Light emitting element display device
A display device includes two or more transistors in one pixel, and the two or more transistors include a first transistor of which a channel semiconductor layer is polycrystalline silicon, and a second transistor of which a channel semiconductor layer is an oxide semiconductor.
1. A display device comprising:
a plurality of pixels arranged in matrix, each of the pixels including a first poly crystalline silicon layer, a second poly crystalline silicon layer, a first predetermined layer, a second predetermined layer, a first metal electrode, a second metal electrode, a third metal electrode, and an organic emitting element, each of the pixels sharing a first insulation layer, a second insulation layer, and a third insulation layer in the plurality of pixels,
wherein, each of the pixels has a lamination construction including:
the first poly crystalline silicon layer on the substrate;
the second poly crystalline silicon layer on the substrate;
the first insulation layer on the first poly crystalline silicon layer and the second poly crystalline silicon layer;
the first and second metal electrodes and the second predetermined layer on the first insulation layer;
the second insulation layer on the first and second metal electrodes;
the first predetermined layer on the second insulation layer;
the third insulation layer on the first predetermined layer and the second predetermined layer;
the third metal electrode on the third insulation layer; and
the organic emitting element on the third metal electrode,
the first predetermined layer is a compound of an oxide with an indium, a zinc, a tin, or a gallium,
each of the pixels includes
a first transistor;
a second transistor; and
a capacitor,
each of the pixels has a first plane region, a second plane region, and the third plane region,
the first predetermined layer overlapping the first plane region is a first channel region of the first transistor,
the second insulation layer overlapping the first plane region is a first gate insulation film of the first transistor,
the first metal electrode overlapping the first plane region is a first gate electrode of the first transistor,
the second predetermined layer overlapping the second plane region is a second gate electrode of the second transistor,
the first insulation layer overlapping the second plane region is a second gate insulation film of the second transistor,
the first poly crystalline silicon layer overlapping the second plane region is a second channel region of the second transistor,
the second metal electrode overlapping the third plane region is a first capacitor electrode of the capacitor,
the first insulation layer overlapping the third plane region is a first capacitor insulation film of the capacitor,
the second poly crystalline silicon layer overlapping the third plane region is a second capacitor electrode of the capacitor,
a first thickness of the third metal electrode is thicker than a second thickness of the first poly crystalline silicon layer, a third thickness of the second poly crystalline silicon layer, a fourth thickness of the first predetermined layer, a fifth thickness of the second predetermined layer, a sixth thickness of the first metal electrode, and a seventh thickness of the second metal electrode, and
the third metal electrode overlaps the first channel region of the first transistor.
2. The display device according to claim 1 , wherein
a continuous layer is made of the first and the second predetermined layers,
the third metal electrode overlaps the second gate electrode, and
the second predetermined layer is a compound of an oxide with an indium, a zinc, a tin, or a gallium.
3. The display device according to claim 2 , wherein
each of the pixels includes a third predetermined layer,
the continuous layer is made of the first, the second, and the third predetermined layers,
the third predetermined layer is a compound of an oxide with an indium, a zinc, a tin, or a gallium,
the third predetermined layer overlapping the third plane region is the first capacitor electrode of the capacitor, and
the third predetermined layer is connected to the second poly crystalline silicon layer.
4. The display device according to claim 1 , further comprising a fourth insulation layer between the third metal electrode and the organic emitting element, wherein
the organic emitting element overlaps the first and second capacitor electrodes, and
each of a first bottom surface of the first gate electrode, a second bottom surface of the second gate electrode, and a third bottom surface of the first capacitor electrode is in contact with the first insulation layer.
5. The display device according to claim 4 , wherein
each of the pixels includes a fourth metal electrode between the third insulation layer and the fourth insulation layer,
the third insulation layer has a contact hole, and
a portion of the fourth metal electrode is arranged in the contact hole and is contacted with the first predetermined layer.
6. A display device comprising:
a plurality of pixels arranged in matrix, each of the pixels including a first poly crystalline silicon layer, a first predetermined layer, a second predetermined layer, a first electrode, a second electrode, and an organic emitting element, each of the pixels sharing a first insulation layer, a second insulation layer, and a third insulation layer in the plurality of pixels,
wherein, each of the pixels has a lamination construction including:
the first poly crystalline silicon layer on the substrate;
the first insulation layer on the first poly crystalline silicon layer;
the first electrode and the second predetermined layer on the first insulation layer;
the second insulation layer on the first electrode;
the first predetermined layer on the second insulation layer;
the third insulation layer on the first predetermined layer and the second predetermined layer;
the second electrode on the third insulation layer; and
the organic emitting element on the second electrode,
the first predetermined layer is a compound of an oxide with an indium, a zinc, a tin, or a gallium,
each of the pixels includes
a first transistor;
a second transistor; and
a capacitor,
each of the pixels has a first plane region and a second plane region,
the first predetermined layer overlapping the first plane region is a first channel region of the first transistor,
the second insulation layer overlapping the first plane region is a first gate insulation film of the first transistor,
the first electrode overlapping the first plane region is a first gate electrode of the first transistor,
the second predetermined layer overlapping the second plane region is a second gate electrode of the second transistor,
the first insulation layer overlapping the second plane region is a second gate insulation film of the second transistor,
the first poly crystalline silicon layer overlapping the second plane region is a second channel region of the second transistor, and
the second electrode overlaps the first channel region of the first transistor.
7. The display device according to claim 6 , wherein
a continuous layer is made of the first and the second predetermined layers,
the second electrode overlaps the second gate electrode, and
the second predetermined layer is a compound of an oxide with an indium, a zinc, a tin, or a gallium.
8. The display device according to claim 6 , further comprising a fourth insulation layer between a third electrode and the organic emitting element, wherein
each of a first bottom surface of the first gate electrode and a second bottom surface of the second gate electrode is in contact with the first insulation layer.
9. The display device according to claim 8 , wherein
each of the pixels includes the third electrode between the third insulation layer and the fourth insulation layer,
the third insulation layer has a contact hole, and
a portion of the third electrode is arranged in the contact hole and is contacted with the first predetermined layer.