IP Library Granted Patent US 10,613,358
Granted Patent B2
US 10,613,358 · App. 16/057,508 · Granted Apr 7, 2020

Method and system for a low-voltage integrated silicon high-speed modulator

Inventors: Ali Ayazi (San Diego, CA); Kam-Yan Hon (Oceanside, CA); Gianlorenzo Masini (Carlsbad, CA)
Assignee: Luxtera, Inc.
G02F1/025G02F1/0123G02F1/2255G02F1/2257H04B10/501H04B10/505H04B10/516H04B10/54G02F2001/212G02F2201/063
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Quick Facts
Patent No.
US 10,613,358
App. No.
16/057,508
Granted
Apr 7, 2020
Kind
B2
Abstract

Methods and systems for a low-voltage integrated silicon high-speed modulator may include an optical modulator comprising first and second optical waveguides and two optical phase shifters, where each of the two optical phase shifters may comprise a p-n junction with a horizontal section and a vertical section and an optical signal is communicated to the first optical waveguide. A portion of the optical signal may then be coupled to the second optical waveguide. A phase of at least one optical signal in the waveguides may be modulated utilizing the optical phase shifters. A portion of the phase modulated optical signals may be coupled between the two waveguides, thereby generating two output signals from the modulator. A modulating signal may be applied to the phase shifters which may include a reverse bias.

Claims (44)

1. A method for communication, the method comprising:

in an optical modulator comprising an optical waveguide and an optical phase shifter, the optical phase shifter comprising a p-n junction with a horizontal section and a vertical section, wherein;

an n-doped region is in a slab waveguide portion and in a rib waveguide portion of the phase shifter and a p-doped region is in the slab waveguide portion but not in the rib waveguide portion;

a p+ doped region is adjacent to the p-doped region and extends from the p-doped region to a p++ region;

a n+ doped region is adjacent to the p-doped region and extends from the n-doped region to a n++ region; and

a top surface of the p++ region and a top surface of the n++ region are above a top surface of the slab waveguide portion of the phase shifter:

communicating an optical signal to the optical waveguide; and

modulating a phase of the optical signal in the waveguide utilizing the optical phase shifter.

2. The method according to claim 1 , comprising reverse-biasing the p-n junction of the phase shifter.

3. The method according to claim 1 , comprising applying a modulating signal to the phase shifter.

4. The method according to claim 1 , wherein the horizontal and vertical sections of the p-n junction form an “L” shape.

5. The method according to claim 1 , wherein the p-n junction comprises three rectangular sections, a first section being a p-type semiconductor layer, a second section being a portion of an n-type semiconductor layer coplanar with the first section, and a third section being another portion of the n-type semiconductor layer but formed above the first and second sections.

6. The method according to claim 5 , comprising reverse biasing the p-n junction such that a depletion width of the p-n junction extends across most but not all of the third section.

7. The method according to claim 1 , wherein the modulator is integrated in silicon.

8. The method according to claim 1 , wherein the horizontal section of the p-n junction is at an intersection of the rib waveguide portion and the slab waveguide portion and the vertical section of the p-n junction is only in the slab waveguide portion.

9. The method according to claim 1 , wherein the modulator is integrated in a CMOS chip.

10. The method according to claim 1 , wherein the p-n junction is formed by ion implantation.

11. A system for communication, the system comprising:

an optical modulator comprising an optical waveguide and a phase shifter, wherein the optical phase shifter comprises a p-n junction with a horizontal section and a vertical section, wherein:

an n-doped region is in a slab waveguide portion and in a rib waveguide portion of the phase shifter and a p-doped region is in the slab waveguide portion but not in the rib waveguide portion;

a p+ doped region is adjacent to the p-doped region and extends from the p-doped region to a p++ region;

a n+ doped region is adjacent to the p-doped region and extends from the n-doped region to a n++ region; and

a top surface of the p++ region and a top surface of the n++ region are above a top surface of the slab waveguide portion of the phase shifter,

and wherein the optical modulator is operable to:

receive an optical signal in the optical waveguide; and

modulate a phase of the optical signal in the waveguide utilizing the optical phase shifter.

12. The system according to claim 11 , wherein said phase shifter is reverse-biased.

13. The system according to claim 11 , wherein said modulator is operable to modulate a received signal when a modulating signal is applied to the phase shifter.

14. The system according to claim 11 , wherein the horizontal and vertical sections of the p-n junction form an “L” shape.

15. The system according to claim 11 , wherein the p-n junction comprises three rectangular sections, a first section being a p-type semiconductor layer, a second section being a portion of an n-type semiconductor layer coplanar with the first section, and a third section being another portion of the n-type semiconductor layer but formed above the first and second sections.

16. The system according to claim 15 , wherein a reverse bias is applied to the p-n junction such that a depletion width of the p-n junction extends across most but not all of the third section.

17. The system according to claim 11 , wherein the modulator is integrated in silicon.

18. The system according to claim 11 , wherein the horizontal section of the p-n junction is at an intersection of the rib waveguide portion and the slab waveguide portion and the vertical section of the p-n junction is only in the slab waveguide portion.

19. The system according to claim 11 , wherein the p-n junction is formed by ion implantation.

20. A system for communication, the system comprising:

an optical modulator in a silicon photonic transceiver, said optical modulator comprising:

an optical waveguide;

an optical phase shifter comprising a rib waveguide section on top of a slab waveguide section and a p-n junction with a horizontal section and a vertical section, wherein the horizontal section is formed by a portion of an n-doped layer formed on a p-doped layer where the p-doped layer is in the slab waveguide section but not in the rib waveguide portion, wherein:

the vertical portion is formed by another portion of the n-doped layer that is in the same plane as the p-doped layer;

a p+ doped layer is adjacent to the p-doped layer and extends from the p-doped layer to a p++ region;

a n+ doped region is adjacent to the p-doped region and extends from the n-doped region to a n++ region; and

a top surface of the p++ region and a top surface of the n++ region are above a top surface of the slab waveguide section of the phase shifter, and wherein the optical modulator is operable to:

receive an optical signal in the optical waveguide; and

modulate a phase of the optical signal in the waveguide utilizing the optical phase shifter.

Assignments (3)
CORRECTIVE ASSIGNMENT TO CORRECT THE THE ASSIGNOR'S NAME PREVIOUSLY RECORDED AT REEL: 058979 FRAME: 0027. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Mar 24, 2022
From: LUXTERA LLC
To: CISCO TECHNOLOGY, INC.
Reel/Frame 059496/0803 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 8, 2022
From: CISCO SYSTEMS, INC.
To: CISCO TECHNOLOGY, INC.
Reel/Frame 058979/0027 →
CHANGE OF NAME Recorded Feb 6, 2020
From: LUXTERA, INC.
To: LUXTERA LLC
Reel/Frame 052019/0811 →
Continuity (4)
Continuation 15402400 · Jan 10, 2017
Continuation 14217743 · Mar 18, 2014
Provisional Application 61852702 · Mar 19, 2013
Related Publication 20180348550A1 · Dec 6, 2018