Devices, systems, and methods for cleaning vessels

1. A method of cleaning a vessel having a size and a shape and defining a cleaning environment, wherein the vessel comprises a surface having a target material on the surface to be cleaned, the method comprising:

positioning a cleaning apparatus in the cleaning environment of the vessel, wherein the cleaning apparatus comprises a sensor and a cleaning device, wherein the cleaning device generates a cleaning force;

measuring, with the sensor, a first plurality of depth measurements of the target material to be cleaned from the surface;

communicating the first plurality of depth measurements to a cleaning controller having a cleaning processing device;

determining, by the cleaning controller and based at least in part on the plurality of depth measurements, a first cleaning protocol for the cleaning device to perform;

controlling, by the cleaning controller, the cleaning apparatus by causing the cleaning device to apply the cleaning force to the surface pursuant to the first cleaning protocol;

removing from the cleaning environment the target material cleaned from the surface by the cleaning apparatus;

measuring, by the sensor, a dimension of the cleaning environment;

comparing, by the cleaning controller, the measured dimension to a predefined dimension;

providing an integrity alert based on the measured dimension being greater than the predefined dimension;

measuring with the sensor a second plurality of depth measurements along the surface based on the measured dimension being less than the predefined dimension;

determining, by the cleaning controller, a second cleaning protocol for the cleaning device on the surface based on the second plurality of depth measurements; and

controlling, by the cleaning controller, the cleaning apparatus by causing the cleaning device provide the cleaning force to the surface pursuant to the second cleaning protocol.

2. The method of claim 1 , further comprising determining a type of cleaning force of the cleaning device, wherein determining the first cleaning protocol further comprises determining the first cleaning protocol at least partially based on the type of cleaning force.

3. The method of claim 1 , wherein the cleaning apparatus comprises a base and an arm on the base supporting the cleaning device, wherein the arm comprises:

a first rotatable arm member defining a first axis, wherein the first rotatable arm member is rotatable about the first axis; and

a second rotatable arm member defining a second axis and connected to the first rotatable arm member, wherein the second rotatable arm member is rotatable about the second axis, and

wherein controlling the cleaning apparatus comprises maintaining a position of the base relative to the surface and controlling an orientation of the cleaning device by moving at least one of the first rotatable arm member or the second rotatable arm member while causing the cleaning device to provide the cleaning force.

4. The method of claim 1 , wherein determining the first cleaning protocol further comprises determining the first cleaning protocol at least partially based on the size and/or shape of the vessel.

5. The method of claim 1 , wherein the sensor is a LIDAR sensor.

6. The method of claim 1 , wherein determining the first cleaning protocol comprises determining a cleaning time for locations on the surface and a cleaning orientation of the cleaning device relative to the respective locations during the respective cleaning times, wherein controlling the cleaning apparatus comprises causing the cleaning device to provide, at each location, the cleaning force for the cleaning time at the cleaning orientation for that location.

7. The method of claim 1 , further comprising causing the cleaning apparatus to clean the surface pursuant to an initial cleaning protocol before measuring the plurality of depth measurements.

8. The method of claim 1 , wherein the cleaning apparatus comprises a track-mounted base that is movable along the surface, and wherein controlling the cleaning apparatus comprises moving the cleaning apparatus along the surface while causing the cleaning device to apply the cleaning force.

9. The method of claim 8 , wherein the cleaning apparatus comprises an arm on the base and supporting the cleaning device, wherein the arm comprises:

a first rotatable arm member defining a first axis, wherein the first rotatable arm member is rotatable about the first axis; and

a second rotatable arm member defining a second axis and connected to the first rotatable arm member, wherein the second rotatable arm member is rotatable about the second axis, and

wherein controlling the cleaning apparatus comprises controlling an orientation of the cleaning device by moving at least one of the first rotatable arm member or the second rotatable arm member while causing the cleaning device to provide the cleaning force.

10. A cleaning system for cleaning a vessel having a size and a shape defining a cleaning environment, wherein the vessel comprises a surface having a target material on the surface to be cleaned, the cleaning system comprising:

a cleaning apparatus adapted to be positioned within the cleaning environment of the vessel, the cleaning apparatus comprising:

a cleaning apparatus base;

a first sensor supported on the cleaning apparatus base and configured to measure a depth of the target material on the surface of the vessel;

a cleaning device coupled to the cleaning apparatus base, wherein the cleaning device is configured to generate a cleaning force; and

a second sensor supported on the cleaning apparatus base and configured to detect a position of the cleaning device, wherein the second sensor comprises a wireless sensor; and

a cleaning controller, wherein the cleaning controller is configured to:

receive from the first sensor a plurality of depth measurements of the target material on the surface,

determine a cleaning protocol for the cleaning device based at least in part on the plurality of depth measurements, and

control the cleaning apparatus to cause the cleaning device to apply the cleaning force to the surface pursuant to the cleaning protocol.

11. The cleaning system of claim 10 , wherein the cleaning apparatus comprises an arm on the cleaning apparatus base supporting the cleaning device, wherein the arm comprises:

a first rotatable arm member defining a first axis, wherein the first rotatable arm member is rotatable about the first axis; and

a second rotatable arm member defining a second axis and connected to the first rotatable arm member, wherein the second rotatable arm member is rotatable about the second axis, and

wherein the cleaning controller is configured to maintain a position of the base relative to the surface and move at least one of the first rotatable arm member or the second rotatable arm member while causing the cleaning device to provide the cleaning force.

12. The cleaning system of claim 10 , wherein the cleaning controller is provided on the cleaning apparatus.

13. The cleaning system of claim 10 , wherein the cleaning device comprises a nozzle configured to emit at least one of heat, a fluid, a high-intensity light, acoustic waves, or sonic waves as the cleaning force.

14. The cleaning system of claim 10 , wherein the cleaning apparatus further comprises a removal device configured to remove the target material.

15. The cleaning system of claim 10 , wherein the sensor is a LIDAR sensor.

16. The cleaning system of claim 10 , wherein the cleaning protocol comprises at least one of path of movement of the cleaning device within the cleaning environment, speed of movement of the cleaning device within the cleaning environment, duration and/or strength of the cleaning force on a particular location on the surface, and orientation of the cleaning apparatus relative to the particular location on the surface.

17. The cleaning system of claim 10 , wherein the cleaning controller is configured to determine the cleaning protocol for the cleaning device based further on at least one of the size and/or shape of the vessel and the type of cleaning force of the cleaning of the cleaning device.

18. The cleaning apparatus of claim 10 , wherein the cleaning controller is further configured to:

receive from the second sensor a detected position of the cleaning device; and

compare the detected position to a desired position in accordance with the cleaning protocol; and

move the cleaning apparatus based on a difference between the detected position and the desired position.

19. The cleaning system of claim 10 , wherein the cleaning apparatus base is track-mounted and is movable along the surface, and wherein the cleaning controller is configured to move the cleaning apparatus along the surface while causing the cleaning device to provide the cleaning force.

20. The cleaning system of claim 19 , wherein the cleaning apparatus comprises an arm on the base and supporting the cleaning device, wherein the arm comprises:

a first rotatable arm member defining a first axis, wherein the first rotatable arm member is rotatable about the first axis; and

a second rotatable arm member defining a second axis and connected to the first rotatable arm member, wherein the second rotatable arm member is rotatable about the second axis, and

wherein the cleaning controller is configured to move at least one of the first rotatable arm member or the second rotatable arm member while causing the cleaning device to provide the cleaning force.