High power ion beam generator systems and methods

1. A device comprising:

a) a waveguide comprising:

i) a proximal end comprising an electromagnetic wave entry point,

ii) a distal end comprising an electromagnetic wave exit point, and

iii) outer walls extending between said proximal end and said distal end and configured to propagate electromagnetic waves; and

b) an inverted impendence matching component located inside said waveguide component,

wherein said inverted impedance matching component extends from said distal end of said waveguide to at least partway towards said proximal end of said waveguide, and

wherein said inverted impedance matching component comprises a distal end and a proximal end, wherein said distal end of said impedance matching component is located at or near said distal end of said waveguide and has a greater cross-sectional area than said proximal end of said inverted impedance matching component.

2. The device of claim 1 , wherein said inverted impedance matching component comprises metal.

3. The device of claim 1 , wherein said inverted impedance matching component is configured to be cooled by water.

4. The device of claim 1 , wherein said inverted impedance matching component is located along the midline of said waveguide.

5. The device of claim 4 , wherein said inverted impedance matching component is supported by one or more support legs attached to said outer walls of said wave guide.

6. The device of claim 1 , wherein said electromagnetic waves are microwaves.

7. The device of claim 1 , wherein said cross-sectional area at said distal end of said inverted impedance matching component is at least two times, or three times, or four times, as large as said cross-sectional area at said proximal end of said inverted impedance matching component.

8. The device of claim 1 , wherein said inverted impedance matching component comprises one or more steps that allow said cross-sectional area to change from said proximal to said distal ends of said inverted impedance matching component.

9. The device of claim 1 , wherein said inverted impedance matching component comprises a taper from said proximal to said distal ends of said inverted impedance matching component that thereby allows said cross-sectional area to change.

10. The device of claim 1 , wherein cross-sectional area at said distal end of said inverted impedance matching component is large enough to block all or nearly all back flowing electrons when said device is part of an accelerator system.

11. A system comprising:

a) a computer processor;

b) non-transitory computer memory comprising one or more computer programs and a database, wherein said one or more computer programs comprises accelerator system monitoring and/or optimization software, and

c) an accelerator system that generates a high-energy ion beam comprising one or more of the following sub-systems which are in operable communication with said non-transitory computer memory, and which can be automatically adjusted by said accelerator system monitoring and/or optimization software:

i) an ion source and an ion source monitoring component;

ii) a focus solenoid magnet and a focus solenoid magnet monitoring component;

iii) a tube aperture and a tube aperture monitoring component;

iv) a solid or gas target and a solid or gas target monitoring component;

v) an extraction and suppression component and an extraction and suppression monitoring component;

vi) a beam generating sub-system and beam generating sub-system monitoring component;

vii) a beam focusing and steering sub-system and beam focusing and steering sub-system monitoring component;

viii) an accelerator/resistor sub-system and accelerator/resistor sub-system monitoring component;

ix) a beam steering sub-system and a beam steering sub-system monitoring component; and

x) pressurized gas sub-system component and a pressurized gas sub-system component monitoring component.

12. The system of claim 11 , wherein: 1) said ion source monitoring component comprises a mass flower meter, thermocouple, coolant flow meter, and/or a pressure gauge; 2) said focus solenoid monitoring component comprises a thermocouple, coolant flow meter, voltage monitor, and/or current monitor; 3) said tube aperture monitoring component comprises a camera, thermocouple, and/or a coolant flow meter; 4) said solid or gas target monitoring component comprises a camera, thermocouple, coolant flow meter, and/or radiation detector; 5) said extraction and suppression monitoring component comprises a pressure gauge, a thermocouple, a current monitor, and/or a voltage monitor; 6) said beam generating sub-system monitoring component comprises a current monitors and/or emittance scanner; and 7) said a pressurized gas sub-system component monitoring component comprising a pressure gauges and/or gas analyzer.

13. The system of claim 11 , wherein said accelerator system monitoring and/or optimization software is configured to collect and analyze a plurality of different set-points of said sub-systems and calculate optimized setting for such sub-systems.

14. The system of claim 13 , wherein said accelerator system monitoring and/or optimization software is configured to change the set points on one or more of said sub-systems to at least partially optimize performance of said accelerator system.

15. A system comprising:

an ion source plasma chamber,

wherein said plasma chamber has a source axis along the direction of a beam exiting said plasma chamber,

b) at least one ion source magnet,

wherein said at least one ion source magnet comprises an opening and at least one outer wall,

wherein said ion source plasma chamber extends through said opening of said at least one ion source magnet;

c) at least one receiving component attached to, or integral with, said at least one outer wall of said at least one ion source magnet;

d) a ferromagnetic enclosure,

wherein said at least one ion source magnet and said ion source plasma chamber are inside said ferromagnetic enclosure,

wherein said at least one ion source magnet is able to move to a plurality of different positions inside said ferromagnetic enclosure along said source axis of said plasma chamber;

wherein there is at least one longitudinal opening that extends along the direction of said source axis and aligns with said receiving component; and

e) at least one adjustment component configured to extend through said longitudinal opening and attach to said receiving component,

wherein said at least one adjustment component is able to secure said at least one ion source magnet at said plurality of different positions inside said ferromagnetic enclosure.

16. The system of claim 15 , wherein said receiving component comprises a threaded metal connector.

17. The system of claim 15 , wherein said adjustment component comprises a threaded bolt.

18. The system of claim 15 , wherein said receiving component is integral with said at least one ion source magnet.

19. The system of claim 15 , herein said at least one ion source magnet is at least partially encased in epoxy.

20. The system of claim 15 , wherein at least one ion source magnet comprises two ion source magnets.