IP Library Granted Patent US 10,297,412
Granted Patent B2
US 10,297,412 · App. 15/846,752 · Granted May 21, 2019

High reliability, long lifetime, negative ion source

Inventors: Joseph D. Sherman (Santa Fe, NM); Evan R. Sengbusch (Verona, WI); Ross F. Radel (Madison, WI); Arne V. Kobernik (Madison, WI); Tye T. Gribb (Fitchburg, WI); Preston J. Barrows (Madison, WI); Christopher M. Seyfert (Ridgeway, WI); Logan D. Campbell (Madison, WI); Daniel J. Swanson (Madison, WI); Eric D. Risley (Middleton, WI); Jin W. Lee (Madison, WI); Kevin D. Meaney (Green Bay, WI)
Assignee: PHOENIX LLC
H01J27/028H01J27/024H01J27/16H01J27/18H01J27/22H01J37/08
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Quick Facts
Patent No.
US 10,297,412
App. No.
15/846,752
Granted
May 21, 2019
Kind
B2
Abstract

A negative ion source includes a plasma chamber, a microwave source, a negative ion converter, a magnetic filter and a beam formation mechanism. The plasma chamber contains gas to be ionized. The microwave source transmits microwaves to the plasma chamber to ionize the gas into atomic species including hyperthermal neutral atoms. The negative ion converter converts the hyperthermal neutral atoms to negative ions. The magnetic filter reduces a temperature of an electron density provided between the plasma chamber and the negative ion converter. The beam formation mechanism extract the negative ions.

Claims (21)

1. A negative ion source comprising:

a plasma chamber containing a gas to be ionized;

a microwave source configured to transmit microwaves to the plasma chamber to ionize the gas into atomic species including hyperthermal neutral atoms;

a negative ion source converter configured to convert the hyperthermal neutral atoms to negative ions;

a magnetic filter configured to reduce the temperature of electrons between the plasma chamber and the negative ion source converter; and

a beam formation mechanism configured to extract the negative ions.

2. The negative ion source of claim 1 , wherein the plasma chamber has a high voltage and the microwave source is at ground potential.

3. The negative ion source of claim 1 , further comprising a waveguide configured to electrically isolate the plasma chamber and the microwave source, the waveguide comprising a flange configured to allow a break in the waveguide to be insulated with air.

4. The negative ion source of claim 3 , wherein a plurality of waveguides are used to electrically isolate the plasma chamber and the microwave source.

5. The negative ion source of claim 1 , wherein the gas to be ionized is hydrogen and the hyperthermal neutral atoms produced are hyperthermal neutral hydrogen atoms.

6. The negative ion source of claim 1 , wherein the microwave source comprises a 2.45 GHz microwave source.

7. The negative ion source of claim 1 , wherein the negative ion source converter comprises a cone-shaped cesiated surface.

8. The negative ion source of claim 1 , wherein the magnetic filter comprises a tunable magnetic dipole field provided circumferentially around a junction between the plasma chamber the negative ion converter.

9. The negative ion source of claim 1 , wherein the beam formation mechanism extracts the negative ions at a voltage of 30 kV.

10. A method of producing negative ions, the method comprising:

providing a gas to be ionized in a plasma chamber;

transmitting microwaves from a microwave source to the plasma chamber to ionize the gas such that hyperthermal neutral atoms of the gas are produced;

converting the hyperthermal neutral atoms to negative ions via an interaction with a negative ion source converter; and

extracting the negative ions with a beam formation mechanism.

11. The method of claim 10 , further comprising reducing a temperature of an electron density provided between the plasma chamber and the negative ion source converter with a magnetic filter.

12. The method of claim 10 , further comprising electrically isolating the plasma chamber and the microwave source with a waveguide comprising a flange configured to allow a break in the waveguide to be insulated with air.

Assignments (6)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 16, 2022
From: PHOENIX, LLC
To: SHINE TECHNOLOGIES, LLC
Reel/Frame 061123/0867 →
CONFIRMATORY LICENSE Recorded Mar 30, 2022
From: PHOENIX NUCLEAR LABS, LLC
To: UNITED STATES DEPARTMENT OF ENERGY
Reel/Frame 059448/0290 →
CHANGE OF NAME Recorded Oct 15, 2021
From: SHINE MEDICAL TECHNOLOGIES, LLC
To: SHINE TECHNOLOGIES, LLC
Reel/Frame 057827/0923 →
SECURITY INTEREST Recorded May 4, 2021
From: PHOENIX LLC; PHOENIX NEUTRON IMAGING LLC
To: DEERFIELD MANAGEMENT COMPANY, L.P.
Reel/Frame 056123/0334 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 26, 2018
From: PHOENIX NUCLEAR LABS LLC
To: PHOENIX LLC
Reel/Frame 045350/0500 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 22, 2018
From: SHERMAN, JOSEPH D.; SENGBUSCH, EVAN R.; RADEL, ROSS F.; KOBERNIK, ARNE V.; GRIBB, TYE T.; BARROWS, PRESTON J.; SEYFERT, CHRISTOPHER M.; CAMPBELL, LOGAN D.; SWANSON, DANIEL J.; RISLEY, ERIC D.; LEE, JIN W.; MEANEY, KEVIN D.
To: PHOENIX NUCLEAR LABS LLC
Reel/Frame 045312/0728 →
Continuity (3)
Continuation 14903747
Provisional Application 61844054 · Jul 9, 2013
Related Publication 20180122615A1 · May 3, 2018