Integrated assemblies comprising ferroelectric transistors and non-ferroelectric transistors
View Patent ↗Some embodiments include an integrated assembly having a semiconductor structure extending from a first wiring to a second wiring. A ferroelectric transistor includes a first transistor gate adjacent a first region of the semiconductor structure. A first non-ferroelectric transistor includes a second transistor gate adjacent a second region of the semiconductor structure. The second region of the semiconductor structure is between the first region of the semiconductor structure and the first wiring. A second non-ferroelectric transistor includes a third transistor gate adjacent a third region of the semiconductor structure. The third region of the semiconductor structure is between the first region of the semiconductor structure and the second wiring.
1. An integrated assembly, comprising:
a semiconductor structure coupled with a conductive structure;
an insulative structure lining an entirety of a vertical sidewall surface of the semiconductor structure, the insulative structure having a first portion comprising a ferroelectric material and a second portion comprising an insulative material, the ferroelectric material being in direct physical contact with the insulative material;
a ferroelectric transistor comprising a first transistor gate along a first region of the semiconductor structure and spaced from the first region by the ferroelectric material; and
a non-ferroelectric transistor comprising a second transistor gate adjacent along a second region of the semiconductor structure and spaced from the second region by the insulative material; the second region of the semiconductor structure being between the first region of the semiconductor structure and the conductive structure.
2. The integrated assembly of claim 1 wherein the first region is a same composition as the second region.
3. The integrated assembly of claim 1 wherein the first region is a different composition relative to the second region.
4. The integrated assembly of claim 1 wherein the first and second transistor gates are vertically spaced from one another.
5. The integrated assembly of claim 4 wherein the first and second transistor gates are coupled to different voltage sources relative to one another.
6. The integrated assembly of claim 4 wherein the first and second transistor gates are coupled to a common voltage source.
7. The integrated assembly of claim 1 wherein a single conductive structure comprises the first and second transistor gates.
8. The integrated assembly of claim 7 wherein said single conductive structure has a region of the first transistor gate which is different in composition relative to a region of the second transistor gate directly against said region of the first transistor gate.
9. An integrated assembly, comprising:
a semiconductor structure extending from a first wiring to a second wiring;
a ferroelectric transistor comprising a first transistor gate adjacent a first region of the semiconductor structure;
a first non-ferroelectric transistor comprising a second transistor gate adjacent a second region of the semiconductor structure; the second region of the semiconductor structure being between the first region of the semiconductor structure and the first wiring; and
a second non-ferroelectric transistor comprising a third transistor gate adjacent a third region of the semiconductor structure; the third region of the semiconductor structure being between the first region of the semiconductor structure and the second wiring; and wherein:
the first transistor gate is spaced from the first region by a first intervening region comprising ferroelectric material;
the second transistor gate is spaced from the second region by a second intervening region comprising first insulative material;
the third transistor gate is spaced from the third region by a third intervening region comprising second insulative material;
an upper portion of the ferroelectric material abuts directly against the first insulative material; and
a lower portion of the ferroelectric material abuts directly against the second insulative material.
10. The integrated assembly of claim 9 wherein the first, second and third transistor gates are coupled with a common voltage source.
11. The integrated assembly of claim 9 wherein the second and third transistor gates are coupled with a common voltage source, and wherein the first transistor gate is coupled with another voltage source which is different from said common voltage source.
12. The integrated assembly of claim 9 wherein the first and second wirings are first and second digit lines which are comparatively coupled to one another through a sense amplifier.
13. The integrated assembly of claim 12 being one of many substantially identical memory cells within a memory array.
14. The integrated assembly of claim 9 wherein the second region is over the first region, which in turn is over the third region.
15. The integrated assembly of claim 9 wherein the first region is directly against the second region, and is directly against the third region.
16. The integrated assembly of claim 9 wherein:
the first region of the semiconductor structure is between first and second source/drain sections;
the second region of the semiconductor structure is between third and fourth source/drain sections;
the third region of the semiconductor structure is between fifth and sixth source/drain sections;
the first source/drain section is coupled with the fourth source/drain section;
the second source/drain section is coupled with the fifth source/drain section;
the third source/drain section is coupled with the first wiring; and
the sixth source/drain section is coupled with the second wiring.
17. The integrated assembly of claim 9 wherein the first, second and third regions of the semiconductor structure comprise a same composition as one another.
18. The integrated assembly of claim 9 wherein at least one of the first, second and third regions of the semiconductor structure comprises a different composition relative to another the first, second and third regions of the semiconductor structure.
19. An integrated assembly, comprising:
a first comparative digit line over a second comparative digit line;
a semiconductor pillar extending from the first comparative digit line to the second comparative digit line;
a first non-ferroelectric transistor under the first comparative digit line and gating an upper region of the semiconductor pillar, the first non-ferroelectric transistor comprising a first gate spaced from the upper region of the semiconductor material by a first insulative material;
a ferroelectric transistor under the first non-ferroelectric transistor and gating a middle region of the semiconductor pillar, the ferroelectric transistor comprising a second gate spaced from the middle region of the semiconductor material by a ferroelectric material; and
a second non-ferroelectric transistor under the ferroelectric transistor and gating a lower region of the semiconductor pillar, the second non-ferroelectric transistor comprising a third gate spaced from the lower region of the semiconductor material by a second insulative material, the ferroelectric material being in direct physical contact with each of the first and second insulative materials.
20. The integrated assembly of claim 19 wherein:
the first non-ferroelectric transistor comprises a first transistor gate;
the second non-ferroelectric transistor comprises a second transistor gate;
the ferroelectric transistor comprises a third transistor gate; and
the first, second and third transistor gates are vertically spaced from one another.
21. The integrated assembly of claim 19 wherein:
the first non-ferroelectric transistor comprises a first transistor gate;
the second non-ferroelectric transistor comprises a second transistor gate;
the ferroelectric transistor comprises a third transistor gate; and
a single conductive structure comprises the first, second and third transistor gates.
22. The integrated assembly of claim 21 wherein said single conductive structure has a region of the third transistor gate which is different in composition relative to regions of the first and second transistor gates directly against said region of the third transistor gate.
23. The integrated assembly of claim 19 wherein:
the first non-ferroelectric transistor comprises a first transistor gate;
the second non-ferroelectric transistor comprises a second transistor gate;
the ferroelectric transistor comprises a third transistor gate; and
the first, second and third transistor gates are coupled with a common voltage source.
24. The integrated assembly of claim 19 wherein:
the first non-ferroelectric transistor comprises a first transistor gate;
the second non-ferroelectric transistor comprises a second transistor gate;
the ferroelectric transistor comprises a third transistor gate;
the first and second transistor gates are coupled with a common voltage source; and
the third transistor gate is coupled with another voltage source which is different from said common voltage source.
25. The integrated assembly of claim 24 configured to refresh the first and second non-ferroelectric transistors to remove excess charge buildup along channel regions associated with the first and second non-ferroelectric transistors.
26. The integrated assembly of claim 19 being configured as one of many substantially identical memory cells within a memory array.