IP Library Granted Patent US 11,229,950
Granted Patent B2
US 11,229,950 · App. 15/959,617 · Granted Jan 25, 2022

Systems, devices and methods for spark plasma sintering

Inventors: John R. Paulus (Afton, VA); Jon T. Moore (Charlottesville, VA); Benjamin E. Heneveld (Newmarket, NH)
Assignee: RAYTHEON TECHNOLOGIES CORPORATION
B22F3/03B22F3/105B22F7/06B22F7/08B22F5/04B22F2003/1046B22F2003/1051B22F2003/244B22F2003/247B22F2003/248B22F2005/103B22F2998/10B22F2999/00B28B23/0068B29C43/18C04B2235/666
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Quick Facts
Patent No.
US 11,229,950
App. No.
15/959,617
Granted
Jan 25, 2022
Kind
B2
Abstract

A method of forming an article including: contacting a fugitive tool with a powdered parent material; densifying the powdered material; and destructively removing the fugitive tool. A coating of a different material may be formed against the parent material using a similar approach.

Claims (14)

1. A method of forming an article comprising:

contacting a porous fugitive tool comprising a carbonaceous material, a silica based ceramic, or a ceramic comprising alumina, zircon and/or cristobalite with a powdered parent material; densifying the powdered material; and destructively removing the porous fugitive tool, wherein densifying employs spark plasma sintering (SPS) and destructively removing the tool comprises burning in air or leaching with a hot caustic solution;

wherein the parent material has nanoscale morphology.

2. The method of claim 1 , wherein the porous fugitive tool is embedded in the powdered parent material.

3. The method of claim 1 , further comprising placing the porous fugitive tool in contact with a non-fugitive tool.

4. A method of forming a coating comprising applying a coating material to a porous fugitive tool comprising a carbonaceous material, a silica based ceramic, or a ceramic comprising alumina, zircon and/or cristobalite; placing powdered parent material in contact with the coating material on the porous fugitive tool; densifying the powdered parent material and destructively removing the porous fugitive tool, wherein densifying employs spark plasma sintering (SPS) and destructively removing the tool comprises burning in air or leaching with a hot caustic solution;

wherein the parent material has nanoscale morphology.

5. The method of claim 4 , wherein the porous fugitive tool is embedded in the powdered parent material.

6. The method of claim 4 , further comprising placing the porous fugitive tool in contact with a non-fugitive tool.

7. The method of claim 4 , wherein the coating imparts catalytic reactivity to the surface of the densified parent material.

8. A method of locating an interior component comprising contacting a component with a porous fugitive tool comprising a carbonaceous material, a silica based ceramic, or a ceramic comprising alumina, zircon and/or cristobalite; placing the porous fugitive tool in a non-fugitive tool; placing powdered parent material in contact with the porous fugitive tool; densifying the powdered parent material and destructively removing the porous fugitive tool wherein densifying employs spark plasma sintering (SPS) and destructively removing the tool comprises burning in air or leaching with a hot caustic solution.

9. The method of claim 8 , wherein the porous fugitive tool is embedded in the powdered parent material.

10. The method of claim 8 , further comprising placing the porous fugitive tool in contact with the non-fugitive tool.

11. The method of claim 8 , wherein the parent material has nanoscale morphology.

Assignments (5)
CHANGE OF NAME Recorded Jul 27, 2023
From: RAYTHEON TECHNOLOGIES CORPORATION
To: RTX CORPORATION
Reel/Frame 064714/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE SPELLING ON THE ADDRESS 10 FARM SPRINGD ROAD FARMINGTONCONNECTICUT 06032 PREVIOUSLY RECORDED ON REEL 057190 FRAME 0719. ASSIGNOR(S) HEREBY CONFIRMS THE CORRECT SPELLING OF THE ADDRESS 10 FARM SPRINGS ROAD FARMINGTON CONNECTICUT 06032. Recorded Aug 19, 2021
From: UNITED TECHNOLOGIES CORPORATION
To: RAYTHEON TECHNOLOGIES CORPORATION
Reel/Frame 057226/0390 →
CHANGE OF NAME Recorded Aug 16, 2021
From: UNITED TECHNOLOGIES CORPORATION
To: RAYTHEON TECHNOLOGIES CORPORATION
Reel/Frame 057190/0719 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 28, 2018
From: MIKRO SYSTEMS, INC.
To: UNITED TECHNOLOGIES CORPORATION
Reel/Frame 046232/0716 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 23, 2018
From: PAULUS, JOHN R.; MOORE, JON T.; HENEVELD, BENJAMIN E.
To: MIKRO SYSTEMS, INC.
Reel/Frame 045612/0760 →