Young's modulus greater than 20 GPa and/or a nanoindentation hardness greater than 3.5 GPa.

10. The chemical vapor deposition method of claim 1 further comprising the step of subjecting the film to a post treatment comprising heat.

11. The chemical vapor deposition method of claim 1 wherein the at least one organosilicon precursor is a precursor of Formula (I).

12. The chemical vapor deposition method of claim 11 wherein the at least one organosilicon precursor is at least one precursor selected from the group consisting of 1,1,1,3,3-pentamethoxy-2-methyl-1,3-disilabutane (PMOM-DSB), 1,2-bis(methyldimethoxysilyl)ethane,1,2-bis(trimethoxysilyl)ethane, 1,2-bis(dimethoxysilyl)ethane, 1,1-bis(trimethoxysilyl)ethane, 1,1-bis(methyldimethoxysilyl)ethane, 1,1-bis(dimethoxysilyl)ethane, 1,1-dimethyl-1,1-bis(trimethoxysilyl)methane, 1,1-dimethyl-1,1-bis(methyldimethoxysilyl)methane, 1,1-dimethyl-1,1-bis(dimethoxysilyl)methane, 1,1,1,3,3-pentaethoxy-2-methyl-1,3-disilabutane, 1,2-bis(methyldiethoxysilyl)ethane, 1,2-bis(triethoxysilyl)ethane, 1,2-bis(diethoxysilyl)ethane, 1,1-bis(triethoxysilyl)ethane, 1,1-bis(methyldiethoxysilyl)ethane, 1,1-bis(diethoxysilyl)ethane, 1,1-dimethyl-1,1-bis(triethoxysilyl)methane, 1,1-dimethyl-1,1-bis(methyldiethoxysilyl)methane, and 1,1-dimethyl-1,1-bis(diethoxysilyl)methane.

13. The chemical vapor deposition method of claim 1 wherein the at least one organosilicon precursor is a precursor of Formula (II).

14. The chemical vapor deposition method of claim 13 wherein the at least one organosilicon precursor is at least one precursor selected from the group consisting of 1,1,3,3-tetramethoxy-1,3-disilacyclobutane, 1,3-dimethoxy-1,3-dimethyl-1,3-disilacyclobutane, 1,3-diemthoxy-1,3-disilacyclobutane, 1,3,3-trimethoxy-1-methyl-1,3-disilacyclobutane, 1,3-dimethoxy-1-methyl-disilacyclobutane, 1,1-dimethoxy-1,3-disilacyclobutane, 1,1,4,4-tetramethoxy-1,4-disilacyclohexane, 1,4-dimethoxy-1,4-dimethyl-1,4-disilacyclohexane, 1,4-diemthoxy-1,4-disilacyclohexane, 1,4,4-trimethoxy-1-methyl-1,4-disilacyclohexane, 1,4-dimethoxy-1-methyl-disilacyclohexane, 1,1-dimethoxy-1,4-disilacyclohexane,1,1,3,3-tetraethoxy-1,3-disilacyclobutane, 1,3-diethoxy-1,3-dimethyl-1,3-disilacyclobutane, 1,3-diemthoxy-1,3-disilacyclobutane, 1,3,3-triethoxy-1-methyl-1,3-disilacyclobutane, 1,3-diethoxy-1-methyl-disilacyclobutane, 1,1-diethoxy-1,3-disilacyclobutane,1,1,4,4-tetraethoxy-1,4-disilacyclohexane,1,4-diethoxy-1,4-dimethyl-1,4-disilacyclohexane, 1,4-diemthoxy-1,4-disilacyclohexane, 1,4,4-triethoxy-1-methyl-1,4-disilacyclohexane,1,4-diethoxy-1-methyl-disilacyclohexane, and 1,1-diethoxy-1,4-disilacyclohexane.

15. The chemical vapor deposition method of claim 1 wherein the at least one organosilicon precursor is free of halide ions, Al 3+ ions, Fe 2+ ions, Fe 3+ ions, Ni 2+ ions, and Cr 3+ ions.

16. The chemical vapor deposition method of claim 15 wherein the halide ions include chlorides, fluorides, bromides, and iodides.

17. The chemical vapor deposition method of claim 1 wherein the method is a plasma enhanced chemical vapor deposition method.

18. The chemical vapor deposition method of claim 1 wherein the method is a thermal chemical vapor deposition method.

19. The chemical vapor deposition method of claim 1 wherein the substrate is a silicon wafer.

20. The chemical vapor deposition method of claim 1 wherein the film has one or more bond types selected from the group consisting of Si—O—C, Si—O—Si, Si—C, Si—F, Si—H, C—O, C—H, and C—F.

21. The chemical vapor deposition method of claim 1 wherein the one or more reactive substances are selected from the group consisting of a gaseous or liquid organic substance, ammonia, hydrogen, carbon dioxide, carbon monoxide, a fluorocarbon, and mixtures thereof.

22. A film formed by the method of claim 1 .

23. The film of claim 22 wherein said film has a density of 1.8 g/cc or greater.

24. The film of claim 23 wherein said film has a density of 2.0 or greater.

25. The film of claim 24 wherein said film has a dielectric constant of 2.5 to 3.5 and a Young's modulus greater than 20 GPa and/or a nanoindentation hardness greater than 3.5 GPa.