MTF measuring method for measuring MTF of contact image sensors, and MTF adjusting method
View Patent ↗Provided is a MTF measuring method that is capable of estimating an accurate MTF curve in one measurement. The method is a MTF measuring method for measuring the MTF of a CIS that includes a CMOS sensor, and a lens that directs incident reflected light from a document via a contact glass to the CMOS sensor. A test chart is placed on the contact glass via a transparent plate having a thickness that varies at different locations in the sub scanning direction. Then, the CIS is caused to scan in the sub scanning direction, and in one scan, is caused to measure respective MTF at multiple measurement locations where the thickness of the transparent plate differs.
1. An MTF adjusting method performed in conjunction with measuring MTF of a contact image sensor having multiple photoelectric conversion elements that are arranged in a main scanning direction, and a lens that directs incident reflected light from a document via a contact glass to the photoelectric conversion elements, comprising the steps of:
placing a test chart on the contact glass via a transparent plate having a thickness that varies at different locations in a sub scanning direction; and
causing the contact image sensor to scan in the sub scanning direction, and in one scan, to measure respective MTFs at multiple measurement locations where the thickness of the transparent plate differs;
wherein
the space between the lens and the contact glass can be adjusted by the thickness of a spacer;
the thickness of the spacer that is mounted at the time of measurement is set to be less than a value obtained by subtracting the thickness of the contact glass from the minimum value of the assumed distance between the photoelectric conversion elements and the lens; and
the method further comprises
identifying a measurement location having the highest MTF measurement result from among the multiple measurement locations method; and
setting a value obtained by adding the thickness of the transparent plate at the identified measurement location and the thickness of the spacer that is mounted at the time of measurement as the thickness of the spacer to be mounted in a document reading apparatus.
2. The MTF adjusting method according to claim 1 , wherein
the transparent plate has a flat first surface, and a second surface that faces the first surface and that is inclined at a specified angle, and the first surface is placed on the contact glass so that the thickness of the transparent plate does not change in the main scanning direction, and gradually decreases or gradually increases in the sub scanning direction.
3. The MTF adjusting method according to claim 1 , wherein
the maximum thickness of the transparent plate among thicknesses at multiple measurement locations is set to be larger than a value that is obtained by subtracting the thickness of the spacer that is mounted at the time of measurement and the thickness of the contact glass from the maximum value of the assumed distance between the photoelectric conversion elements and the lens.