IP Library Granted Patent US 10,518,292
Granted Patent B2
US 10,518,292 · App. 15/868,989 · Granted Dec 31, 2019

CMOS ultrasonic transducers and related apparatus and methods

Inventors: Jonathan M. Rothberg (Guilford, CT); Keith G. Fife (Palo Alto, CA); Tyler S. Ralston (Clinton, CT); Gregory L. Charvat (Guilford, CT); Nevada J. Sanchez (Guilford, CT)
Assignee: Butterfly Network, Inc.
B06B1/02B06B1/0292B81B3/0021B81B7/0077B81C1/00158G10K9/12G10K11/18B81B2203/0127B81B2203/0315B81B2207/015B81C2201/013B81C2203/0118B81C2203/0735B81C2203/0771
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Quick Facts
Patent No.
US 10,518,292
App. No.
15/868,989
Granted
Dec 31, 2019
Kind
B2
Abstract

CMOS Ultrasonic Transducers and processes for making such devices are described. The processes may include forming cavities on a first wafer and bonding the first wafer to a second wafer. The second wafer may be processed to form a membrane for the cavities. Electrical access to the cavities may be provided.

Claims (31)

1. A method, comprising:

forming a cavity on a top region of a complementary metal oxide semiconductor (CMOS) substrate, the cavity surrounded by a lip region;

disposing a membrane over the lip region to substantially seal the cavity;

forming a first electrical contact on a top side of the membrane, wherein the top side of the membrane is disposed distal the cavity, and wherein a bottom side of the membrane and the first electrical contact are doped with substantially a same dopant;

forming a second electrical contact on the CMOS substrate; and

connecting the second electrical contact to the first electrical contact.

2. The method of claim 1 , wherein the first electrical contact and the second electrical contact comprise a metal.

3. The method of claim 1 , wherein the first electrical contact and the second electrical contact comprise aluminum.

4. The method of claim 1 , further comprising forming an interface layer between the first electrical contact and the top side of the membrane.

5. The method of claim 1 , wherein the first electrical contact is common to two or more membranes of two or more cavities.

6. The method of claim 1 , wherein forming the second electrical contact comprises etching the CMOS substrate to expose the second electrical contact.

7. The method of claim 1 , further comprising forming a third electrical contact on the CMOS substrate, wherein the third electrical contact is electrically coupled to a substrate electrode disposed on an opposite side of the cavity from the membrane, with the cavity between the substrate electrode and the membrane.

8. The method of claim 1 , wherein the membrane and the first electrical contact are doped with substantially a same dopant.

9. The method of claim 1 , wherein the CMOS substrate comprises processing circuitry configured to:

actuate the membrane to transmit an ultrasound wave; and

detect a received ultrasound wave based on vibration of the membrane.

10. An ultrasound structure, comprising:

a complementary metal-oxide-semiconductor (CMOS) substrate having a cavity formed therein, the cavity surrounded by a lip region;

a membrane disposed over the lip region to substantially seal the cavity;

a first electrical contact on a top side of the membrane, wherein the top side of the membrane is disposed distal to the cavity, and wherein a bottom side of the membrane and the first electrical contact are doped with substantially a same dopant; and

a second electrical contact on the CMOS substrate; wherein

the second electrical contact and the first electrical contact are connected.

11. The ultrasound structure of claim 10 , wherein the first electrical contact and the second electrical contact comprise a metal.

12. The ultrasound structure of claim 10 , wherein the first electrical contact and the second electrical contact comprise aluminum.

13. The ultrasound structure of claim 10 , further comprising an interface layer between the first electrical contact and the top side of the membrane.

14. The ultrasound structure of claim 10 , wherein the first electrical contact is common to two or more membranes of two or more cavities.

15. The ultrasound structure of claim 10 , further comprising a third electrical contact on the CMOS substrate, wherein the third electrical contact is electrically coupled to a substrate electrode disposed on an opposite side of the cavity from the membrane, with the cavity between the substrate electrode and the membrane.

16. The ultrasound structure of claim 10 , wherein the membrane and the first electrical contact are doped with substantially a same dopant.

17. The ultrasound structure of claim 10 , wherein the CMOS substrate comprises processing circuitry configured to:

actuate the membrane to transmit an ultrasound wave; and

detect a received ultrasound wave based on vibration of the membrane.

Assignments (2)
CHANGE OF NAME Recorded Mar 16, 2022
From: BUTTERFLY NETWORK, INC.
To: BFLY OPERATIONS, INC.
Reel/Frame 059369/0969 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 4, 2018
From: ROTHBERG, JONATHAN M.; FIFE, KEITH G.; RALSTON, TYLER S.; CHARVAT, GREGORY L.; SANCHEZ, NEVADA J.
To: BUTTERFLY NETWORK, INC.
Reel/Frame 045431/0437 →
Continuity (7)
Continuation 15349223 · Nov 11, 2016
Continuation 14172840 · Feb 4, 2014
Provisional Application 61760951 · Feb 5, 2013
Provisional Application 61760968 · Feb 5, 2013
Provisional Application 61760932 · Feb 5, 2013
Provisional Application 61760891 · Feb 5, 2013
Related Publication 20180133756A1 · May 17, 2018
Cited By (1)
US 12,569,880