IP Library Granted Patent US 10,584,031
Granted Patent B2
US 10,584,031 · App. 16/082,598 · Granted Mar 10, 2020

Nitride crystal substrate

Inventors: Takehiro Yoshida (Ibaraki, JP); Masatomo Shibata (Ibaraki, JP)
Assignees: SCIOCS COMPANY LIMITED; SUMITOMO CHEMICAL COMPANY, LIMITED
C01B21/0632C23C16/34C30B25/20C30B29/406H01L29/2003C01P2002/82C01P2004/02H01L21/0254H01L21/0262H01L21/02389H01L21/02428
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Quick Facts
Patent No.
US 10,584,031
App. No.
16/082,598
Granted
Mar 10, 2020
Kind
B2
Abstract

There is provided a nitride crystal substrate made of a nitride crystal with a diameter of 100 mm or more, having on its main surface: a continuous high dislocation density region and a plurality of low dislocation density regions divided by the high dislocation density region, with the main surface not including a polarity inversion domain.

Claims (10)

1. A nitride crystal substrate made of a nitride crystal with a diameter of 100 mm or more, having on its main surface:

a continuous first region having a first dislocation density, and a plurality of second regions which are divided by the first region and which have a second dislocation density lower than the first dislocation density, with the main surface not including a polarity inversion domain,

wherein the first region has a distribution state of a dislocation density, which is a state that a dislocation density value increases monotonically toward a peak value or decreases monotonically from a peak value.

2. The nitride crystal substrate according to claim 1 , wherein each of the second regions has an area of at least 1 mm 2 or more.

3. The nitride crystal substrate according to claim 1 , wherein a planar pattern of the first region is a honeycomb pattern in which outlines of regular hexagonal planar shapes are matched.

4. The nitride crystal substrate according to claim 1 , wherein in each of the second regions, an average dislocation density is 5×10 6 numbers/cm 2 or less.

5. The nitride crystal substrate according to claim 1 , wherein in each of the second regions, an average carrier concentration is 1×10 18 cm −3 or more.

6. The nitride crystal substrate according to claim 1 , wherein an average impurity concentration in the first region differs from an average impurity concentration in the second regions.

7. The nitride crystal substrate according to claim 1 , wherein in the first region and the second regions, strain states are substantially the same.

8. The nitride crystal substrate according to claim 7 , wherein the strain state is a state specified from a detection result obtained by using Raman Spectroscopy.

Assignments (2)
MERGER Recorded Dec 16, 2022
From: SCIOCS COMPANY LIMITED
To: SUMITOMO CHEMICAL COMPANY LIMITED
Reel/Frame 062142/0384 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 11, 2018
From: YOSHIDA, TAKEHIRO; SHIBATA, MASATOMO
To: SCIOCS COMPANY LIMITED; SUMITOMO CHEMICAL COMPANY, LIMITED
Reel/Frame 046837/0572 →
Priority Claims (1)
JP 2016-044829 · Mar 8, 2016 · national
Continuity (1)
Related Publication 20190119112A1 · Apr 25, 2019