IP Library Granted Patent US 11,251,113
Granted Patent B2
US 11,251,113 · App. 15/855,453 · Granted Feb 15, 2022

Methods of embedding magnetic structures in substrates

Inventors: Sai Vadlamani (Chandler, AZ); Prithwish Chatterjee (Tempe, AZ); Robert A. May (Chandler, AZ); Rahul S. Jain (Chandler, AZ); Lauren A. Link (Chandler, AZ); Andrew J. Brown (Chandler, AZ); Kyu Oh Lee (Chandler, AZ); Sheng C. Li (Gilbert, AZ)
Assignee: Intel Corporation
H01L23/49838H01F17/0013H01F17/0033H01F27/2804H01F27/40H01F41/043H01F41/046H01L21/486H01L21/4853H01L21/4857H01L23/498H01L23/49811H01L23/49822H01L23/49866H01L24/19H01L24/20H05K1/00H01F2017/0066H01F2027/2809H01L24/16H01L24/48H01L24/81H01L2224/16157H01L2224/16227H01L2224/48227H01L2224/81191H01L2224/81192H01L2224/81193H01L2224/81447H01L2224/81815H01L2924/00014H01L2924/19042H01L2924/19102
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Quick Facts
Patent No.
US 11,251,113
App. No.
15/855,453
Granted
Feb 15, 2022
Kind
B2
Abstract

Methods/structures of forming embedded inductor structures are described. Embodiments include forming a first interconnect structure on a dielectric material of a substrate, selectively forming a magnetic material on a surface of the first interconnect structure, forming an opening in the magnetic material, and forming a second interconnect structure in the opening. Build up layers are then formed on the magnetic material.

Claims (31)

1. A microelectronic package structure, comprising:

a substrate comprising a dielectric material;

a first interconnect structure within the dielectric material;

a magnetic material comprising a first side and a second side, wherein the first side of the magnetic material is on a portion of the first interconnect structure;

a seed layer within the magnetic material, wherein a first portion of the seed layer is within the magnetic material and a second portion of the seed layer is on the second side of the magnetic material;

a second interconnect structure within the magnetic material, wherein;

a first portion of the second interconnect structure is within the magnetic material; and

a second portion of the second interconnect structure is below the second portion of the seed layer.

2. The microelectronic package structure of claim 1 , wherein the magnetic material comprises a rectangular shape, and wherein a sidewall of the first interconnect structure is linear.

3. The microelectronic package structure of claim 1 , wherein the first portion of the seed layer is between the magnetic material and a sidewall of the second interconnect structure.

4. The microelectronic package structure of claim 1 , wherein the first portion of the second interconnect structure is directly on the first interconnect structure, and wherein the second side of the magnetic material is on the dielectric material.

5. The microelectronic package structure of claim 1 , wherein the magnetic material comprises a magnetic paste, wherein the magnetic paste comprises a carrier, and a magnetic material.

6. The microelectronic package structure as in claim 1 , wherein the magnetic material comprises a portion of an embedded inductor structure.

7. The microelectronic package structure of claim 1 , wherein the magnetic material comprises one or more of iron, nickel, cobalt or molybdenum, their alloys, and combinations thereof.

8. The microelectronic package structure of claim 1 , wherein the substrate comprises a die electrically coupled thereto.

9. The microelectronic package structure of claim 1 , wherein a build-up layer is on the magnetic material.

10. The microelectronic package structure as claim 1 , further comprising: a microprocessor;

a memory device coupled to the die; and

a battery, wherein at least the microprocessor is electrically coupled to the substrate.

11. A microelectronic package structure comprising:

a substrate comprising a dielectric material;

a magnetic material within the dielectric material, the magnetic material comprising a first side and a second side;

a seed layer within the magnetic material, wherein a first portion of the seed layer is within the magnetic material and a second portion of the seed layer is on the second side of the magnetic material;

a first interconnect structure on a first side of the magnetic material, wherein a portion of the first interconnect structure is within the magnetic material;

a second interconnect structure, wherein a first portion of the second interconnect structure is on a portion of the first interconnect structure and is within the magnetic material, and wherein a second portion of the second interconnect structure is below the second portion of the seed layer; and

a die is electrically coupled to the substrate.

12. The microelectronic package structure of claim 11 , wherein the magnetic material comprises a magnetic paste, wherein the magnetic paste comprises iron, nickel and alloys of iron and nickel, and a carrier.

13. The microelectronic package structure of claim 11 wherein the first interconnect structure comprises a pad, and the second interconnect structure comprises a via.

14. The microelectronic package structure of claim 11 , wherein a first sidewall of the magnetic material is directly on the dielectric material, and a second sidewall of the magnetic material is directly on the dielectric material.

15. The microelectronic package structure of claim 11 wherein the substrate comprises a core.

16. The microelectronic package structure of claim 13 , wherein a first side of a rectangular copper structure is on a sidewall of the magnetic material and is adjacent the first interconnect structure.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 9, 2018
From: VADLAMANI, SAI; CHATTERJEE, PRITHWISH; MAY, ROBERT A.; JAIN, RAHUL S.; LINK, LAUREN A.; BROWN, ANDREW J.; LEE, KYU OH; LI, SHENG C.
To: INTEL CORPORATION
Reel/Frame 044570/0973 →
Continuity (1)
Related Publication 20190198436A1 · Jun 27, 2019
Cited By (1)
US 12,356,552