Polycrystalline diamond compact including a non-uniformly leached polycrystalline diamond table and applications therefor
In an embodiment, a polycrystalline diamond compacts (“PDC”) includes a substrate and a polycrystalline diamond (“PCD”) table bonded to the substrate. The PCD table defines an upper surface and at least one peripheral surface. The PCD table includes a plurality of bonded diamond grains. The PCD table includes a first region adjacent to the substrate that includes a metallic constituent disposed interstitially between the bonded diamond grains thereof, and a leached second region extending inwardly from the upper surface and the at least one peripheral surface that is depleted of the metallic constituent. The leached second region exhibits a leach depth profile having a maximum leach depth that is measured from the upper surface. A leach depth of the leach depth profile decreases with lateral distance from a central axis of the PCD table and toward the at least one peripheral surface.
1. A method of fabricating a leached polycrystalline diamond compact, the method comprising:
providing a polycrystalline diamond compact including:
a substrate; and
a polycrystalline diamond table bonded to the substrate, the polycrystalline diamond table defining an upper surface, at least one peripheral surface, and a chamfer extending between the upper surface and the at least one peripheral surface, the polycrystalline diamond table including a plurality of bonded diamond grains defining a plurality of interstitial regions, the polycrystalline diamond table further including a metallic constituent disposed interstitially between at least some of the plurality of bonded diamond grains thereof; and
leaching a region of the polycrystalline diamond table to deplete the region of the metallic constituent to form a leached region;
wherein the leached region includes:
a first portion having a first leach depth, the first portion adjacent to at least part of the chamfer; and
a second portion having a second leach depth that is different than the first leach depth, the second portion extending along and adjacent to at least part of the at least one peripheral surface.
2. The method of claim 1 , wherein the first leach depth is greater than the second leach depth.
3. The method of claim 1 , wherein the first leach depth is about 300 μm to about 425 μm, and the second leach depth is about 150 μm to about 225 μm.
4. The method of claim 1 , wherein leaching a region of the polycrystalline diamond table to deplete the region of the metallic constituent includes leaching the region effective to form the leached region with a leach depth profile having a maximum leach depth that is at least about 300 μm as measured from the upper surface in the first portion, a leach depth of the leach depth profile decreasing with lateral distance from a central axis of the polycrystalline diamond table and toward the at least one peripheral surface.
5. The method of claim 4 , wherein the leach depth of the leached region decreases discontinuously with lateral distance from the central axis of the polycrystalline diamond table and toward the at least one peripheral surface.
6. The method of claim 4 , wherein the leach depth profile of the leached region is asymmetric or substantially symmetric about the central axis of the polycrystalline diamond table.
7. The method of claim 4 , wherein the leach depth of the leached region decreases substantially continuously with lateral distance from the central axis of the polycrystalline diamond table and toward the at least one peripheral surface.
8. The method of claim 4 , wherein the maximum leach depth is about 300 μm to about 425 μm.
9. The method of claim 1 , wherein the second leach depth in the second portion of the leached region is about 5% to about 50% less than the first leach depth in the first portion of the leached region.
10. The method of claim 1 , wherein the second leach depth in the second portion of the leached region is about 8% to about 12% less than the first leach depth in the first portion of the leached region.
11. The method of claim 1 , wherein the polycrystalline diamond table is integrally formed with the substrate.
12. The method of claim 1 , wherein the polycrystalline diamond table is preformed and bonded to the substrate.
13. The method of claim 1 , wherein, prior to leaching, the polycrystalline diamond table exhibits a coercivity of about 115 Oe to about 250 Oe and a specific magnetic saturation greater than 0 G·cm 3 /g to about 15 G·cm 3 /g.
14. The method of claim 1 , wherein, prior to leaching, the polycrystalline diamond table exhibits a coercivity of about 155 Oe to about 175 Oe and a specific magnetic saturation greater than 10 G·cm 3 /g to about 15 G·cm 3 /g.
15. The method of claim 1 , wherein the plurality of bonded diamond grains exhibits an average grain size of about 30 μm or less, and wherein, prior to leaching, the metallic constituent is less than about 7.5 weight % of the first region.
16. The method of claim 1 , wherein, prior to leaching, the metallic constituent is less than about 1 weight % to about 6 weight % of the first region.
17. The method of claim 16 , wherein, prior to leaching, the metallic constituent is less than about 1 weight % to about 3 weight % of the first region.
18. The method of claim 1 , wherein the metallic constituent includes at least one of a metal-solvent catalyst or a metallic infiltrant.
19. The method of claim 1 , wherein the region extends inwardly from the upper surface, the chamfer, and the at least one peripheral surface.
20. A method of fabricating a leached polycrystalline diamond compact, the method comprising:
providing a polycrystalline diamond compact including:
a substrate; and
a polycrystalline diamond table bonded to the substrate, the polycrystalline diamond table defining an upper surface, at least one peripheral surface, and a chamfer extending between the upper surface and the at least one peripheral surface, the polycrystalline diamond table including a plurality of bonded diamond grains defining a plurality of interstitial regions, the polycrystalline diamond table further including a metallic constituent disposed interstitially between at least some of the plurality of bonded diamond grains thereof; and
leaching a region of the polycrystalline diamond table to deplete the region of the metallic constituent to form a leached region;
wherein the leached region includes:
a first portion having a first leach depth, the first portion near the chamfer; and
a second portion having a second leach depth that is different than the first leach depth, the second portion adjacent to at least a part of the at least one peripheral surface.
21. The method of claim 20 , wherein the first leach depth is greater than the second leach depth.
22. The method of claim 20 , wherein the first leach depth is about 300 μm to about 425 μm, and the second leach depth is about 150 μm to about 225 μm.
23. The method of claim 20 , wherein the second leach depth in the second portion of the leached region is about 5% to about 50% less than the first leach depth in the first portion of the leached region.
24. The method of claim 20 , wherein the first portion of the leached region is adjacent to the chamfer.
25. The method of claim 20 , wherein the first portion of the leached region is spaced from the chamfer.
26. The method of claim 20 , wherein the second portion of the leached region extends along the at least one peripheral surface.
27. The method of claim 20 , wherein the region extends inwardly from the upper surface, the chamfer, and the at least one peripheral surface.
28. A method of fabricating a leached polycrystalline diamond compact, the method comprising:
forming a polycrystalline diamond compact including a substrate bonded to a polycrystalline diamond table, the polycrystalline diamond table including an upper surface, at least one peripheral surface, a metallic constituent disposed insterstitially between a plurality of diamond grains;
forming a chamfer on the polycrystalline diamond table between the upper surface and the at least one peripheral surface; and
leaching a region of the polycrystalline diamond table to deplete the region of the metallic constituent to form a leached region;
wherein the leached region includes:
a first portion having a first leach depth, the first portion adjacent to at least part of the chamfer; and
a second portion having a second leach depth that is different than the first leach depth, the second portion extending along and adjacent to at least part of the at least one peripheral surface.
29. The method of claim 28 , further comprising, before forming the chamfer on the polycrystalline diamond table, lapping the polycrystalline diamond table to planarize the upper surface.
30. The method of claim 28 , wherein forming a chamfer on the polycrystalline diamond table between the upper surface and the at least one peripheral surface includes grinding the polycrystalline diamond table.
31. The method of claim 28 , wherein the first leach depth is about 300 μm to about 425 μm, and the second leach depth is about 150 μm to about 225 μm.
32. The method of claim 28 , wherein the second leach depth in the second portion of the leached region is about 5% to about 50% less than the first leach depth in the first portion of the leached region.
33. The method of claim 28 , wherein the region extends inwardly from the upper surface, the chamfer, and the at least one peripheral surface.