Embedding an optically-detectable pattern of information in an electrical element
An electrical element is fabricated including an optically-detectable pattern of embedded information. An initial physical design is received for an electrical element that performs an electrical function, together with a pattern of information to be embedded in the electrical element. An encoding region is designated within the initial physical design of the electrical element. Information-encoding patterns are determined for one or more thin-film layers in the encoding region to form an optical layer structure that encodes the pattern of information. The initial physical design and the information-encoding patterns are combined into a modified physical design which is used to fabricate the electrical element. The fabricated electrical element performs the electrical function and forms an optically-detectable interference image including the embedded pattern of information when illuminated by incident light.
1. A method for fabricating an electrical element with an optically-detectable pattern of embedded information, comprising:
receiving an initial physical design for the electrical element that performs an electrical function, the physical design including patterns corresponding to a desired structure for each of a plurality of functional thin-film layers, each functional thin film layer having a specified thin-film material;
receiving a pattern of information to be embedded in the electrical element;
designating an encoding region within the initial physical design of the electrical element;
determining an information-encoding pattern for each of one or more thin-film layers in the encoding region to form an optical layer structure that encodes the pattern of information corresponding to at least a portion of the optically-detectable pattern of embedded information;
combining the initial physical design and information-encoding patterns into a modified physical design; and
fabricating the electrical element by patterning functional thin-film layers on a substrate in accordance with the modified physical design;
wherein the fabricated electrical element performs the electrical function and includes the optical layer structure in the encoding region that encodes the pattern of information, wherein one or more of the thin-film layers in the optical layer structure is at least partially transparent; and
wherein at least one of the thin-film layers in the encoding region contributes to providing the electrical function of the electrical element.
2. The method of claim 1 , wherein the optically-detectable pattern of embedded information forms an optically-detectable interference image having spatially-varying spectral characteristics when illuminated by incident light.
3. The method of claim 2 , wherein the optically-detectable interference image includes one or more text characters, one or more graphical elements, a bar code pattern, or a photographic image.
4. The method of claim 2 , wherein the optically-detectable interference image is a binary pattern having two image states, each image state having associated image color when illuminated by the incident light.
5. The method of claim 4 , wherein a halftoning process is used to create an appearance of intermediate image colors between the image colors associated with the two image states.
6. The method of claim 2 , wherein the optically-detectable interference image is a multi-color pattern having three or more image states, each image state having an associated image color when illuminated by the incident light.
7. The method of claim 6 , wherein a color halftoning process is used to create an appearance of intermediate image colors between the image colors associated with the three or more image states.
8. The method of claim 1 , wherein each of the thin-film layers in the encoding region that encode the pattern of information corresponds to one of the thin-film layers in the physical design.
9. The method of claim 1 , wherein the information encoding-pattern does not affect the electrical function of the electrical element.
10. The method of claim 1 , wherein the information encoding-pattern affects the electrical function of the electrical element.
11. The method of claim 1 , wherein the optical layer structure has a top layer, and wherein the top layer is not one of the thin-film layers in the optical layer structure that include the information-encoding pattern.
12. The method of claim 1 , wherein the thin-film layers include an electrically conductive layer, a semiconductor layer or a dielectric layer.
13. The method of claim 1 , wherein the electrical element is a transistor, resistor, a capacitor, a diode or a conductive trace.
14. The method of claim 1 , wherein one or more of the thin-film layers are applied using an atomic layer deposition process.
15. The method of claim 1 , wherein at least one of the thin-film layers in the optical layer structure is reflective.
16. The method of claim 15 , wherein at least one of the thin-film layers in the optical layer structure that includes the information-encoding pattern is at least partially transparent and is located between the reflective thin-film layer and a top surface of the optical layer structure.
17. The method of claim 1 , wherein at least one of the thin-film layers in the optical layer structure that includes the information-encoding pattern is at least partially transparent.
18. The method of claim 1 , wherein the optical layer structure includes at least two layers that are partially transparent.
19. The method of claim 1 , wherein the optical layer structure includes first and second partially-transparent layers of a same material, wherein the first partially-transparent layer of the same material includes an information-encoding pattern and the second partially-transparent layer of the same material is in contact with the first partially-transparent layer of the same material.