Tunable shrinkage process for manufacturing gratings
A manufacturing system performs a lithographic patterning of a resist formed on a substrate to create a first optical grating including a plurality of structures at a first slant angle relative to the substrate. The manufacturing system performs a tunable shrinkage of the plurality of structures to adjust the first slant angle to a target slant angle different from the first slant angle. In some embodiments, the manufacturing system performs a post-processing of the plurality of structures to create a second optical grating from the first optical grating. The post-processing may adjust at least one of: a refractive index, a height, and a volume of the first optical grating.
1. A method comprising:
performing a micromolding of a resist formed on a substrate to create a pre-processed grating including a plurality of grating elements at a first slant angle relative to the substrate by transferring a specific pattern on the resist based on an application of a mechanical force from a mold held above the resist;
performing a tunable shrinkage of the plurality of grating elements based on a physical removal of a portion of the pre-processed grating to create an intermediate grating at a second slant angle relative to the substrate different from the first slant angle;
adjusting a refractive index of the intermediate grating based on a chemical cross-linking reaction of the resist to create a final grating with a target slant angle relative to the substrate different from the first and second slant angles; and
modifying a refractive index of the final grating to generate a modified final grating by adding a plurality of functional materials with high refractive indices into the final grating.
2. The method of claim 1 , further comprising:
performing a post-processing of the plurality of grating elements to create the final grating by further adjusting at least one of a height and a volume of the intermediate grating.
3. The method of claim 1 , wherein the target slant angle is in the range of 0 to 85 degrees.
4. The method of claim 1 , wherein the target slant angle is larger than the first slant angle.
5. The method of claim 1 , wherein the tunable shrinkage of the plurality of grating elements is further based on another chemical cross-linking reaction of the resist.
6. The method of claim 5 , wherein the other chemical cross-linking reaction of the resist includes at least one of: a partial cross-linking reaction, an orthogonal cross-linking reaction, or some combination thereof.
7. The method of claim 1 , wherein performing the tunable shrinkage of the plurality of grating elements further comprises:
performing a first shrinkage along a first dimension with respect to a first surface of the substrate; and
performing a second shrinkage along a second dimension with respect to the first surface of the substrate, the second dimension different than the first dimension.
8. The method of claim 1 , wherein the intermediate grating is associated with a height of at most 2 microns, a duty cycle ranging from 0.1 to 0.9, and a pitch ranging from 0.25 to 1.5 microns.
9. The method of claim 1 , wherein the intermediate grating undergoes a surface reaction based on an illumination with a collimated beam of light oriented at one or more slant angles different than the first slant angle relative to the substrate.
10. The method of claim 9 , wherein the illumination with the collimated beam of light bends the plurality of grating elements to the target slant angle.
11. A method comprising:
performing a micromolding of a resist formed on a substrate to create a pre-processed grating including a plurality of grating elements at a first slant angle relative to the substrate by transferring a specific pattern on the resist based on an application of a mechanical force from a mold held above the resist;
performing a tunable shrinkage of the plurality of grating elements based on a physical removal of a portion of the pre-processed grating to create an intermediate grating at a second slant angle relative to the substrate different from the first slant angle;
adjusting a refractive index of the intermediate grating based on a physical removal of a portion of the resist to create a final grating with a target slant angle relative to the substrate different from the first and second slant angles; and
modifying a refractive index of the final grating to generate a modified final grating by adding a plurality of functional materials with high refractive indices into the final grating.
12. The method of claim 11 , wherein the tunable shrinkage is further based on physically removing a plurality of moieties from the resist by heating the resist to a target temperature.