Method for manufacturing a photovoltaic module and photovoltaic module thus obtained

1. A method for manufacturing a photovoltaic module, comprising at least two electrically connected photovoltaic cells, the method comprising the following steps:

a) providing an electrically insulating substrate covered with a layer of a first electrically conducting material;

b) forming, on said layer, at least one furrow defining first and second lower electrodes, electrically isolated from one another by said furrow;

c) forming, on each of said lower electrodes, a stack comprising at least: an upper electrode formed by a layer of a second electrically conducting material, and a layer of a photo-active material positioned between the lower and upper electrodes, wherein each of the first and second lower electrodes respectively forming a first and second photovoltaic cell with the corresponding stack; and

d) forming an electrical connection between the upper electrode of the first photovoltaic cell and the second lower electrode;

the method being characterized in that it comprises the following steps, between steps b) and c):

e) forming a first electrically insulating strip in the furrow and above said furrow, said strip forming a relief relative to the first and second lower electrodes; and

f) forming a second electrically insulating strip on the second lower electrode, said first and second electrically insulating strips being substantially parallel and delimiting an inactive area on said second lower electrode;

in that the stack formed in step c) on the second photovoltaic cell is positioned outside the inactive area.

2. The method according to claim 1 , wherein a width of the inactive area is comprised between 0.1 mm and 2 mm.

3. The method according to claim 1 , wherein:

at least the first electrically insulating strip is formed by deposition, on the furrow and on the first electrically conducting material, of a first liquid formulation of insulating material, followed by a passage to the solid state of said first formulation;

the layer of the first electrically conducting material covering the substrate has a first surface energy (γ S1 );

the deposition of the first liquid formulation creates a first interface with said first electrically conducting material, the first surface tension (T S1 ) of said first interface being lower than said first surface energy (γ S1 ); and

a difference between said first surface energy and said first surface tension preferably being comprised between 0.015 N.m −1 and 0.025 N.m −1 .

4. The method according to claim 1 , wherein step d) comprises depositing a layer of a third electrically conducting material between the upper electrode of the first photovoltaic cell and the second lower electrode of the second photovoltaic cell, above the first electrically insulating strip.

5. The method according to claim 4 , wherein:

the first electrically insulating strip has a second surface energy (γ S2 );

the third layer of electrically conducting material is formed by depositing a second liquid formulation, creating a second interface with said first electrically insulating strip, a second surface tension (T S2 ) of said second interface being lower than said second surface energy (γ S2 );

a difference between said second surface energy and said second surface tension preferably being greater than 0.015 N.m −1 .

6. The method according to claims 3 , wherein the first liquid formulation of insulating material comprises at least one polymer and at least one surfactant,

the at least one polymer preferably being prepared with a base of compounds chosen from among amines, acrylates, epoxides, urethanes and mixtures thereof, and

the at least one surfactant preferably being a fluorinated compound.

7. The method according to claim 1 , wherein at least one of the layers of second electrically conducting material and photo-active material is formed by a coating or printing technique using a continuous wet method, preferably chosen from among slot-die, photogravure and flexography.

8. The method according to claim 1 , wherein step d) is carried out at the same time as the deposition of the layer of the second electrically conducting material of step c), the third electrically conducting material being identical to said second electrically conducting material.

9. The method according to claim 1 , wherein the upper electrode and the electrical connection are formed from an electrically conducting material transparent to visible light.

10. The method according to claim 4 , wherein a thickness of the layer of third electrically conducting material is smaller than 1 μm and preferably smaller than 600 nm.