Configuring optical layers in imprint lithography processes
An imprint lithography method of configuring an optical layer includes selecting one or more parameters of a nanolayer to be applied to a substrate for changing an effective refractive index of the substrate and imprinting the nanolayer on the substrate to change the effective refractive index of the substrate such that a relative amount of light transmittable through the substrate is changed by a selected amount.
1. An optical device, comprising:
a first optical layer, comprising:
a first substrate, and
a nanolayer imprinted directly on the first substrate; and
a second optical layer comprising:
a second substrate; and
a first functional pattern disposed along the second substrate; and
a third optical layer comprising a third substrate and a second functional pattern disposed along the third substrate,
wherein the nanolayer imprinted directly on the first substrate determines an effective refractive index of the first substrate such that the nanolayer increases a relative amount of light transmittable through the first substrate to the second optical layer.
2. The optical device of claim 1 , wherein the nanolayer imprinted directly on the first substrate is a first nanolayer, wherein the effective refractive index of the first substrate is a first refractive index, wherein the relative amount of light is a first relative amount of light, and wherein the second optical layer comprises a second nanolayer imprinted on the second substrate, the second nanolayer determining a second effective refractive index of the second substrate such that the second nanolayer increases a second relative amount of light transmittable through the second substrate to the third optical layer.
3. The optical device of claim 2 , wherein the first and second nanolayers are configured such that a final amount of light transmitted through the first and second substrates to the third optical layer is about equal to an amount of light directed from a source to the first nanolayer, minus a first amount of light reflected from the first substrate and minus a second amount of light reflected from the second substrate.