Memory cells, integrated structures and memory arrays

1. A memory cell, comprising, in the following order:

a control gate;

charge-blocking material;

charge-trapping material;

a first oxide;

a charge-passage having a first outer surface along the first oxide and a second outer surface opposing the first outer surface, the charge-passage structure consisting of a central region sandwiched between first and second regions, each of the first region, second region and central region containing nitrogen, with at least one of the first and second outer surfaces consisting of silicon nitride; the central region containing a higher concentration of oxygen than the first and second regions and having a lower probability of trapping charges and/or a lower rate of trapping charges than the first and second regions;

a second oxide; and

channel material.

2. The memory cell of claim 1 wherein the central region has a lower volumetric density of charge traps than the first and second regions.

3. The memory cell of claim 1 wherein the central region exhibits shallower charge-trapping behavior than the first and second regions.

4. The memory cell of claim 1 wherein the central region has a lower volumetric density of charge traps than the first and second regions; and wherein the central region exhibits shallower charge-trapping behavior than the first and second regions.

5. The memory cell of claim 1 wherein the first and second regions are a same composition as one another.

6. The memory cell of claim 1 wherein the first and second regions are not a same composition as one another.

7. The memory cell of claim 1 wherein the first and second outer surfaces consist of silicon nitride; and wherein the central region comprises SiON, where the formula indicates primary components rather than a specific stoichiometry.

8. The integrated structure of claim 7 wherein the central region has a lower volumetric density of charge traps than the first and second regions; and wherein the central region exhibits shallower charge-trapping behavior than the first and second regions.

9. A memory cell, comprising, in the following order:

a control gate;

charge-blocking material;

charge-trapping material;

a first oxide;

a charge-passage structure consisting of a central region sandwiched between first and second regions, each of the first region, second region and central region containing nitrogen; the central region containing a higher concentration of oxygen than the first and second regions and having a lower probability of trapping charges and/or a lower rate of trapping charges than the first and second regions, the charge-passage structure having a first outer surface along the first region, and having a second outer surface in opposing relation to the first outer surface and along the second region; wherein the first and second outer surfaces consist of silicon nitride; and wherein the central region comprises SiON, where the formula indicates primary components rather than a specific stoichiometry;

a second oxide; and

channel material; wherein the charge-passage structure comprises a first gradient of increasing oxygen concentration extending along a direction from the first surface to the central region, and comprises a second gradient of increasing oxygen concentration extending from the second surface to the central region.

10. The memory cell of claim 9 wherein the charge-passage structure is substantially mirror symmetric about a plane through the middle of the central region and midway between the first and second surfaces.

11. An integrated structure, comprising:

a vertical stack of alternating conductive levels and insulative levels;

charge-blocking material extending vertically along the vertical stack;

charge-storage material extending vertically along the charge-blocking material;

an insulative material extending vertically along the charge-storage material; and

a charge-passage structure having a first outer surface extending vertically along the insulative material and a second outer surface opposing the first outer surface, the charge-passage structure having a central region sandwiched between and in direct physical contact with first and second regions, each of the first region, the second region and central region containing nitrogen, with at least one of the first and second outer surfaces consisting of silicon nitride; the central region containing a higher concentration of oxygen than the first and second regions and having a lower probability of trapping charges and/or a lower rate of trapping charges than the first and second regions.

12. The integrated structure of claim 11 wherein the central region has a lower volumetric density of charge traps than the first and second regions.

13. The integrated structure of claim 11 wherein the central region exhibits shallower charge-trapping behavior than the first and second regions.

14. A NAND memory array, comprising:

a vertical stack of alternating insulative levels and wordline levels;

charge-blocking material extending vertically along the vertical stack;

charge-storage material extending vertically along the charge-blocking material;

an insulative material extending vertically along the charge-storage material; and

a charge-passage structure having a first outer surface extending vertically along the insulative material, and having a second outer surface in opposing relation to the first outer surface, the charge-passage structure consisting of a central region sandwiched between first and second regions, each of the first region, the second region and the central region containing nitrogen with at least one of the first and second outer surfaces consisting of silicon nitride; the central region containing a higher concentration of oxygen than the first and second regions and exhibiting shallower charge-trapping behavior than the first and second regions.

15. The NAND memory array of claim 14 wherein the central region, first region and second region all comprise silicon and nitrogen; and wherein the central region comprises a higher oxygen concentration than the first and second regions.

16. The NAND memory array of claim 14 wherein the first and second regions consist of silicon nitride; and wherein the central region comprises silicon oxynitride.

17. The NAND memory array of claim 14 wherein the first and second outer surfaces consist of silicon nitride; and wherein the central region comprises SiON, where the formula indicates primary components rather than a specific stoichiometry.

18. The NAND memory array of claim 17 wherein the charge-passage structure is substantially mirror symmetric about a plane through the middle of the central region and midway between the first and second surfaces.

19. The NAND memory array of claim 17 wherein the charge-passage structure is not mirror symmetric about a plane through the middle of the central region and midway between the first and second surfaces.

20. A NAND memory array, comprising:

a vertical stack of alternating insulative levels and wordline levels;

charge-blocking material extending vertically along the vertical stack;

charge-storage material extending vertically along the charge-blocking material;

an insulative material extending vertically along the charge-storage material;

a charge-passage structure extending vertically along the insulative material, the charge-passage structure having a first outer surface along the insulative material and a second outer surface opposing the first outer surface, at least one of the first and second outer surfaces consisting of silicon nitride; the charge-passage structure further having a central region sandwiched between and in direct physical contact with first and second regions, each of the first, second and central regions containing nitrogen; the central region containing a higher concentration of oxygen than the first and second regions and having a lower volumetric density of charge traps than the first and second regions; and

dielectric material extending vertically along the charge-passage structure.