IP Library Granted Patent US 11,020,894
Granted Patent B2
US 11,020,894 · App. 16/175,607 · Granted Jun 1, 2021

Safe separation for nano imprinting

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 11,020,894
App. No.
16/175,607
Granted
Jun 1, 2021
Kind
B2
Abstract

Control of lateral strain and lateral strain ratio (d t /d b ) between template and substrate through the selection of template and/or substrate thicknesses (T t and/or T b ), control of template and/or substrate back pressure (P t and/or P b ), and/or selection of material stiffness are described.

Claims (14)

1. An imprint lithography method for separating an imprint lithography template from a patterned layer formed by contacting the imprint lithography template with a formable material disposed on a substrate and solidifying the formable material to form the patterned layer such that the template features and the substrate features have lateral strains d t and d b associated therewith, respectively, when subjected to a separation force, the method comprising:

determining a difference between the lateral strains d t and d b by measuring the lateral strain values during an initial separation or modeling the lateral strain values during a theoretical separation;

based on the determined difference between the lateral strains d t and d b , determining a back pressure P t to apply to the template, a back pressure P b to apply to the substrate, or both such that a ratio of lateral strains d t /d b is approximately 1 when the template and the substrate are subjected to the separation force;

applying the determined back pressure P t to the template, the determined back pressure P b to the substrate, or both while at least a portion of the template is in contact with the patterned layer on the substrate; and

applying the separation force to separate the template from the patterned layer on the substrate.

2. The method of claim 1 , wherein the back pressure P b applied to the substrate exceeds the back pressure P t applied to the template.

3. The method of claim 1 , wherein applying the determined back pressure P t to the template comprises applying a negative back pressure to the template or a positive back pressure to the template.

4. The method of claim 1 , wherein applying the determined back pressure P b to the substrate comprises applying a negative back pressure to the substrate or a positive back pressure to the substrate.

5. The method of claim 1 , wherein applying the determined back pressure P t to the template, the determined back pressure P b to the substrate, or both comprises applying the determined back pressure prior to or concurrently with applying the separation force.

6. The method of claim 1 , wherein applying the determined back pressure P t to the template, the determined back pressure P b to the substrate, or both comprises applying only the determined back pressure P b or only the determined back pressure P t .

7. The method of claim 1 , wherein applying the determined back pressure P t to the template, the determined back pressure P b to the substrate, or both comprises applying a positive back pressure to the template and a negative back pressure to the substrate or applying a negative back pressure to the template and a positive back pressure to the substrate.

8. The method of claim 1 , further comprising determining a template thickness T t and a substrate thickness T b .

9. The method of claim 8 , wherein the determined back pressure P b applied to the substrate exceeds the back pressure applied to the template P t if T b exceeds T t .

10. The method of claim 8 , wherein the determined back pressure P t applied to the template exceeds the back pressure applied to the substrate P b if T t exceeds T b .

Assignments (10)
SECURITY INTEREST Recorded Oct 29, 2025
From: MAGIC LEAP, INC.; MENTOR ACQUISITION ONE, LLC; MOLECULAR IMPRINTS, INC.
To: CITIBANK, N.A., AS COLLATERAL AGENT
Reel/Frame 073430/0225 →
SECURITY INTEREST Recorded Oct 28, 2025
From: MAGIC LEAP, INC.; MENTOR ACQUISITION ONE, LLC; MOLECULAR IMPRINTS, INC.
To: CITIBANK, N.A., AS COLLATERAL AGENT
Reel/Frame 073388/0027 →
ASSIGNMENT OF SECURITY INTEREST IN PATENTS Recorded Nov 7, 2019
From: JPMORGAN CHASE BANK, N.A.
To: CITIBANK, N.A.
Reel/Frame 050967/0138 →
PATENT SECURITY AGREEMENT Recorded Aug 22, 2019
From: MAGIC LEAP, INC.; MOLECULAR IMPRINTS, INC.; MENTOR ACQUISITION ONE, LLC
To: JP MORGAN CHASE BANK, N.A.
Reel/Frame 050138/0287 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 8, 2019
From: CANON NANOTECHNOLOGIES, INC.
To: MOLECULAR IMPRINTS, INC.
Reel/Frame 048539/0863 →
CONFIRMATORY ASSIGNMENT OF JOINT PATENT OWNERSHIP Recorded Jan 30, 2019
From: CANON NANOTECHNOLOGIES, INC.
To: MOLECULAR IMPRINTS, INC.
Reel/Frame 048187/0703 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 30, 2019
From: IM, SE-HYUK; GANAPATHISUBRAMANIAN, MAHADEVAN; FLETCHER, EDWARD B.; KHUSNATDINOV, NIYAZ; SCHMID, GERARD M.; MEISSL, MARIO JOHANNES; CHERALA, ANSHUMAN; XU, FRANK Y.; CHOI, BYUNG-JIN; SREENIVASAN, SIDLGATA V.
To: MOLECULAR IMPRINTS, INC.
Reel/Frame 048191/0464 →
CHANGE OF NAME Recorded Jan 30, 2019
From: MOLECULAR IMPRINTS, INC.
To: CANON NANOTECHNOLOGIES, INC.
Reel/Frame 048191/0589 →
CHANGE OF NAME Recorded Jan 30, 2019
From: MII NEWCO, INC.
To: MOLECULAR IMPRINTS, INC.
Reel/Frame 048191/0770 →
ASSIGNMENT OF JOINT OWNERSHIP Recorded Jan 30, 2019
From: MOLECULAR IMPRINTS, INC.
To: MII NEWCO, INC.
Reel/Frame 048187/0475 →