Multi-block sputtering target and associated methods and articles
View Patent ↗A sputtering target that includes at least two consolidated blocks, each block including an alloy including molybdenum in an amount greater than about 30 percent by weight and at least one additional alloying ingredient; and a joint between the at least two consolidated blocks, the joint being free of any microstructure due to an added bonding agent (e.g., powder, foil or otherwise), and being essentially free of any visible joint line the target that is greater than about 200 μm width (e.g., less than about 50 μm width). A process for making the target includes hot isostatically pressing, below a temperature of 1080° C., consolidated perform blocks that may be surface prepared (e.g., roughened to a predetermined roughness value) prior to pressing.
1. A sputtering target, comprising:
a) at least two consolidated blocks, each block including an alloy including molybdenum in an amount greater than about 30 percent by weight and at least one additional alloying element; and
b) a joint between the at least two consolidated blocks, which joins the blocks together to define a target body, the joint being free of any microstructure due to an added bonding agent, and being essentially free of any joint line of greater than about 300 μm width,
wherein (i) throughout the at least two consolidated blocks there is a continuous and uniform distribution of (a) a molybdenum phase, (b) a phase of the at least one additional alloying element, and (c) a third phase comprising an alloy of molybdenum at the at least one additional alloying element, (ii) the third phase is present in an amount greater than 30 volume percent, and (iii) the molybdenum phase is present in an amount greater than 30 volume percent.
2. A sputtering target, comprising:
a) at least two consolidated blocks, each block including an alloy including molybdenum in an amount greater than about 30 percent by weight and at least one additional alloying element; and
b) a joint between the at least two consolidated blocks, which joins the blocks together to define a target body, the joint being free of any microstructure due to an added bonding agent, and being essentially free of any joint line of greater than about 300 μm width,
wherein (i) throughout the at least two consolidated blocks there is a continuous and uniform distribution of (a) a molybdenum phase, (b) a phase of the at least one additional alloying element, and (c) a third phase comprising an alloy of molybdenum at the at least one additional alloying element, (ii) the third phase is present in an amount greater than 30 volume percent, and (iii) the sputtering target at the joint exhibits a transverse rupture strength per ASTM B528-10, of at least 800 MPa.
3. A sputtering target, comprising:
a) at least two consolidated blocks, each block including an alloy including molybdenum in an amount greater than about 30 percent by weight and at least one additional alloying element; and
b) a joint between the at least two consolidated blocks, which joins the blocks together to define a target body, the joint being free of any microstructure due to an added bonding agent, and being essentially free of any joint line of greater than 200 μm width,
wherein (i) throughout the at least two consolidated blocks there is a continuous and uniform distribution of (a) a molybdenum phase, (b) a phase of the at least one additional alloying element, and (c) a third phase comprising an alloy of molybdenum at the at least one additional alloying element, (ii) the third phase is present in an amount greater than 30 volume percent, and (iii) the sputtering target at the joint has a transverse rupture strength per ASTM B528-10, of at least 900 MPa.
4. The sputtering target of claim 1 , wherein the at least one alloying element is selected from titanium, chromium, niobium, tantalum, tungsten, zirconium, hafnium, vanadium lithium, sodium, potassium or any combination thereof.
5. The sputtering target of claim 1 , wherein the at least two consolidated blocks include a first block and a second block, and the consolidated joint includes a direct contact between a prepared surface of first block with a prepared surface of the second block.
6. The sputtering target of claim 5 , wherein the prepared surfaces are milled edge surfaces having an average surface roughness (Ra) of less than about 5.1 μm.
7. The sputtering target of claim 5 , wherein the prepared surfaces are milled edge surfaces having an average surface roughness (Ra) of less than about 3.8 μm.
8. The sputtering target of claim 1 , wherein each of the consolidated blocks includes about 30 to about 70 at % molybdenum and the balance titanium, exclusive of impurities.
9. The sputtering target of claim 1 , wherein an oxygen weight of the sputtering target is between about 1000 ppm and 3500 ppm.
10. The sputtering target of claim 1 , wherein the target has a sputtering surface of at least about 1.5 m 2 , and the two or more consolidated blocks are joined end-to-end.
11. The sputtering target of claim 10 , wherein the sputtering target includes about 30 to about 70 at % molybdenum and the balance titanium, exclusive of impurities.
12. The sputtering target of claim 1 , wherein the phase of the at least one additional alloying element is present in an amount greater than 1 volume percent.
13. The sputtering target of claim 1 , wherein the phase of the at least one additional alloying element is present in an amount greater than 6 volume percent.
14. The sputtering target of claim 1 , wherein the molybdenum phase is present in an amount greater than 40 volume percent.
15. The sputtering target of claim 2 , wherein the molybdenum phase is present in an amount greater than 30 volume percent.
16. The sputtering target of claim 2 , wherein the phase of the at least one additional alloying element is present in an amount greater than 1 volume percent.
17. The sputtering target of claim 2 , wherein the phase of the at least one additional alloying element is present in an amount greater than 6 volume percent.
18. The sputtering target of claim 3 , wherein the molybdenum phase is present in an amount greater than 30 volume percent.
19. The sputtering target of claim 3 , wherein the phase of the at least one additional alloying element is present in an amount greater than 1 volume percent.
20. The sputtering target of claim 3 , wherein the phase of the at least one additional alloying element is present in an amount greater than 6 volume percent.