X-ray based measurements in patterned structure
A method and system are presented for use in X-ray based measurements on patterned structures. The method comprises: processing data indicative of measured signals corresponding to detected radiation response of a patterned structure to incident X-ray radiation, and subtracting from said data an effective measured signals substantially free of background noise, said effective measured signals being formed of radiation components of reflected diffraction orders such that model based interpretation of the effective measured signals enables determination of one or more parameters of the patterned structure, wherein said processing comprises: analyzing the measured signals and extracting therefrom a background signal corresponding to the background noise; and applying a filtering procedure to the measured signals to subtract therefrom signal corresponding to the background signal, resulting in the effective measured signal.
1. A method for use in X-ray based measurements on patterned structures, the method being carried out by a computer system and comprising:
processing, by a processor utility of the computer system, data indicative of measured signals corresponding to detected radiation response of a patterned structure to incident X-ray radiation, wherein the measured signals comprises (a) an angular span of diffraction orders that were scattered from the patterned structure, and (b) background signals;
deducing background signals within the angular span, based on background signals located outside the angular span; and
applying a filtering procedure to the measured signals to subtract from measured signals within the angular span, the deduced background signals within the angular span to provide effective measured signals that are, within the angular span, substantially free of the background signals.
2. The method according to claim 1 , wherein the deducing of the deduced background signals within the angular span comprises interpolating the background signals outside of the angular span.
3. The method according to claim 1 , wherein the deducing of the deduced background signals within the angular span comprises extrapolating the background signals outside of the angular span.
4. The method according to claim 1 wherein the deducing of the deduced background signals within the angular span comprises expanding the background signals outside of the angular span.
5. The method according to claim 1 , wherein different diffraction orders interact with different spatially separated regions on a radiation sensitive surface of a detector.
6. The method according to claim 5 , wherein the deducing of the deduced background signals within the angular span comprises ignoring signals originating from the different spatially separated regions on the radiation sensitive surface of the detector.
7. The method according to claim 5 wherein the radiation sensitive surface comprises a two dimensional array of pixel.
8. The method according to claim 1 , comprising determining a selected angular span of illumination that once applied results in a the different diffraction orders interact with different spatially separated regions on a radiation sensitive surface of a detector.
9. The method according to claim 8 , comprising performing one or more measurement sessions on the patterned structure using the selected angular span of illumination.
10. The method according to claim 1 wherein the deducing of the deduced background signals comprises deducing the background signals over an entire image acquired by a radiation sensitive surface of a detector.
11. The method of claim 1 , further comprising applying model based fitting procedure to the effective measured signals and determining one or more parameters of the patterned structure.
12. A control unit comprising: data input and output utilities, a memory utility, and a processor utility, said processor utility being configured and operable to process data indicative of measured signals corresponding to detected radiation response of a patterned structure to incident X-ray radiation wherein the measured signals comprise (a) an angular span of diffraction orders that were scattered from the patterned structure, and (b) background signals; processor utility being configured and operable to deduce background signals within the angular span, based on background signals located outside the angular span; and apply a filtering procedure to the measured signals to subtract from measured signals within the angular span, the deduced background signals within the angular span to provide effective measured signals that are, within the angular span, substantially free of the background signals.
13. The control unit according to claim 12 , further comprising: a measurement scheme controller, which is configured and operable to determine a selected angular span of illumination that once applied results in a having radiation components of different reflection orders interact with different spatially separated regions on a radiation sensitive surface of a detector.
14. The control unit according to claim 12 wherein the processor utility being configured and operable to deduce the deduced background signals within the angular span by expanding the background signals outside of the angular span.
15. The control unit according to claim 12 wherein the processor utility being configured and operable to deduce the deduced background signals within the angular span by interpolating the background signals outside of the angular span.
16. A measurement system for use in X-ray based measurements on patterned structures, the system comprising: an illumination unit configured and operable to define an illumination channel for directing illuminating radiation onto a measurement plane for interacting with a structure being measured; an angular span controller located in the illumination channel; a detection unit for detecting radiation response from the structure propagating along a collection channel; and a control unit configured for data communication with the illumination and detection units, the control unit comprising a measurement scheme controller, which is configured and operable to analyze data indicative of a pattern on the structure being measured, and generate measurement scheme data indicative of selected angular span θ ILL of illuminating radiation and azimuth orientation ϕ ILL with respect to the pattern to provide an angular span ϕ COL of reflection orders in the radiation response of the structure such that radiation components of different reflection orders interact with different spatially separated regions on a radiation sensitive surface of the detector;
wherein said control unit comprises data input and output utilities, a memory utility, and a processor utility, the processor utility being configured and operable to process data indicative of measured signals corresponding to detected radiation response of a patterned structure to incident X-ray radiation, wherein the measured signals comprise (a) an angular span of diffraction orders that were scattered from the patterned structure, and (b) background signals; wherein the processor utility being configured and operable to deduce background signals within the angular span, based on background signals located outside the angular span; and apply a filtering procedure to the measured signals to subtract from measured signals within the angular span, the deduced background signals within the angular span to provide effective measured signals that are, within the angular span, substantially free of the background signals.
17. The system according to claim 16 , wherein said angular span controller comprises an aperture assembly of controllably varying dimension to enable selection of an aperture dimension according to the selected measurement scheme.
18. The system according to claim 16 , The control unit according to claim 12 wherein the processor utility being configured and operable to deduce the deduced background signals within the angular span by extrapolating the background signals outside of the angular span.
19. The system according to claim 16 , wherein said angular span controller comprises an aperture assembly of controllably varying shape to enable selection of an aperture shape according to the selected measurement scheme.
20. The system according to claim 17 , wherein said angular span controller further comprises an aperture assembly of controllably varying shape to enable selection of an aperture shape according to the selected measurement scheme.