IP Library › Granted Patent US 10,676,415
Granted Patent B2
US 10,676,415 · App. 16/158,567 · Granted Jun 9, 2020

Methods for removing halogenated ethylene impurities in 2, 3, 3, 3-tetrafluoropropene product

Inventors: Haiyou Wang (Amherst, NY); Hsueh Sung Tung (Getzville, NY)
Assignee: Honeywell International Inc.
C07C21/18C07C17/087C07C17/25C07C17/389C07B2200/09Y02P20/582
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Quick Facts
Patent No.
US 10,676,415
App. No.
16/158,567
Granted
Jun 9, 2020
Kind
B2
Abstract

Disclosed is a composition comprised of at least one compound selected from 2,3,3,3-tetrafluoropropene, 1,3,3,3-tetrafluoro-1-propene and 1-chloro-3,3,3-trifluoropropene and halogenated impurity selected from the group consisting of HFO-1141 (CH 2 ═CHF), HCFO-1140 (CH 2 ═CHCl), and HCFO-1131 (CH 2 ═CFCl and/or trans/cis-CHF═CHCl) and combination thereof, said halogenated impurity being present in said composition in an amount of 50 ppm or less.

Claims (16)

1. A composition comprised of 2,3,3,3-tetrafluoropropene and a halogenated impurity comprising CH 2 ═CFCl, said halogenated impurity being present in said composition in an amount greater than 0 ppm and less than or equal to 50 ppm, wherein 2,3,3,3-tetrafluoropropene is present in said composition in at least 90% by weight.

2. The composition according to claim 1 wherein the hydrogenated impurity is present in said composition in an amount greater than 0 ppm but less than or equal to 20 ppm.

3. The composition according to claim 1 wherein the halogenated impurity is present in said composition in an amount greater than 0 ppm but less than or equal 10 ppm.

4. The composition according to claim 1 wherein one or more compounds selected from CF 3 C═CH, HFO-1243zf (CF 3 CH═CH 2 ), HFO-1234ze (E/Z-CF 3 CH═CHF), HCFO-1233zd (E/Z-CF 3 CH═CHCl), HCFO-1233xf (CF 3 CCl═CH 2 ) and combination thereof is additionally present.

5. The composition according to claim 2 wherein a compound selected from CF 3 C═CH, HFO-1243zf (CF 3 CH═CH 2 ), HFO-1234ze (E/Z-CF 3 CH═CHF), HCFO-1233zd (E/Z-CF 3 CH═CHCl), HCFO-1233xf (CF 3 CCl═CH 2 ) and combination thereof is additionally present.

6. The composition according to claim 3 wherein a compound selected from CF 3 C═CH, HFO-1243zf (CF 3 CH═CH 2 ), HFO-1234ze (E/Z-CF 3 CH═CHF), HCFO-1233zd (E/Z-CF 3 CH═CHCl), HCFO-1233xf (CF 3 CCl═CH 2 ) and combination thereof is additionally present.

7. The composition according to claim 6 wherein the compound is HFO-1243zf (CF 3 CH═CH 2 ), HFO-1234ze (E/Z-CF 3 CH═CHF), or HCFO-1233xf (CF 3 CCl═CH 2 ).

8. The composition according to claim 1 additionally comprising an additional impurity selected from the group consisting of HFO-1141 (CH 2 ═CHF), HCFO-1140 (CH 2 ═CHCl), and trans/cis, CHF—CHCl and combination thereof, said CH 2 ═CFCl and additional impurity being present in said composition in an amount greater than 0 ppm and less than or equal to 50 ppm.

9. The composition according to claim 8 wherein said additional impurity and CH 2 ═CFCl is present in said composition in amount greater than 0 ppm and less than 20 ppm.

10. The composition according to claim 8 wherein said additional and CH 2 ═CFCl is present in said composition in amount greater than 0 ppm and less than 10 ppm.

11. The composition according to claim 1 wherein 1,3,3,3-tetrafluoro-1-propene is additionally present.

12. The composition according to claim 11 which in addition comprises CH 2 ═CHF.

13. A first composition comprising 2,3,3,3-tetrafluoropropene, adsorbent and halogenated impurity selected from the group consisting of HFO 1141 (CH 2 ═CHF), HCFO 1140 (CH 2 ═CHCl) and HCFO-1131 (CH 2 ═CFCl) and/or trans/cis (CHF═CHCl) and combination thereto, said first composition forming a second composition when separated from said absorbent, wherein the second composition comprises 2,3,3,3-tetrafluoropropene in greater than 90% by weight of said composition and said halogenated impurity is present in an amount greater than 0 ppm and less than 50 ppm.

14. The first composition according to claim 13 , wherein said first composition forms a second composition when separated from said absorbent, wherein the second composition comprises 2,3,3,3-tetrafluoropropene in greater than 90% by weight of said composition and said halogenated impurity is present in an amount greater than 0 ppm and less than 20 ppm.

15. The first composition according to claim 14 , wherein said first composition forms a second composition when separated from said absorbent, wherein the second composition comprises 2, 3, 3, 3-tetrafluoropropene in greater than 90% by weight of said composition and said halogenated impurity is present in an amount greater than 0 ppm and less than 10 ppm.

16. A first composition comprising 2, 3, 3, 3-tetrafluoropropene, adsorbent and halogenated impurity selected from the group consisting of HFO 1141 (CH 2 ═CHF), HCFO 1140 (CH2=CHCl) and HCFO-1131 (CH 2 ═CFCl) and/or trans/cis (CHF═CHCl) and combination thereto.

Assignments (1)
SECURITY INTEREST Recorded Jan 12, 2026
From: SOLSTICE ADVANCED MATERIALS US, INC.
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 074569/0260 →