Substrate loading in microlithography
View Patent ↗Methods, systems, and apparatus for the loading and unloading of substrates, such as semiconductor wafers, involving microlithography and similar nano-fabrication techniques. The system includes two or more pedestals; a substrate chuck including two or more channels; a turntable having a top surface and a first end positioned opposite a second end, each of the first and second ends including a respective opening, each opening including two or more cutouts and two or more tabs, the turntable rotatable between first and second positions and an actuator system to adjust distances between the turntable and the substrate chuck and between the turntable and the pedestals.
1. An imprint lithography method, comprising:
positioning a turntable in a first position such that i) two or more cutouts of an opening of a first opening end positioned opposite a second opening end are in superimposition with a respective two or more pedestals and ii) a first pedestal end of the two or more pedestals extends away from a top surface of the turntable;
increasing a distance between the top surface of the turntable and a bottom surface of a substrate chuck comprising a top surface positioned opposite the bottom surface to transfer a first substrate from the two or more pedestals to two or more tabs of the opening of the first opening end of the turntable;
rotating the turntable from the first position to a second position such that i) the two or more tabs of the opening of the first opening end of the turntable are in superimposition with two or more channels of the substrate chuck and ii) the two or more cutouts of the opening of the second opening end are in superimposition with the two or more pedestals;
rotating the turntable from the first position to the second position; and
decreasing a distance between the top surface of the turntable and the bottom surface of the substrate chuck to transfer the first substrate from the two or more tabs of the opening of the first opening end of the turntable to the top surface of the substrate chuck while the two or more tabs of the opening of the first opening end are positioned within the channels of the substrate chuck.
2. The imprint lithography method of claim 1 , further comprising:
increasing the distance between the top surface of the turntable and the bottom surface of the substrate chuck subsequent to decreasing the distance between the top surface of the turntable and the bottom surface of the substrate chuck to i) transfer the first substrate, having a pattern formed thereon, from the substrate chuck to the two or more tabs of the opening of the first opening end of the turntable and ii) transfer a second substrate from the two or more pedestals to the two or more tabs of the opening of the second opening end of the turntable.
3. The imprint lithography method of claim 2 , further comprising:
increasing the distance between the top surface of the turntable and the bottom surface of the substrate chuck; and
rotating the turntable from the second position to the first position such that i) the two or more cutouts of the opening of the first opening end are in superimposition with the two or more pedestals and ii) the two or more tabs of the opening of the second opening end of the turntable are in superimposition with the two or more channels of the substrate chuck.
4. The imprint lithography method of claim 3 , further comprising:
decreasing the distance between the top surface of the turntable and the bottom surface of the substrate chuck subsequent to rotating the turntable from the second position to the first position to i) transfer the second substrate from the two or more tabs of the opening of the second opening end of the turntable to the top surface of the substrate chuck while the two or more tabs of the opening of the second opening end of the turntable are positioned within the channels of the substrate chuck and ii) transfer the first substrate, having a patterned formed thereon, from the two or more tabs of the opening of the first opening end of the turntable to the two or more pedestals.
5. The imprint lithography method of claim 1 , wherein a plane of the first substrate is maintained during the rotation of the turntable from the first position to the second position.
6. The imprint lithography method of claim 1 , further comprising forming a pattern on the first substrate subsequent to decreasing the distance between the top surface of the turntable and the bottom surface of the substrate chuck.
7. The imprint lithography method of claim 1 , further comprising:
rotating the turntable from the first position to a third position prior to rotating the turntable from the first position to the second position such that the first substrate positioned on the two or more tabs of the opening of the first opening end of the turntable is in superimposition with an inspection station; and
inspecting, by the inspection station and while the turntable is in the third position, the first substrate for one or more defects.