IP Library Granted Patent US 10,732,085
Granted Patent B2
US 10,732,085 · App. 16/124,762 · Granted Aug 4, 2020

Notch treatment methods for flaw simulation

Inventors: Xiaoming Li (Colleyville, TX); Bogdan R. Krasnowski (Bedford, TX); Robert A. Figueroa (Colleyville, TX); Robert Wardlaw (Keller, TX)
Assignee: Bell Helicopter Textron Inc.
G01N3/62G01N3/02G06F30/15G06F2119/18
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Quick Facts
Patent No.
US 10,732,085
App. No.
16/124,762
Granted
Aug 4, 2020
Kind
B2
Abstract

A notch treatment method for flaw simulation including providing the specimen with the notch, the notch having a re-melt material layer; isolating the notch; and selectively etching the notch to provide an etched surface of the notch; wherein at least a portion of the re-melt material layer has been removed from the notch. In one aspect, there is provided a notch treatment method for flaw simulation including providing the specimen with the notch, the notch having a re-melt material layer, the specimen includes steel or an alloy thereof; isolating the notch; and selectively etching the notch with a first etching solution and a second etching solution to provide an etched surface on the notch; wherein at least a portion of the re-melt material layer has been removed from the notch.

Claims (17)

1. A notch treatment method for flaw simulation, comprising:

providing a specimen with a notch, the notch having a re-melt material layer, the specimen comprises aluminum or an alloy thereof;

isolating the notch, the step of isolating the notch comprises placing an isolation layer with a slot onto the specimen such that the slot exposes the notch and placing a dam on the isolation layer to form a notch area and a peripheral area on the specimen, wherein the notch area is disposed at least partially around the notch; and

selectively etching the notch using an etching solution comprising a sodium hydroxide solution to provide an etched surface of the notch;

wherein at least a portion of the re-melt material layer has been removed from the notch.

2. The treatment method according to claim 1 , wherein the step of providing the specimen with the notch comprises:

generating the notch on the specimen by electrical discharge machining.

3. The treatment method according to claim 1 , wherein the re-melt material layer is disposed on at least one of a root notch and a lateral side wall of the notch.

4. The treatment method according to claim 1 , wherein the specimen has a square cross-sectional portion and the notch is located in a corner of the square cross-sectional portion.

5. The treatment method according to claim 1 , wherein the step of placing a dam on the isolation layer comprises:

forming a moldable cylinder.

6. The treatment method according to claim 1 , wherein the step of selectively etching the notch comprises:

applying the etching solution to the notch area to form the etched surface on the notch.

7. The treatment method according to claim 6 , further comprising:

removing the isolation layer and the dam from the specimen; and

cleaning the specimen to remove the etching solution.

8. The treatment method according to claim 1 , wherein at least a portion of the etched surface on the notch includes microcracks.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 12, 2018
From: LI, XIAOMING, DR.; KRASNOWSKI, BOGDAN R., DR.; FIGUEROA, ROBERT A.; WARDLAW, ROBERT
To: BELL HELICOPTER TEXTRON INC.
Reel/Frame 047152/0557 →
Continuity (3)
Continuation In Part 15079946 · Mar 24, 2016
Provisional Application 62137427 · Mar 24, 2015
Related Publication 20200025661A1 · Jan 23, 2020