Reactive sputter deposition of dielectric films
Reactive sputter deposition method and system are disclosed, in which a catalyst gas, such as water vapor, is used to increase the overall deposition rate substantially without compromising formation of a dielectric compound layer and its optical transmission. Addition to the sputtering or reactive gas of the catalyst gas can result in an increase of a deposition rate of the dielectric oxide film substantially without increasing an optical absorption of the film.
1. A system comprising:
a chamber;
a multi-substrate holder to rotate about a vertical axis within the chamber and simultaneously deposits coating onto a plurality of substrates;
a pair of inlets, connected to a reservoir, to feed a first portion of a mixture of a reactive gas and water vapor into the chamber;
a pair of ring cathode targets,
wherein an inlet, of the pair of inlets, is disposed at a center of a ring cathode target of the pair of ring cathode targets; and
an anode to add a second portion of the mixture of the reactive gas and the water vapor to the chamber,
wherein the anode is positioned separately from the pair of ring cathode targets.
2. The system of claim 1 , further comprising:
the reservoir,
where the reservoir holds the first portion of the mixture of the reactive gas and the water vapor.
3. The system of claim 1 , further comprising:
a water vapor source to provides the water vapor.
4. The system of claim 3 , where the water vapor source includes a water vaporizer.
5. The system of claim 1 , further comprising:
a loading dock that includes other substrates that are different from the plurality of substrates.
6. The system of claim 5 , further comprising:
a substrate handler that loads the other substrates into the chamber via a gate valve.
7. The system of claim 1 , further comprising:
one or more turbo pumps that pump air out of the chamber.
8. A system comprising:
a chamber to receive a mixture of a reactive gas and water vapor;
a substrate holder that is inside of the chamber,
the substrate holder being to simultaneously deposit coating onto one or more substrates;
a single pair of ring cathode targets that are disposed opposite of the substrate holder,
a first portion of the mixture of the reactive gas and the water vapor being provided via the single pair of ring cathode targets;
an anode to provide a second portion of the mixture of the reactive gas and the water vapor to the chamber,
wherein the anode is positioned separately from the single pair of ring cathode targets.
9. The system of claim 8 ,
where the substrate holder is a multi-substrate holder, and
where the multi-substrate holder is to rotate about a vertical axis within the chamber.
10. The system of claim 8 , where the first portion of the mixture of the reactive gas and the water vapor is provided from a reservoir via centers of the single pair of ring cathode targets.
11. The system of claim 8 , further comprising:
a pair of inlets through which the first portion of the mixture of the reactive gas and the water vapor is provided into the chamber.
12. The system of claim 8 , further comprising:
a reservoir that holds the first portion of the mixture of the reactive gas and the water vapor; and
a water vapor source to provide a portion of the water vapor to the reservoir.
13. The system of claim 8 , further comprising:
one or more turbo pumps that pump air out of the chamber.
14. The system of claim 8 , further comprising:
a substrate handler that loads additional substrates into the chamber via a gate valve.
15. The system of claim 11 , further comprising:
a reservoir to hold the first portion of the mixture of the reactive gas and the water vapor,
where the pair of inlets are connected to the reservoir.
16. The system of claim 12 , where the water vapor source includes a water vaporizer.
17. The system of claim 11 , where the pair of inlets include an inlet that is disposed in a ring cathode target of the single pair of ring cathode targets.
18. The system of claim 17 , where the pair of inlets include another inlet is disposed at a center of a different ring cathode target of the single pair of ring cathode targets.
19. A system comprising:
a pair of inlets to feed a first portion of a mixture of a gas and water vapor into a chamber;
a pair of ring cathode targets,
wherein the pair of inlets are disposed in the pair of ring cathode targets; and
an anode to add a second portion of the mixture of the gas and the water vapor to the chamber,
wherein the anode is positioned separately from the pair of ring cathode targets.
20. The system of claim 19 , further comprising:
a plurality of pumps to pump air out of the chamber.