Photo resist as opaque aperture mask on multispectral filter arrays
An apparatus (e.g., a multi-spectral optical filter array, an optical wafer, an optical component) has an aperture mask printed directly thereon, the aperture mask including a positive or negative photoresist. The apparatus includes a substrate having the aperture mask printed on at least one of a light entrance surface or a light exit surface of the substrate so as to provide an aperture over a portion of the substrate. The photoresist from which the aperture mask is formed is photo-definable or non-photo-definable, and is deposited/printed to form the aperture mask on the substrate.
1. An optical apparatus, comprising:
a substrate having a light entrance surface and a light exit surface;
wherein the substrate is one of:
a multi-spectral optical filter array comprising a plurality of optical filter elements bonded together to form the multi-spectral optical filter array, wherein each optical filter element includes a filter layer stack, or
an optical wafer; and
an aperture mask that includes a photoresist printed directly on the light exit surface of the substrate so as to provide an exit aperture over a portion of the substrate;
wherein no optical coating is present between the substrate and the aperture mask.
2. The apparatus of claim 1 , wherein the photoresist is opaque.
3. The apparatus of claim 1 , further comprising a second aperture mask that includes a photoresist printed directly on the light entrance surface of the substrate so as to provide an entrance aperture over a portion of the substrate.
4. The apparatus of claim 1 , wherein the photoresist is photo-definable.
5. The apparatus of claim 1 , wherein the photoresist is a positive photoresist.
6. The apparatus of claim 1 , wherein the photoresist is a negative photoresist.
7. An optical apparatus comprising:
a multi-spectral optical filter array having a filter layers stack supported by a filter element substrate, the multi-spectral optical filter array including a light entrance surface and a light exit surface;
an aperture mask printed directly on a portion of the light entrance surface of the multi-spectral optical filter array, the aperture mask comprising a photoresist; and
a second aperture mask printed directly on a portion of the light exit surface of the multi-spectral optical filter array, the second aperture mask comprising a photoresist;
wherein no optical coating is present between the multi-spectral optical filter array and the aperture mask.
8. The multi-spectral optical filter array of claim 7 , wherein at least one of the photoresists is opaque.