Method of transferring micro devices
A method of transferring micro devices is provided. A carrier substrate including a buffer layer and a plurality of micro devices is provided. The buffer layer is located between the carrier substrate and the micro devices. The micro devices are separated from one another and positioned on the carrier substrate through the buffer layer. A receiving substrate contacts the micro devices disposed on the carrier substrate. A temperature of at least one of the carrier substrate and the receiving substrate is changed after the micro devices contact the receiving substrate. At least a portion of the micro devices are transferred from the carrier substrate onto the receiving substrate after changing the temperature of at least one of the carrier substrate and the receiving substrate.
1. A method of transferring micro devices, comprising:
providing a carrier substrate, on which a buffer layer and a plurality of micro devices are disposed, the buffer layer being located between the carrier substrate and the micro devices, the micro devices being separated from one another and positioned on the carrier substrate through the buffer layer;
making a receiving substrate contact the micro devices on the carrier substrate; and
changing a temperature of at least one of the carrier substrate and the receiving substrate after the micro devices contact the receiving substrate, wherein at least a portion of the micro devices are transferred from the carrier substrate onto the receiving substrate after changing the temperature of at least one of the carrier substrate and the receiving substrate,
wherein making the receiving substrate contact the micro devices on the carrier substrate comprises providing a bonding layer between the micro devices and the receiving substrate, the micro devices contacting the receiving substrate through the bonding layer,
wherein each micro device comprises a plurality of conductive connectors, and when the conductive connectors of each micro device are made in contact with the bonding layer, at least a portion of each of the conductive connectors is submerged into the bonding layer.
2. The method of transferring micro devices as recited in claim 1 , wherein changing the temperature of at least one of the carrier substrate and the receiving substrate comprises:
changing the temperature of the carrier substrate to reduce bonding force between the at least a portion of the micro devices and the carrier substrate.
3. The method of transferring micro devices as recited in claim 2 , wherein changing the temperature of at least one of the carrier substrate and the receiving substrate further comprises:
changing the temperature of the receiving substrate to enhance the bonding force between the at least a portion of the micro devices and the receiving substrate after changing the temperature of the carrier substrate to reduce the bonding force between the at least a portion of the micro devices and the carrier substrate.
4. The method of transferring micro devices as recited in claim 2 , after changing the temperature of at least one of the carrier substrate and the receiving substrate and before the at least a portion of the micro devices are transferred from the carrier substrate onto the receiving substrate, the method further comprises:
removing the carrier substrate from the micro devices, so that at least a portion of the micro devices are transferred from the carrier substrate onto the receiving substrate.
5. The method of transferring micro devices as recited in claim 4 , wherein removing the carrier substrate from the micro devices comprises performing a laser ablation process, an ultraviolet light irradiating process, a solution decomposition process, a thermal decomposition process, or a combination thereof.
6. The method of transferring micro devices as recited in claim 2 , wherein changing the temperature of at least one of the carrier substrate and the receiving substrate comprises elevating the temperature of at least one of the carrier substrate and the receiving substrate in a ramping manner.
7. The method of transferring micro devices as recited in claim 2 , wherein changing the temperature of at least one of the carrier substrate and the receiving substrate comprises elevating the temperature of at least one of the carrier substrate and the receiving substrate in a continuous manner.
8. The method of transferring micro devices as recited in claim 2 , further comprising applying a pressure to the carrier substrate.
9. The method of transferring micro devices as recited in claim 8 , wherein the pressure is applied in a ramping manner.
10. The method of transferring micro devices as recited in claim 8 , wherein the pressure is applied in a continuous manner.
11. The method of transferring micro devices as recited in claim 1 , wherein the bonding layer comprises an insulating film and a plurality of conductive particles, and the conductive particles are dispersed in the insulating film.
12. The method of transferring micro devices as recited in claim 11 , wherein a size of one of the conductive particles after the portion of the micro devices are transferred from the carrier substrate onto the receiving substrate is less than or equal to ½ of a size of the one of the conductive particles before the portion of the micro devices are transferred from the carrier substrate onto the receiving substrate.
13. The method of transferring micro devices as recited in claim 1 , wherein a thickness of the bonding layer is larger than or equal to a thickness of the conductive connectors before the portion of the micro devices are transferred from the carrier substrate onto the receiving substrate.
14. The method of transferring micro devices as recited in claim 1 , wherein the bonding layer comprises a plurality of bonding parts, and the bonding parts correspond to the conducive connectors.
15. The method of transferring micro devices as recited in claim 1 , further comprising:
changing a temperature of at least one of the carrier substrate and the receiving substrate before making the receiving substrate contact the micro devices on the carrier substrate.
16. The method of transferring micro devices as recited in claim 15 , wherein changing the temperature of at least one of the carrier substrate and the receiving substrate before making the receiving substrate contact the micro devices on the carrier substrate comprises elevating the temperature of the at least one of the carrier substrate and the receiving substrate in a ramping manner.
17. The method of transferring micro devices as recited in claim 15 , wherein changing the temperature of at least one of the carrier substrate and the receiving substrate before making the receiving substrate contact the micro devices on the carrier substrate comprises elevating the temperature of at least one of the carrier substrate and the receiving substrate in a continuous manner.
18. The method of transferring micro devices as recited in claim 15 , wherein a change in temperature of at least one of the carrier substrate and the receiving substrate before making the receiving substrate contact the micro devices on the carrier substrate is smaller than a change in temperature of the at least one carrier substrate and the receiving substrate after making the receiving substrate contact the micro devices on the carrier substrate.
19. The method of transferring micro devices as recited in claim 15 , wherein a change in temperature of the at least one of the carrier substrate and the receiving substrate before making the receiving substrate contact the micro devices on the carrier substrate is less than or equal to 100 degree Celsius.