Uniform laser direct writing for waveguides
A waveguide includes a segment with a substantially uniform cure profile and related methods and systems for making and using the same. The waveguide is formed by modifying a laser beam used to write the waveguide to provide a substantially uniform cure profile in the waveguide. A marker characteristic of laser writing may be present in the waveguide. A method or system modifies an intensity profile or a shape profile of a laser beam to proactively compensate for exposure convolution based on the characteristics of the laser beam spot profile. A convolution compensator is positioned in the path of the laser beam to modify the beam spot profile during writing to form the one or more segments of the waveguide in a photo-curable layer.
1. A method comprising:
tracing a waveguide segment in a photo-curable layer with a laser beam, the laser beam defining a non-uniform spot profile having at least one of a variable intensity profile and a variable width shape profile;
passing the laser beam through a convolution compensator configured to dynamically modify at least a portion of the laser beam in response to at least one of the variable intensity profile and the variable width shape profile of the non-uniform spot profile to define a modified beam portion of the laser beam and a modified spot profile different than the spot profile; and
curing the photo-curable layer along the waveguide segment with the modified beam portion of the laser beam having the modified spot profile.
2. The method of claim 1 , wherein the modified spot profile compensates for exposure convolution during the tracing step and curing results in a waveguide segment having a substantially uniform cure profile.
3. The method of claim 1 , comprising:
tracing a linear waveguide segment in the photo-curable layer with the laser beam; and
curing the photo-curable layer along the linear waveguide segment with the modified beam portion of the laser beam having the modified spot profile.
4. The method of claim 1 , comprising:
tracing a non-linear waveguide segment in the photo-curable layer with the laser beam; and
curing the photo-curable layer along the linear waveguide segment with the modified beam portion of the laser beam having the modified spot profile.
5. The method of claim 1 , comprising modifying the spot profile with the convolution compensator to modify at least one of:
the variable intensity profile with a reconfigurable filter of the convolution compensator; and
the variable width shape profile with an adaptive lens of the convolution compensator.
6. The method of claim 5 , comprising cooperatively modifying both the variable intensity profile and the variable width shape profile.
7. The method of claim 1 , wherein the modified spot profile defines a modified intensity profile that decreases intensity from at least one outer portion to a central portion along a spot profile width.
8. The method of claim 1 , wherein the variable width shape profile of an unmodified portion of the laser beam has a first width variation, wherein the modified spot profile of the modified portion of the laser beam defines a modified width shape profile having a second width variation less than the first width variation.
9. The method of claim 1 , wherein the modified laser beam spot profile defines a rounded polygonal shape profile.
10. The method of claim 1 , comprising:
tracing a transition waveguide segment adjacent to the waveguide segment defining a different cross-sectional geometric height profile than a cross-sectional geometric height profile of the waveguide segment.
11. A method comprising:
tracing a waveguide segment in a photo-curable layer with a laser beam, the laser beam defining a non-uniform spot profile having at least one of a variable intensity profile and a variable width shape profile, the waveguide segment defining a first bend radius;
passing the laser beam through a convolution compensator to modify at least a portion of the laser beam in response to at least one of the variable intensity profile and the variable width shape profile of the non-uniform spot profile to define a modified beam portion of the laser beam and a modified spot profile different than the spot profile;
curing the photo-curable layer along the waveguide segment with the modified beam portion of the laser beam having the modified spot profile;
tracing another waveguide segment defining a second bend radius with the laser beam, wherein the second bend radius is different than the first bend radius;
passing the laser beam through the convolution compensator to modify at least a portion of the laser beam in response to at least one of an intensity profile, a shape profile of the non-uniform spot profile, and the second bend radius to define another modified beam portion of the laser beam and another modified spot profile different than the spot profile; and
curing the photo-curable layer along the waveguide segment with the another modified beam portion of the laser beam having the another modified spot profile.
12. The method of claim 11 , comprising:
tracing a transition waveguide segment disposed between the waveguide segment and the another waveguide segment defining a different cross-sectional geometric height profile than cross-sectional geometric height profiles of the waveguide segment and the another waveguide segment.
13. The method of claim 11 , wherein a second substantially uniform cure profile of the another waveguide segment substantially matches a substantially uniform cure profile of the waveguide segment.
14. A method comprising:
tracing a waveguide segment in a photo-curable layer with a laser beam, the laser beam defining a non-uniform spot profile having at least one of a variable intensity profile and a variable width shape profile;
passing the laser beam through a convolution compensator configured to dynamically modify at least a portion of the laser beam in response to at least one of the variable intensity profile and the variable width shape profile of the non-uniform spot profile to define a modified beam portion of the laser beam and a modified spot profile different than the spot profile; and
curing the photo-curable layer along the waveguide segment with the modified beam portion of the laser beam having the modified spot profile,
wherein a cross-sectional geometric height profile of the waveguide segment comprises a non-uniform height portion defining a rounded edge.
15. The method of claim 14 , wherein the cross-sectional geometric height profile of the waveguide segment comprises a uniform height portion adjacent to the non-uniform height portion.
16. The method of claim 14 , wherein the waveguide segment defines segment width between segment sides of a cross-section of the waveguide segment and extending parallel to a linear base edge of the waveguide segment, wherein the segment sides are substantially parallel.
17. The method of claim 16 , wherein the segment sides define a variation in distance less than or equal to 5% of a maximum width between the segment sides.
18. The method of claim 16 , wherein the cross-sectional geometric height profile reduces in height adjacent to the segment sides.
19. The method of claim 16 , wherein the cross-sectional geometric height profile defines two non-uniform height portions each adjacent to a different segment side.
20. The method of claim 16 , wherein the cross-sectional geometric height profile defines a maximum height toward a center of the profile.