Integrated Vapor Transport Deposition Method and System
A vapor transport deposition system and method that includes a vaporizer and distributor unit and at least one auxiliary process unit for integrating thin-film layer deposition with one or more pre- or post-deposition processes.
1 . A method for manufacturing a photovoltaic device comprising:
depositing a thin film layer on a substrate using an integrated deposition apparatus; and
performing a first pre- or post-deposition process on the substrate using said integrated deposition apparatus.
2 . The method of claim 1 , wherein the step of depositing a thin film layer on a substrate further comprises:
vaporizing a material powder into a vapor;
collecting the vapor in a vapor distribution unit of said apparatus; and
outputting the vapor from the vapor distribution unit to be deposited onto the substrate.
3 . The method of claim 2 , wherein the step of performing a pre- or post-deposition process on the substrate further comprises performing a thermal heat treatment.
4 . The method of claim 2 , wherein the step of performing a pre- or post-deposition process on the substrate further comprises:
inputting a process material into a first auxiliary process unit of said apparatus; and
outputting the process material from the first auxiliary process unit towards a substrate.
5 . The method of claim 4 , wherein the step of collecting the vapor in the vapor distribution unit further comprises:
capturing the vapor from the vaporizer unit in a vapor housing; and
passing the vapor from the vapor housing to a chamber in the vapor distribution unit.
6 . The method of claim 5 , wherein the step of inputting a process material into a first auxiliary process unit further comprises:
inputting a process material from a material source into at least one inlet in the first auxiliary process unit;
capturing the process material in a manifold housing of the first auxiliary process unit; and
directing the process material towards an opening in the manifold housing.
7 . The method of claim 1 , wherein the step of performing a pre- or post-deposition process on the substrate comprising performing a pre-deposition process.
8 . The method of claim 7 , wherein the step of performing a pre-deposition process comprises forming an upstream inert gas curtain adjacent to the substrate to achieve local ambient control.
9 . The method of claim 7 , wherein the step of performing a pre-deposition process comprises performing a pre-deposition chemical treatment with a process gas.
10 . The method of claim 7 , wherein the step of performing a pre-deposition process comprises performing a pre-deposition thermal-chemical treatment with a process gas and radiant heat.
11 . The method of claim 7 , wherein the step of performing a pre-deposition process comprises performing a pre-deposition thermal treatment of the substrate with radiant heat and without gas flow.
12 . The method of claim 7 , wherein the step of performing a pre-deposition process comprises providing a vapor to form a material layer on the substrate.
13 . The method of claim 1 , wherein the step of performing a pre- or post-deposition process on the substrate comprising performing a post-deposition process.
14 . The method of claim 13 , wherein the step of performing a post-deposition process comprises forming an downstream inert gas curtain adjacent to the substrate to achieve local ambient control.
15 . The method of claim 13 , wherein the step of performing a post-deposition process comprises performing a post-deposition chemical treatment with a process gas.
16 . The method of claim 13 , wherein the step of performing a post-deposition process comprises performing a post-deposition thermal-chemical treatment with a process gas and radiant heat.
17 . The method of claim 13 , wherein the step of performing a post-deposition process comprises performing a post-deposition thermal treatment of the substrate with radiant heat and without gas flow.
18 . The method of claim 13 , wherein the step of performing a post-deposition process comprises providing a vapor to form a material layer on a deposited layer on the substrate.
19 . The method of claim 6 , further comprising:
performing a second pre- or post-deposition process on the substrate using said integrated deposition apparatus.
20 . The method of claim 19 , further comprising:
inputting a process material into a second auxiliary process unit of said apparatus; and
outputting the process material from the second auxiliary process unit towards the substrate.
21 . The method of claim 20 , further comprising:
directing the substrate under the first auxiliary process unit for a pre-deposition process;
after directing the substrate under the first auxiliary process unit, directing the substrate under the vapor distribution unit; and
after directing the substrate under the vapor distribution unit, directing the substrate under the second auxiliary process unit for a post deposition process.