Splash Resistant Facemask
There is provided a splash resistant facemask having two outer splash layers adjacent each other on a side away from a wearer, a filter layer and an inside layer. None of the layers contains a repellent treatment. The facemask can pass a fluid splash resistance test, e.g. ASTM F-1862-05, wherein fluid is directed at the mask at a pressure of 160 mmHg.
1 . A method of manufacturing a fluid resistant facemask, the method comprising:
providing a first spunbond splash layer configured for a side away from a wearer's face;
securing a second splash layer made from a spunbond fabric or apertured film to an inner surface of the first spunbond splash layer;
arranging a meltblown filtration layer adjacent to the first and second splash layers; and
arranging an inner layer with the first and second splash layers and the meltblown layer to be worn against a wearer's face, wherein the first and second splash layers, the meltblown filtration layer, and the inner layer are absent of a repellent treatment, and
wherein the facemask passes an ASTM F-1862-05 level 3 test of splash resistance conducted at a pressure of 160 mmHg.
2 . The method of claim 1 , wherein the first and second splash layers have a combined basis weight of at least 1.4 osy and where the second splash layer has an air permeability value of greater than 250 CFM/Ft2.
3 . The method of claim 1 , wherein the meltblown filtration layer has an air permeability value greater than 40 CFM/Ft2.
4 . The method of claim 1 , wherein the facemask has an air permeability of at least 30 CFM/Ft 2 .
5 . The method of claim 1 , wherein the first spunbond splash layer has a drape stiffness above 3.5.
6 . The method of claim 5 , wherein the first spunbond splash layer has a drape stiffness above 4.0.
7 . The method of claim 6 , wherein the first spunbond splash layer has a drape stiffness above 4.5.
8 . The method of claim 1 , wherein the second splash layer is comprised of an aperture film.
9 . The method of claim 1 , wherein the second splash layer has a basis weight of at least 0.8 osy.