Apparatus and methods of electrically conductive optical semiconductor coating
A method of coating an optical substrate with a transparent, electrically conductive coating includes depositing a semiconductor coating over a surface of an optical substrate, wherein the semiconductor coating has broadband optical transmittance. A doped semiconductor is applied in a pattern over the semiconductor coating. The doped semiconductor in the pattern is activated for electrical conductivity in the doped semiconductor.
1. A window comprising:
a transparent substrate with a coating over the transparent substrate, the coating being made of both a transparent semiconductor and an electrically conductive semiconductor, the electrically conductive semiconductor being distributed in a pattern in the transparent semiconductor.
2. The window as recited in claim 1 , wherein the semiconductor coating has broadband optical transmittance.
3. The window as recited in claim 1 , wherein the pattern includes a grid.
4. The window as recited in claim 1 , further comprising a protective coating over the semiconductor coating.
5. The window as recited in claim 4 , further comprising a broadband anti-reflection coating over the protective coating.
6. The window as recited in claim 1 , further comprising a broadband anti-reflection coating over the semiconductor coating.
7. The window as recited in claim 1 , wherein the semiconductor coating includes at least one of In 2 O 3 or ZnO.
8. The window as recited in claim 1 , wherein the electrically conductive semiconductor includes doping portions of the semiconductor coating forming a pattern of doped semiconductor in the semiconductor coating.
9. The window as recited in claim 8 , wherein the doped semiconductor includes at least one of Sn, Mo, W, Ti, Al, or Ga.
10. The method as recited in claim 1 , wherein the semiconductor coating has broadband optical transmittance in at least visible and infrared spectra.
11. The window as recited in claim 1 , wherein a surface of the semiconductor coating is covered in its entirety with the pattern.
12. The window as recited in claim 8 , wherein the doped semiconductor, semiconductor coating, and optical substrate are formed into a window without etching.
13. The window as recited in claim 8 , wherein the doped semiconductor, semiconductor coating, and optical substrate are formed into a window without polishing or post-process planarization.
14. The window as recited in claim 8 , wherein the doped semiconductor and semiconductor coating have closely matched indices of refraction to mitigate light scattering.
15. The window as recited in claim 1 , wherein the pattern is configured to provide electromagnetic interference (EMI) shielding to the optical substrate.