Plasma source for a plasma CVD apparatus and a manufacturing method of an article using the plasma source
A plasma source for a plasma CVD apparatus that includes an electrode group including four electrodes, which are a first electrode, a second electrode, a third electrode and a fourth electrode arranged in a row. The electrode group is connected to at least one AC power supply. A voltage supplied to two of the four electrodes is shifted in phase from a voltage supplied to the remaining two electrodes. A space to which a source gas is supplied is provided between the adjacent electrodes, and voltages applied to at least one set among the adjacent two electrodes are in the same phase.
1. A method of manufacturing an article, comprising:
positioning a processing object in a plasma CVD apparatus comprising a first electrode, a second electrode, a third electrode and a fourth electrode arrayed in a row in an order of the first, second, third and fourth electrodes;
supplying a source gas for film deposition from at least one interval between adjacent electrodes of the first, second, third and fourth electrodes;
conducting a first voltage applying process comprising applying a negative voltage to said first electrode and said second electrode adjacent to said first electrode, and applying a positive voltage to said third electrode and said fourth electrode adjacent to said third electrode; and
conducting a second voltage applying process comprising applying a positive voltage to said first electrode and said second electrode and applying a negative voltage to said third electrode and said fourth electrode,
wherein said first voltage applying process and said second voltage applying process are alternately conducted at every lapse of a predetermined time such that the film deposition is applied on the processing object.
2. A method of manufacturing an article according to claim 1 , wherein the supplying of the source gas comprises supplying the sources gas from each interval between the adjacent electrodes of the first, second, third and fourth electrodes.
3. A method of manufacturing an article according to claim 2 , wherein the supplying of the source gas comprises uniformly supplying the source gas to each interval between the adjacent electrodes of the first, second, third and fourth electrodes.
4. A method of manufacturing an article according to claim 3 , wherein each of the first, second, third and fourth electrodes is a hollow electrode.
5. A method of manufacturing an article according to claim 4 , further comprising:
supplying a reaction assist gas to each of the first, second, third and fourth electrode.
6. A method of manufacturing an article according to claim 3 , wherein each of the first, second, third and fourth electrodes is a hollow electrode having a slot configured to inject plasma.
7. A method of manufacturing an article according to claim 3 , wherein each of the first, second, third and fourth electrodes is a hollow electrode having a slot configured to inject plasma such that the slot has an elongated linear shape extending along a direction perpendicular to a direction of the first, second, third and fourth electrodes arrayed in the row.
8. A method of manufacturing an article according to claim 1 , wherein each of the first, second, third and fourth electrodes is a hollow electrode.
9. A method of manufacturing an article according to claim 1 , wherein each of the first, second, third and fourth electrodes is a hollow electrode having a slot configured to inject plasma.
10. A method of manufacturing an article according to claim 1 , wherein each of the first, second, third and fourth electrodes is a hollow electrode having a slot configured to inject plasma such that the slot has an elongated linear shape extending along a direction perpendicular to a direction of the first, second, third and fourth electrodes arrayed in the row.
11. A method of manufacturing an article, comprising:
positioning a processing object in a plasma CVD apparatus comprising a first electrode, a second electrode, a third electrode and a fourth electrode arrayed in a row in an order of the first, second, third and fourth electrodes;
supplying a source gas for film deposition from at least one interval between adjacent electrodes of the first, second, third and fourth electrodes;
conducting a first voltage applying process comprising applying a negative voltage to said first electrode and said fourth electrode and applying a positive voltage to said second electrode and said third electrode; and
conducting a second voltage applying process comprising applying a positive voltage to said first electrode and said fourth electrode and applying a negative voltage to said second electrode and said third electrode,
wherein said first voltage applying process and said second voltage applying process are alternately conducted at every lapse of a predetermined time such that the film deposition is applied on the processing object.
12. A method of manufacturing an article according to claim 11 , wherein the supplying of the source gas comprises supplying the sources gas from each interval between the adjacent electrodes of the first, second, third and fourth electrodes.
13. A method of manufacturing an article according to claim 12 , wherein the supplying of the source gas comprises uniformly supplying the source gas to each interval between the adjacent electrodes of the first, second, third and fourth electrodes.
14. A method of manufacturing an article according to claim 13 , wherein each of the first, second, third and fourth electrodes is a hollow electrode.
15. A method of manufacturing an article according to claim 14 , further comprising:
supplying a reaction assist gas to each of the first, second, third and fourth electrode.
16. A method of manufacturing an article according to claim 13 , wherein each of the first, second, third and fourth electrodes is a hollow electrode having a slot configured to inject plasma.
17. A method of manufacturing an article according to claim 13 , wherein each of the first, second, third and fourth electrodes is a hollow electrode having a slot configured to inject plasma such that the slot has an elongated linear shape extending along a direction perpendicular to a direction of the first, second, third and fourth electrodes arrayed in the row.
18. A method of manufacturing an article according to claim 11 , wherein each of the first, second, third and fourth electrodes is a hollow electrode.
19. A method of manufacturing an article according to claim 11 , wherein each of the first, second, third and fourth electrodes is a hollow electrode having a slot configured to inject plasma.
20. A method of manufacturing an article according to claim 11 , wherein each of the first, second, third and fourth electrodes is a hollow electrode having a slot configured to inject plasma such that the slot has an elongated linear shape extending along a direction perpendicular to a direction of the first, second, third and fourth electrodes arrayed in the row.