Optical apparatus and methods and computer program products useful for manufacturing same

1. An optical apparatus comprising:

a MEMS substrate having a surface; and

a stack of optical coatings which is deposited on the MEMS substrate's surface and which modifies at least one property of light impinging on the stack,

wherein said at least one property comprises polarity,

wherein the substrate comprises a scanning mirror and wherein the stack of optical coatings when deposited on the scanning mirror, reflects light, having wavelength in a given range and impinging on the stack at at least one angle, and also modifies at least one property of the light impinging at the at least one angle, thereby to generate reflected light which differs in at least one property from the light impinging at the at least one angle, and

wherein the optical coatings are pre-tested to ensure that when the optical coatings are deposited on the MEMS substrate, the MEMS substrate does not break and does not bend.

2. The optical apparatus according to claim 1 , wherein the optical coatings are configured to provide Quarter Wave Plate (QWP) properties to the substrate.

3. The optical apparatus according to claim 1 , wherein the optical coatings are configured to provide Half Wave Plate (HWP) properties to the substrate.

4. The optical apparatus according to claim 1 , wherein Chemical vapor deposition (CVD) is used to deposit the coatings on the substrate.

5. The optical apparatus according to claim 1 , wherein the given range comprises a visible light range.

6. The optical apparatus according to claim 1 , wherein the stack modifies at least one property of the light at least in a given range of wavelengths.

7. The optical apparatus according to claim 1 , wherein the apparatus includes a gimballed mounting for the mirror.

8. A method for manufacturing optical apparatus comprising:

providing a MEMS substrate having a surface; and

depositing on the MEMS substrate's surface a stack of optical coatings which when so deposited, modifies at least one property of light impinging on the stack,

wherein said at least one property comprises polarity,

wherein the substrate comprises a scanning mirror and wherein the stack of optical coatings when deposited on the scanning mirror, reflects light, having wavelength in a given range and impinging on the stack at at least one angle, and also modifies at least one property of the light impinging at the at least one angle, thereby to generate reflected light which differs in at least one property from the light impinging at the at least one angle, and

wherein the optical coatings are pre-tested to ensure that when the optical coatings are deposited on the MEMS substrate, the MEMS substrate does not break and does not bend.

9. The method according to claim 8 , further comprising:

designing plural stacks of optical coatings to perform a given modification on light of a given wavelength, wherein the optical coating for each stack includes a given predetermined number of layers, thereby to generate a range of stacks extending from a first stack with n layers and applying stress s 1 on the MEMS substrate to a last stack with N>n layers hence applying stress s 2 >s 1 on the mems substrate; and

selecting a first one of the plural stacks and manufacturing a first run of optical devices accordingly.

10. The method according to claim 9 , further comprising selecting a second one of the plural stacks and manufacturing a second run of optical devices accordingly.

11. The optical apparatus according to claim 6 , wherein said given range comprises at least one of the following: a visible light range, a uv light range, an IR light range, an NIR light range, a SWIR light range.

12. The method according to claim 8 , further comprising depositing the coatings on the substrate using Plasma Enhanced Chemical vapor deposition.

13. The optical apparatus according to claim 1 , wherein Plasma Enhanced Chemical Vapor Deposition (PECVD) is used to deposit the coatings on the substrate.