Method and system for dual stretching of wafers for isolated segmented chip scale packages
Described herein is a method and system for dual stretching of wafers to create isolated segmented chip scale packages. A wafer having an array of light-emitting diodes (LEDs) is scribed into LED segments, where each LED segment includes a predetermined number of LEDs. The scribed wafer is placed on a stretchable substrate or tape. The tape is stretched and a layer of optically material is placed in the separation gaps. The stretched wafer is scribed on a LED level. The tape is stretched and another layer of optically opaque material is placed in the separation gaps. The same or different optically opaque material can be used for the layers. The two layers of optically opaque material are formed to provide electrical connectivity between the LEDs in each LED segment. In an implementation, each segment or LED is individually addressable.
1. A method for dual stretching of a wafer, the method comprising:
scribing a wafer along at least one segment line, each segment defined by the at least one segment line having a predetermined number of light emitters;
stretching first tape carrying the scribed wafer;
scribing the wafer, after stretching the first tape, along at least one light emitter line, each light emitter section defined by the at least one light emitter line;
stretching second tape carrying the wafer scribed along the at least one light emitter line; and
filling gaps between at least one of the segments or sections created by the stretching of at least one of the first or second tape with optically opaque material.
2. The method of claim 1 , the method further comprising:
cutting the wafer, after filling the gaps with the optically opaque material, into light emitter segments, each having a different light emitter.
3. The method of claim 1 , wherein the wafer is scribed along two segment lines.
4. The method of claim 3 , wherein the wafer is scribed along two light emitter lines.
5. The method of claim 1 , wherein the optically opaque material is a metal.
6. The method of claim 5 , the method further comprising:
depositing insulation layers to provide electrical separation between metal layers that form the metal.
7. The method of claim 5 , wherein the metal provides electrical connectivity between the segments.
8. The method of claim 5 , wherein the metal provides electrical connectivity between the light emitters.
9. The method of claim 1 , wherein the first tape and the second tape are same.
10. The method of claim 1 , further comprising:
removing the first tape after stretching the wafer, and
placing the wafer on the second tape after scribing the wafer along the at least one light emitter line.
11. The method of claim 1 , further comprising:
depositing the optically opaque material between the gaps via flow deposition; and
allowing the optically opaque material to harden or cure after deposition.
12. The method of claim 1 , further comprising:
filling the gaps between the segments and the gaps between the sections with a same type of optically opaque material.
13. The method of claim 12 , further comprising:
filling the gaps between the segments and the gaps between the sections with the optically opaque material:
after the stretching of the first tape and before the scribing the wafer along the at least one light emitter line, and
after the stretching of the second tape.
14. The method of claim 1 , further comprising:
filling the gaps between the segments and the gaps between the sections with different types of optically opaque material.