Bonding pads with thermal pathways

1. An apparatus, comprising:

a substrate, wherein the substrate further includes a through-via extending from the backside of the substrate to a frontside of the substrate; and

a first bonding pad including thermal pathways in direct contact with a backside of the substrate, wherein the thermal pathways are disposed in channels formed in a passivation layer on the backside of the substrate;

a second bonding pad disposed on the passivation layer and coupled to the through-via;

an additional substrate including a frontside passivation layer; and

a third bonding pad disposed on the frontside passivation layer.

2. The apparatus of claim 1 , wherein the thermal pathways are formed under the first bonding pad.

3. The apparatus of claim 1 , wherein the thermal pathways are disposed in the channels formed in the passivation layer such that the thermal pathways form concentric circles or a spiral in the passivation layer.

4. The apparatus of claim 1 , wherein the thermal pathways are disposed in the channels formed in the passivation layer such that the thermal pathways are distributed in parallel relative to each other and such that the thermal pathways extend along a length of the first bonding pad.

5. The apparatus of claim 1 , wherein the first and third bonding pad are configured to form a first bond to provide an electrical connection to an active region of the additional substrate.

6. The apparatus of claim 1 , further comprising:

a fourth bonding pad disposed on the frontside passivation layer, wherein the second and fourth bonding pad are configured to form a second bond to provide a thermal conduction path between the substrate and the additional substrate.

7. The apparatus of claim 1 , wherein the thermal pathways are configured to reduce heat traveling through the passivation layer on the backside of the substrate.

8. An apparatus, comprising:

a substrate having a backside;

a passivation layer disposed on the backside;

a bonding pad disposed on the passivation layer;

a channel disposed in the passivation layer; the channel extending between the bonding pad and the backside of the substrate;

conductive material disposed in the channel between the bonding pad and the backside of the substrate;

an additional substrate having a frontside;

an additional passivation layer disposed on the frontside of the additional substrate; and

an additional bonding pad disposed on the additional passivation layer.

9. The apparatus of claim 8 , wherein the conductive material comprises a metal.

10. The apparatus of claim 8 , wherein the bonding pad comprises an electrically-inactive bonding pad.

11. The apparatus of claim 8 , further comprising a through-via conductor that is in electrical connection with the bonding pad and terminates on a front side of the substrate.

12. The apparatus of claim 8 , wherein the conductive material disposed in the channel comprises at least one of a metal protrusion, extension, fin, or combinations thereof of the bonding pad.

13. The apparatus of claim 8 , wherein the conductive material disposed in the channel are configured to reduce heat traveling through the passivation layer on the backside of the substrate.

14. The apparatus of claim 8 , wherein the bonding pad does not provide any electrical connections.

15. The apparatus of claim 8 , wherein the bonding pad and the additional bonding pad are configured to form a bond to provide a thermal conduction path between the substrate and the additional substrate.

16. The apparatus of claim 8 , wherein the substrate, in part, forms a controller die, and wherein the additional substrate, in part, forms a logic die.

17. The apparatus of claim 8 , wherein the bonding pad provides additional structural support to the apparatus.