PATTERN FORMATION METHOD, BLOCK COPOLYMER, AND PATTERN FORMATION MATERIAL
According to one embodiment, a pattern formation method is disclosed. The method includes a preparation process, a block copolymer layer formation process, and a contact process. The preparation process includes preparing a pattern formation material including a block copolymer including a first block and a second block. The first block includes a first main chain and a plurality of first side chains. At least one of the first side chains includes a plurality of carbonyl groups. The block copolymer layer formation process includes forming a block copolymer layer on a first member. The block copolymer layer includes the pattern formation material and includes a first region and a second region. The first region includes the first block. The second region includes the second block. The contact process includes causing the block copolymer layer to contact a metal compound including a metallic element.
1 . A pattern formation method, comprising:
a preparation process of preparing a pattern formation material including a block copolymer including a first block and a second block, the first block including a first main chain and a plurality of first side chains, at least one of the first side chains including a plurality of carbonyl groups;
a block copolymer layer formation process of forming a block copolymer layer on a first member, the block copolymer layer including the pattern formation material and including a first region and a second region, the first region including the first block, the second region including the second block; and
a contact process of causing the block copolymer layer to contact a metal compound including a metallic element.
2 . The method according to claim 1 , wherein the block copolymer layer formation process includes phase separation of the first block and the second block.
3 . The method according to claim 1 , wherein a direction from the first region toward the second region is along the first member.
4 . The method according to claim 1 , wherein the first block includes at least one selected from the group consisting of an acrylic acid ester structure and a methacrylic acid ester structure.
5 . The method according to claim 1 , wherein the first block includes at least one selected from the group consisting of acetonyl acrylic acid ester and acetonyl methacrylic acid ester.
6 . The method according to claim 1 , wherein the second block includes a second main chain and a plurality of second side chains, at least one of the second side chain not including a plurality of carbonyl groups.
7 . The method according to claim 1 , wherein
the second block includes a second main chain and a plurality of second side chains, and
at least one of the second side chains includes at least one selected from the group consisting of benzene, naphthalene, and methyl.
8 . The method according to claim 1 , wherein
the second block includes a second main chain, and
the second main chain includes at least one selected from the group consisting of a double bond and an ether bond.
9 . The method according to claim 1 , wherein
the second block does not include a carbonyl group, or
the second block includes a carbonyl group, and a ratio of a concentration of the carbonyl group included in the second block to a concentration of the carbonyl group included in the first block is 0.5 or less.
10 . The method according to claim 1 , wherein the contact process includes causing the block copolymer layer to contact at least one of a liquid including the metal compound or a gas including the metal compound.
11 . The method according to claim 1 , wherein the metallic element includes at least one selected from the group consisting of aluminum, zinc, titanium, and tungsten.
12 . The method according to claim 1 , including removing at least a portion of the second region and removing at least a portion of the first member after the contact process, the at least a portion of the first member not overlapping the first region.
13 . A block copolymer, comprising:
a first block; and
a second block,
the first block including a first main chain and a plurality of first side chains,
at least one of the first side chains including a plurality of carbonyl groups,
a number of carbon atoms included in the at least one of the first side chains being not less than 3 but less than 7,
a number of oxygen atoms included in the at least one of the first side chains being not less than 2 but less than 5,
a terminal of the at least one of the first side chains being a hydrocarbon.
14 . The block copolymer according to claim 13 , wherein the first block includes at least one selected from the group consisting of an acrylic acid ester structure and a methacrylic acid ester structure.
15 . The block copolymer according to claim 13 , wherein the first block includes at least one selected from the group consisting of acetonyl acrylic acid ester and acetonyl methacrylic acid ester.
16 . The block copolymer according to claim 13 , wherein
the second block includes a second main chain and a plurality of second side chains, and
at least one of the second side chains does not include a plurality of carbonyl groups.
17 . The block copolymer according to claim 13 , wherein
the second block includes a second main chain and a plurality of second side chains, and
at least one of the second side chains includes at least one selected from the group consisting of benzene, naphthalene, and methyl.
18 . The block copolymer according to claim 13 , wherein
the second block includes a second main chain, and
the second main chain includes at least one selected from the group consisting of a double bond and an ether bond.
19 . The block copolymer according to claim 13 , wherein
the second block does not include a carbonyl group, or
the second block includes a carbonyl group, and a ratio of a concentration of the carbonyl group included in the second block to a concentration of the carbonyl group included in the first block is 0.5 or less.
20 . A pattern formation material, comprising:
the block copolymer according to claim 13 ; and
a solvent.