Semiconductor device and method of manufacturing same

1. A semiconductor device comprising:

a wiring;

a semiconductor chip arranged above the wiring; and

a metal block arranged above the semiconductor chip, wherein

the semiconductor chip includes:

a semiconductor substrate;

a lower electrode provided on a lower surface of the semiconductor substrate;

an upper large electrode provided on an upper surface of the semiconductor substrate; and

an upper small electrode provided on the upper surface of the semiconductor substrate, the upper small electrode being smaller than the upper large electrode,

the semiconductor chip includes a first portion and a second portion, the first portion being positioned on an upper small electrode side with respect to a centroid of the semiconductor chip along a direction from the upper small electrode toward the upper large electrode, the second portion being positioned on an opposite side of the upper small electrode with respect to the centroid along the direction,

a centroid of the metal block is positioned above the second portion,

the lower electrode is connected to the wiring via a lower solder layer,

the upper large electrode is connected to the metal block via an upper solder layer,

the lower solder layer includes a solder base material and metal particles distributed in the solder base material, a melting point of the metal particles being higher than a melting point of the solder base material, and

a volume ratio of the metal particles occupying the lower solder layer positioned under the second portion is higher than a volume ratio of the metal particles occupying the lower solder layer positioned under the first portion.

2. The semiconductor device as in claim 1 , wherein

the lower solder layer positioned under the second portion and the lower solder layer positioned under the first portion include the metal particles respectively, and

an average diameter of the metal particles in the lower solder layer positioned under the second portion is larger than an average diameter of the metal particles in the lower solder layer positioned under the first portion.

3. The semiconductor device as in claim 2 , wherein

the lower solder layer includes a first area and a second area,

a diameter of the metal particles included in the second area is larger than a diameter of metal particles included in the first area,

the first area is positioned under the first portion, and

the second area is positioned under the second portion.

4. The semiconductor device as in claim 1 , wherein

the semiconductor substrate is a SiC substrate.

5. A method of manufacturing a semiconductor device comprising:

forming a stack by stacking a wiring, a lower solder layer, a semiconductor chip, an upper solder layer, and a metal block; and

heating the stack,

wherein

the semiconductor chip includes:

a semiconductor substrate;

a lower electrode provided on a lower surface of the semiconductor substrate;

an upper large electrode provided on an upper surface of the semiconductor substrate; and

an upper small electrode provided on the upper surface of the semiconductor substrate, the upper small electrode being smaller than the upper large electrode, and

the semiconductor chip includes a first portion and a second portion, the first portion being positioned on an upper small electrode side with respect to a centroid of the semiconductor chip along a direction from the upper small electrode toward the upper large electrode, the second portion being positioned on an opposite side of the upper small electrode with respect to the centroid along the direction,

the lower solder layer includes a solder base material and metal particles distributed in the solder base material, a melting point of the metal particles being higher than a melting point of the solder base material,

the forming of the stack includes:

arranging the lower solder layer on the wiring;

arranging the lower electrode on the lower solder layer;

arranging the upper solder layer on the upper large electrode; and

arranging the metal block on the upper solder layer,

in the forming of the stack, the wiring, the lower solder layer, the semiconductor chip, the upper solder layer, and the metal block are stacked such that:

a centroid of the metal block is arranged above the second portion; and

a volume ratio of the metal particles occupying the lower solder layer positioned under the second portion is higher than a volume ratio of the metal particles occupying the lower solder layer positioned under the first portion, and

the heating of the stack includes: melting the lower solder layer and the upper solder layer; and thereafter solidifying the lower solder layer and the upper solder layer.

6. The method as in claim 5 , wherein

the lower solder layer positioned under the first portion and the lower solder layer positioned under the second portion include the metal particles respectively, and

the forming of the stack includes stacking such that an average diameter of the metal particles in the lower solder layer positioned under the second portion is larger than an average diameter of the metal particles in the lower solder layer positioned under the first portion.

7. The method as in claim 6 , wherein

the lower solder layer includes a first area and a second area,

a diameter of the metal particles included in the second area is larger than a diameter of the metal particles included in the first area, and

the forming of the stack includes stacking such that the first area is positioned under the first portion and the second area is positioned under the second portion.

8. The method as in claim 5 , wherein

the semiconductor substrate is a SiC substrate.