Configuring optical layers in imprint lithography processes
An imprint lithography method of configuring an optical layer includes depositing a set of droplets atop a side of a substrate in a manner such that the set of droplets do not contact a functional pattern formed on the substrate. The imprint lithography method further includes curing the set of droplets to form a spacer layer associated with the side of the substrate and of a height selected such that the spacer layer can support a surface adjacent the substrate and spanning the set of droplets at a position spaced apart from the functional pattern.
1. An imprint lithography method of configuring an optical layer, the imprint lithography method comprising:
depositing a first set of droplets atop a side of a substrate in a manner such that the first set of droplets does not contact a functional pattern formed on the substrate;
curing the first set of droplets to form a first portion of a spacer layer associated with the side of the substrate;
after the first set of droplets is cured, depositing a second set of droplets atop the side of the substrate such that each droplet of the second set of droplets is respectively dispensed directly atop a droplet of the first set of droplets; and
curing the second set of droplets directly atop the first set of droplets to form a second portion of the spacer layer that increases a height of the spacer layer such that the spacer layer can support a surface adjacent the substrate and spanning the first and second sets of droplets at a position spaced apart from the functional pattern,
wherein a first number of droplets in the first set of droplets is unequal to a second number of droplets in the second set of droplets such that the height of the spacer layer is variable.
2. The imprint lithography method of claim 1 , wherein each droplet of the first and second sets of droplets has a volume of about 1 pL to about 100 pL.
3. The imprint lithography method of claim 1 , further comprising generating a drop-on demand programming scheme.
4. The imprint lithography method of claim 1 , further comprising providing a printing screen.
5. The imprint lithography method of claim 1 , further comprising imprinting the functional pattern on the substrate.
6. The imprint lithography method of claim 1 , wherein depositing the first and second sets of droplets atop the side of the substrate comprises dispensing droplet volumes of a polymerizable substance atop the side of the substrate.
7. The imprint lithography method of claim 1 , further comprising:
depositing each droplet of the first set of droplets directly on the side of the substrate; and
curing the first set of droplets directly on the side of the substrate.
8. The imprint lithography method of claim 7 , wherein each droplet of the first set of droplets has a cured height of about 0.5 μm to about 20.0 μm.
9. The imprint lithography method of claim 1 , wherein the spacer layer has a wedge shape.
10. The imprint lithography method of claim 1 , wherein the functional pattern is imprinted on the side of the substrate.
11. The imprint lithography method of claim 10 , wherein the functional pattern is imprinted along an interior region of the side of the substrate, the imprint lithography method further comprising depositing the first and second sets of droplets along a peripheral edge of the side of the substrate.
12. The imprint lithography method of claim 1 , wherein the side of the substrate is a first side of the substrate, and wherein the functional pattern is imprinted on a second side of the substrate that is opposite the first side of the substrate.
13. The imprint lithography method of claim 12 , further comprising depositing the first and second sets of droplets across an entirety of the first side of the substrate.
14. The imprint lithography method of claim 1 , further comprising attaching the substrate to the surface adjacent the substrate at the second set of droplets such that the spacer layer forms a gap between the substrate and the surface.
15. The imprint lithography method of claim 14 , wherein the gap provides a region comprising air with an index of refraction of 1.
16. The imprint lithography method of claim 14 , further comprising filling the gap with a polymerizable material having an index of refraction in a range of 1.3-1.6.
17. The imprint lithography method of claim 1 , wherein the polymerizable substance has a viscosity in a range of about 0.5 cP to about 500.0 cP, such that spacers formed from the second set of droplets respectively deposited atop the first set of droplets have a shape that is ellipsoid hemispherical.
18. The imprint lithography method of claim 1 , wherein the spacer layer has a crescent shape.
19. An optical layer, comprising:
a substrate;
a functional pattern formed on the substrate; and
a set of spacers disposed on a side of the substrate and spaced apart from the functional pattern,
wherein the set of spacers forms a spacer layer associated with the side of the substrate and of a height selected such that the spacer layer can support a surface adjacent the substrate and spanning the cured set of droplets at a position spaced apart from the functional pattern,
wherein the set of spacers comprises:
a first set of cured droplets, and
a second set of cured droplets deposited atop the first set of cured droplets such that each droplet of the second set of droplets is respectively supported directly atop a droplet of the first set of droplets, and
wherein a first number of droplets in the first set of cured droplets is unequal to a second number of droplets in the second set of cured droplets such that the height of the spacer layer is variable.