IP Library Granted Patent US 10,879,402
Granted Patent B2
US 10,879,402 · App. 16/150,278 · Granted Dec 29, 2020

Thin film transistor and display unit

Inventors: Naoki Asano (Tokyo, JP); Tokuaki Kuniyoshi (Tokyo, JP)
Assignee: JOLED INC.
H01L29/7869G09G3/20H01L29/41733H01L29/42384G09G2310/08H01L27/1225
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Quick Facts
Patent No.
US 10,879,402
App. No.
16/150,278
Granted
Dec 29, 2020
Kind
B2
Abstract

A thin film transistor includes a substrate, a semiconductor layer, a first gate insulating film, a second gate insulating film, and a gate electrode. The semiconductor layer is provided in a selective region of the substrate. The first gate insulating film is provided in the selective region of the substrate and covers a surface of the semiconductor layer. The second gate insulating film extends across opposite sides of the first gate insulating film along a channel width direction and covers the first gate insulating film that covers the semiconductor layer. The gate electrode faces the semiconductor layer across the second gate insulating film.

Claims (45)

1. A thin film transistor comprising:

a substrate;

a semiconductor layer provided in a selective region of the substrate;

a first gate insulating film provided in the selective region of the substrate and covering a surface of the semiconductor layer;

a second gate insulating film extending continuously beyond opposite sides of the first gate insulating film along a channel width direction and covering the first gate insulating film that covers the surface of the semiconductor layer; and

a gate electrode facing the semiconductor layer across the second gate insulating film.

2. The thin film transistor according to claim 1 , wherein the first gate insulating film has a planar shape a same as a planar shape of the semiconductor layer.

3. The thin film transistor according to claim 1 , wherein the second gate insulating film has a width greater than a width of the semiconductor layer, along the channel width direction.

4. The thin film transistor according to claim 1 , wherein the second gate insulating film is provided between a first end face of the semiconductor layer and the gate electrode, and between a second end face of the semiconductor layer and the gate electrode, the first and second end faces of the semiconductor layer being oriented in the channel width direction.

5. The thin film transistor according to claim 1 , wherein the second gate insulating film has a planar shape a same as a planar shape of the gate electrode.

6. The thin film transistor according to claim 1 , wherein the second gate insulating film includes an insulating material a same as a material of the first gate insulating film.

7. The thin film transistor according to claim 1 , wherein the second gate insulating film has a thickness different from a thickness of the first gate insulating film.

8. The thin film transistor according to claim 1 , wherein the second gate insulating film has a thickness greater than a thickness of the first gate insulating film.

9. The thin film transistor according to claim 1 , wherein the first gate insulating film has a thickness greater than a thickness of the second gate insulating film.

10. The thin film transistor according to claim 1 , wherein the semiconductor layer includes an oxide semiconductor material.

11. The thin film transistor according to claim 1 , wherein the first gate insulating film is between the semiconductor layer and the second gate insulating film.

12. The thin film transistor according to claim 1 , wherein

the first gate insulating film includes

one face facing the semiconductor layer,

another face opposite to the one face and facing the second gate insulating film, and

two side faces opposite to each other in the channel width direction, each of the two side faces connecting the one face and the another face, and

the second gate insulating film covers the another face and the two side faces of the first gate insulating film.

13. The thin film transistor according to claim 12 , wherein

the semiconductor layer includes

a first end face facing a direction same as one of the two side faces of the first gate insulating film, and

a second end face facing a direction same as the other of the two side faces of the first gate insulating film, and

the second gate insulating film covers the first end face and the second end face of the semiconductor layer.

14. A display unit provided with a display element and a thin film transistor configured to drive the display element, the thin film transistor comprising:

a substrate;

a semiconductor layer provided in a selective region of the substrate;

a first gate insulating film provided in the selective region of the substrate and covering a surface of the semiconductor layer;

a second gate insulating film extending continuously beyond opposite sides of the first gate insulating film along a channel width direction and covering the first gate insulating film that covers the surface of the semiconductor layer; and

a gate electrode facing the semiconductor layer across the second gate insulating film.

15. The thin film transistor according to claim 14 , wherein the first gate insulating film is between the semiconductor layer and the second gate insulating film.

16. The thin film transistor according to claim 14 , wherein

the first gate insulating film includes

one face facing the semiconductor layer,

another face opposite to the one face and facing the second gate insulating film, and

two side faces opposite to each other in the channel width direction, each of the two side faces connecting the one face and the another face, and

the second gate insulating film covers the another face and the two side faces of the first gate insulating film.

17. The thin film transistor according to claim 16 , wherein

the semiconductor layer includes

a first end face facing a direction same as one of the two side faces of the first gate insulating film, and

a second end face facing a direction same as the other of the two side faces of the first gate insulating film, and

the second gate insulating film covers the first end face and the second end face of the semiconductor layer.

Assignments (5)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 18, 2025
From: JDI DESIGN AND DEVELOPMENT G.K.
To: MAGNOLIA BLUE CORPORATION
Reel/Frame 072039/0656 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 31, 2024
From: JOLED, INC.
To: JDI DESIGN AND DEVELOPMENT G.K.
Reel/Frame 066382/0619 →
CORRECTION BY AFFIDAVIT FILED AGAINST REEL/FRAME 063396/0671 Recorded Jun 12, 2023
From: JOLED, INC.
To: JOLED, INC.
Reel/Frame 064067/0723 →
SECURITY INTEREST Recorded Apr 20, 2023
From: JOLED, INC.
To: INCJ, LTD.
Reel/Frame 063396/0671 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 3, 2018
From: ASANO, NAOKI; KUNIYOSHI, TOKUAKI
To: JOLED INC.
Reel/Frame 047060/0771 →