IP Library Granted Patent US 10,968,325
Granted Patent B2
US 10,968,325 · App. 16/163,220 · Granted Apr 6, 2021

Preparation of large ultrathin free-standing polymer films

Inventors: Michael Stadermann (Pleasanton, CA); Salmaan H. Baxamusa (Livermore, CA); William C. Floyd, III (Oakland, CA); Philip E. Miller (Livermore, CA); Tayyab I. Suratwala (Pleasanton, CA); Anatolios A. Tambazidis (Pleasanton, CA); Kelly Patricia Youngblood (Livermore, CA); Chantel Aracne-Ruddle (Livermore, CA); Art J. Nelson (Livermore, CA); Maverick Chea (Cypress, CA); Shuali Li (Fremont, CA)
Assignees: Lawrence Livermore National Security, LLC; General Atomics
C08J5/18B05D1/36B05D3/107B05D3/12B05D7/24B05D7/52B05D7/54B32B27/06B32B27/28B32B43/006B05D2201/04B05D2203/30B05D2350/60B32B2038/0056C08J2325/06C08J2329/14C08J2333/12
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Quick Facts
Patent No.
US 10,968,325
App. No.
16/163,220
Granted
Apr 6, 2021
Kind
B2
Abstract

A method of making large ultrathin free-standing polymer films without use of a sacrificial layer includes the steps of providing a substrate, applying a polyelectrolyte material to said substrate, applying a polymer material onto said substrate and onto said polyelectrolyte material, and directly delaminating said polymer material from said substrate and said polyelectrolyte to produce the ultrathin free-standing polymer film.

Claims (10)

1. An ultrathin polymer film product adapted to be positioned in a water bath, comprising:

a polymer film,

a silicon wafer,

an oxidizing acid cleaned wafer surface on said silicon wafer,

an electrostatically mediated adsorbed polyelectrolyte monolayer on said oxidizing acid cleaned wafer surface,

wherein said polymer film has a thicknesses below 100 nm,

a polymer film surface on said polymer film wherein said polymer film is initially positioned on said silicon wafer and said polymer film surface is initially on said oxidizing acid cleaned wafer surface and said electrostatically mediated adsorbed polyelectrolyte monolayer,

a marker on said polymer film,

wherein said electrostatically mediated adsorbed polyelectrolyte on said wafer surface of said silicon wafer enables said polymer film surface to separate from said wafer surface in said water bath leaving said polymer film in said water bath, and

wherein said marker on said polymer film enables said polymer film to be located in said water bath.

Assignments (5)
SECURITY INTEREST Recorded Apr 10, 2020
From: GENERAL ATOMICS
To: BANK OF THE WEST
Reel/Frame 052372/0067 →
CONFIRMATORY LICENSE Recorded Jan 28, 2019
From: LAWRENCE LIVERMORE NATIONAL SECURITY, LLC
To: U.S. DEPARTMENT OF ENERGY
Reel/Frame 048154/0419 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 14, 2018
From: YOUNGBLOOD, KELLY PATRICIA
To: GENERAL ATOMICS
Reel/Frame 047504/0403 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 14, 2018
From: TAMBAZIDIS, ANATOLIOS A.
To: GENERAL ATOMICS
Reel/Frame 047504/0478 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 17, 2018
From: STADERMANN, MICHAEL; BAXAMUSA, SALMAAN H.; FLOYD, WILLIAM C., III; MILLER, PHILIP E.; SURATWALA, TAYYAB I.; ARACNE-RUDDLE, CHANTEL; NELSON, ART J.; CHEA, MAVERICK; LI, SHUALI
To: LAWRENCE LIVERMORE NATIONAL SECURITY, LLC
Reel/Frame 047871/0411 →
Continuity (3)
Division 15130524 · Apr 15, 2016
Provisional Application 62150392 · Apr 21, 2015
Related Publication 20190048158A1 · Feb 14, 2019