Integrated assemblies which include non-conductive-semiconductor-material and conductive-semiconductor-material, and methods of forming integrated assemblies

1. An integrated assembly, comprising:

laterally-spaced digit-line-contact-regions; the digit-line-contact-regions being comprised by pillars of active-region-material; intervening regions being between the laterally-spaced digit-line-contact-regions;

non-conductive-semiconductor-material over the intervening regions; openings extending through the non-conductive-semiconductor-material to the digit-line-contact-regions; a lower surface of the non-conductive-semiconductor-material being vertically-spaced from upper surfaces of the digit-line-contact-regions;

conductive-semiconductor-material-interconnects within the openings and coupled with the digit-line-contact-regions, upper surfaces of the conductive-semiconductor-material-interconnects being beneath the lower surface of the non-conductive-semiconductor-material; and

metal-containing-digit-lines over the non-conductive-semiconductor-material; conductive regions extending downwardly from the metal-containing-digit-lines to couple with the conductive-semiconductor-material-interconnects.

2. The integrated assembly of claim 1 wherein the conductive-semiconductor-material-interconnects are directly against the digit-line-contact-regions.

3. The integrated assembly of claim 1 wherein the digit-line-contact-regions have a first lateral thickness along a cross-section, and wherein the conductive-semiconductor-material-interconnects have a second lateral thickness along the cross-section; the second lateral thickness being about the same as the first lateral thickness.

4. The integrated assembly of claim 1 wherein the digit-line-contact-regions have a first lateral thickness along a cross-section, and wherein the conductive-semiconductor-material-interconnects have a second lateral thickness along the cross-section; the second lateral thickness being different than the first lateral thickness.

5. The integrated assembly of claim 1 wherein the digit-line-contact-regions have a first lateral thickness along a cross-section, and wherein the conductive-semiconductor-material-interconnects have a second lateral thickness along the cross-section; the second lateral thickness larger than the first lateral thickness.

6. The integrated assembly of claim 1 wherein the conductive-semiconductor-material-interconnects and the active-region-material comprise a same semiconductor composition as one another.

7. The integrated assembly of claim 1 wherein the conductive-semiconductor-material-interconnects and the active-region-material comprise different semiconductor compositions relative to one another.

8. The integrated assembly of claim 1 wherein the non-conductive-semiconductor-material and the conductive-semiconductor-material-interconnects comprise a same semiconductor composition as one another.

9. The integrated assembly claim 8 wherein said same composition comprises silicon.

10. The integrated assembly of claim 1 wherein the non-conductive-semiconductor-material and the conductive-semiconductor-material-interconnects comprise different semiconductor compositions relative to one another.

11. The integrated assembly of claim 1 wherein segments of the metal-containing-digit-lines extend across the intervening regions between the laterally-spaced digit-line-contact-regions; and wherein said segments have lower surfaces directly against an upper surface of the non-conductive-semiconductor-material.

12. The integrated assembly of claim 1 wherein segments of the metal-containing-digit-lines extend across the intervening regions between the laterally-spaced digit-line-contact-regions; and further comprising at least one insulative material between lower surfaces of said segments and an upper surface of the non-conductive-semiconductor-material.

13. The integrated assembly of claim 12 wherein said at least one insulative material includes silicon nitride.

14. The integrated assembly of claim 1 comprising:

charge-storage-device-contact-regions gatedly coupled with the digit-line-contact-regions; and

charge-storage-devices coupled with the charge-storage-device-contact-regions.

15. An integrated assembly, comprising:

an access transistor including a digit-line-contact-region;

non-conductive-semiconductor-material over the access transistor, the non-conductive-semiconductor-material including an opening that is vertically aligned with the digit-line-contact-region;

insulative material between the non-conductive-semiconductor-material and the access transistor;

a digit line over the non-conductive-semiconductor-material, the digit line including a conductive interconnect protruding from a part of the digit line toward the digit-line-contact-region;

wherein each of the digit line and the conductive interconnect comprises metal;

wherein the conductive interconnect penetrates through the opening and is in electrical contact with the digit-line-contact-region;

wherein the insulative material includes an additional opening that is vertically aligned with the digit-line-contact-region; and

wherein the conductive interconnect of the digit line further penetrates through the additional opening.

16. The integrated assembly of claim 15 , further comprising additional insulative material between the non-conductive-semiconductor-material and the digit line;

wherein the additional insulative material includes a further additional opening that is vertically aligned with the digit-line-contact-region; and

wherein the conductive interconnect of the digit line further penetrates through the further additional opening.

17. An integrated assembly comprising:

a plurality of access transistors, each of the plurality of access transistor including a digit-line-contact-region;

non-conductive material over the plurality of access transistors, the non-conductive material comprising insulative material and non-conductive-semiconductor-material over the insulative material, the non-conductive material including a plurality of openings to expose at least one part of the digit-line-contact-region of an associated one of the plurality of access transistors;

a plurality of conductive-semiconductor-material-interconnects each in an associated one of the plurality of openings to make an electrical contact with the at least one part of the digit-line-contact-region of an associated one of the plurality of access transistors, each of the plurality of conductive-semiconductor-material-interconnects being recessed to leave a part of an associated one of the plurality of openings so that each of the plurality of conductive-semiconductor-material-interconnects is free from being contact with the non-conductive-semiconductor-material; and

at least one digit line over the non-conductive material, the at least one digit line including a plurality of conductive interconnects each protruded downwardly to fill the part of an associated one of the plurality of openings.

18. The integrated assemble of claim 17 , wherein each of at least one digit line and the plurality of conductive interconnects comprises metal.

19. The integrated assembly of claim 18 , wherein the non-conductive-semiconductor-material comprises polysilicon doped with substantially no impurities to indicate no conductivity and each of the conductive-semiconductor-material-interconnects comprises polysilicon doped with impurities to indicate conductivity.

20. The integrated assembly of claim 18 ,

wherein each of the plurality of access transistors further includes a charge-storage-device-contact region; and

wherein the integrated assembly further comprises a plurality of charge storage devices each coupled to the charge-storage-device-contact region of an associated one of the plurality of access transistors.

21. The integrated assembly of claim 20 , wherein each of the plurality of charge storage devices comprises a capacitor.

22. The integrated assembly of claim 17 , wherein the non-conductive material further comprises additional insulative material over the non-conductive-semiconductor-material.