Method for producing an organic electronic device
A method for producing an organic electronic device is disclosed. In an embodiment the method includes applying an organic material to a substrate to form at least one organic functional layer, applying a patterned electrode material to the at least one organic functional layer by a first mask, and removing the organic material from regions which are free of the electrode material.
1. A method for producing an organic electronic device, the method comprising:
applying an organic material to a substrate to form at least one organic functional layer;
applying a patterned electrode material to the at least one organic functional layer by a first mask, wherein the patterned electrode material is deposited with the first mask in place so that a pattern of the patterned electrode material is formed according to the first mask during deposition of the patterned electrode material; and
removing the organic material from regions which are free of the patterned electrode material,
wherein the patterned electrode material is a material for electrically contacting the at least one organic functional layer.
2. The method according to claim 1 , wherein removing the organic material comprises etching the organic material with an etching method while the patterned electrode material serves as a mask.
3. The method according to claim 2 , wherein the etching method comprises a dry etching method or an ablation by radiant energy input.
4. The method according to claim 1 , wherein the organic material is applied patterned by the first mask.
5. The method according to claim 1 , wherein the organic material is applied unpatterned.
6. The method according to claim 1 , wherein a first sublayer of an electrode layer is formed by applying the patterned electrode material and wherein, after removing the organic material a second electrode material is applied to form a second sublayer of the electrode layer.
7. The method according to claim 6 , wherein the second electrode material is applied patterned by a second mask.
8. The method according to claim 6 , wherein the second sublayer projects laterally beyond the first sublayer.
9. The method according to claim 6 , wherein the second electrode material is applied in a region from which the organic material was removed.
10. The method according to claim 6 , wherein the second sublayer electrically connects the first sublayer with an electrode connection piece on the substrate which is spatially separated from the first sublayer.
11. The method according to claim 10 , wherein the organic material is applied to the electrode connection piece, and wherein the organic material is removed from the electrode connection piece.
12. The method according to claim 1 , wherein the organic material is applied to an electrode connection piece on the substrate and prior to applying the patterned electrode material, the organic material on the electrode connection piece is removed.
13. The method according to claim 12 , wherein the patterned electrode material is additionally applied to the electrode connection piece such that the patterned electrode material contacts the electrode connection piece.
14. The method according to claim 1 , further comprising applying a second electrode layer on the substrate and then applying the organic material to the second electrode layer.
15. The method according to claim 1 , wherein the at least one organic functional layer comprises at least one organic optoelectronic layer.
16. The method according to claim 1 , wherein the patterned electrode material is a metal.
17. The method according to claim 1 , wherein the patterned electrode material is a transparent conductive oxide (TCO).
18. A method for producing an organic electronic device, the method comprising:
applying an organic material to a substrate to form at least one organic functional layer;
applying a patterned electrode material to the at least one organic functional layer by a first mask, wherein the patterned electrode material is deposited with the first mask in place so that a pattern of the patterned electrode material is formed according to the first mask during deposition of the patterned electrode material; and
removing the organic material from regions which are free of the patterned electrode material,
wherein the at least one organic functional layer comprises an organic functional layer stack comprising at least one organic optoelectronic layer and organic electronic layers.