Low K dielectric compositions for high frequency applications
A low K value, high Q value, low firing dielectric material and method of forming a fired dielectric material. The dielectric material can be fired below 950° C. or below 1100° C., has a K value of less than about 8 at 10-30 GHz and a Q value of greater than 500 or greater than 1000 at 10-30 GHz. The dielectric material includes, before firing a solids portion including 10-95 wt % or 10-99 wt % silica powder and 5-90 wt % or 1-90 wt % glass component. The glass component includes 50-90 mole % SiO 2 , 5-35 mole % or 0.1-35 mole % B 2 O 3 , 0.1-10 mole % or 0.1-25 mole % Al 2 O 3 , 0.1-10 mole % K 2 O, 0.1-10 mole % Na 2 O, 0.1-20 mole % Li 2 O, 0.1-30 mole % F. The total amount of Li 2 O+Na 2 O+K 2 O is 0.1-30 mole % of the glass component. The silica powder can be amorphous or crystalline.
1. A sintered dielectric material comprising before sintering, a solids portion including 10-99 wt % silica powder having a D-50 particle size of 0.5-30 μm, and 1-90 wt % glass component including:
50-90 mole % SiO 2 ,
0.1-35 mole % B 2 O 3 ,
0.1-25 mole % Al 2 O 3 ,
0.1-10 mole % K 2 O,
0.1-10 mole % Na 2 O,
0.1-20 mole % Li 2 O,
0.1-30 mole % F, and
the total amount of Li 2 O+Na 2 O+K 2 O is 0.3-30 mole % of the glass component,
wherein the sintered dielectric material has a dielectric constant less than 8 and a Q value of greater than 500 when sintered at less than 1100° C.
2. The sintered dielectric material according to claim 1 , wherein the solids portion further comprises one crystalline compound selected from the group consisting of:
0.1-10 wt % lithium calcium silicate,
0.1-10 wt % β-eucryptite,
0.1-10 wt % lithium aluminum borate,
0.1-10 wt % magnesium aluminum silicate,
0.1-10 wt % sillimanite,
0.1-10 wt % albite,
0.1-10 wt % magnesium phosphate,
0.1-10 wt % aluminum phosphate,
0.1-10 wt % cordierite,
0.1-10 wt % willemite,
0.1-10 wt % mullite,
0.1-10 wt % wollastonite,
0.1-10 wt % calcium borate,
0.1-10 wt % forsterite,
0.1-10 wt % alumina,
0.1-10 wt % porous or hollow glass particles,
0.1-20 wt % alkali fluorides,
0.1-30 wt % aluminum borate,
0.1-20 wt % magnesium borosilicate,
0.1-20 wt % magnesium aluminosilicate,
0.1-20 wt % alkaline earth fluorides,
0.1-20 wt % zinc borates,
0.1-20 wt % zinc titanates, and
combinations thereof.
3. The sintered dielectric material according to claim 1 , wherein the silica powder is amorphous silica powder.
4. The sintered dielectric material according to claim 1 , wherein the silica powder is crystalline silica powder selected from the group consisting of quartz, cristobalite, tridymite, and combinations thereof.
5. The sintered dielectric material according to claim 1 , wherein the solids portion further comprises 5-50 wt % of one selected from the group consisting of:
a Bi—B—Si oxide glass frit comprising:
5-85 mole % Bi 2 O 3 ,
5-75 mole % B 2 O 3 +SiO 2 ,
0.1-40 mole % Li 2 O+Na 2 O+K 2 O,
0.1-55 mole % ZnO, and
0.1-20 mole % TiO 2 +ZrO 2 ,
a zinc oxide based glass frit comprising:
5-65 mole % ZnO,
10-65 mole % SiO 2 , and
5-55 mole % B 2 O 3 ,
an alkali-titanium-silicate glass frit comprising:
5-55 mole % Li 2 O+Na 2 O+K 2 O+Cs 2 O+Rb 2 O,
2-26 mole % TiO 2 +ZrO 2 ,
5-75 mole % B 2 O 3 +SiO 2 ,
0.1-30 mole % TeO 2 +V 2 O 5 +Sb 2 O 5 +P 2 O 5 ,
0.1-20 mole % MgO+CaO+BaO+SrO, and
0.1-20 mole % F,
an alkaline earth silicate glass frit comprising:
15-75 mole % BaO+CaO+SrO+MgO,
5-75 mole % B 2 O 3 +SiO 2 ,
0.1-55 mole % ZnO,
0.1-40 mole % Li 2 O+Na 2 O+K 2 O+Cs 2 O+Rb 2 O, and
0.1-20 mole % TiO 2 +ZrO 2 ,
a magnesium silicate glass frit comprising:
15-75 mole % MgO,
5-75 mole % B 2 O 3 +SiO 2 ,
0.1-55 mole % ZnO,
0.1-40 mole % Li 2 O+Na 2 O+K 2 O+Cs 2 O+Rb 2 O, and
0.1-20 mole % TiO 2 +ZrO 2 ,
a calcium silicate glass frit comprising:
15-75 mole % CaO,
5-75 mole % B 2 O 3 +SiO 2 ,
0.1-55 mole % ZnO,
0.1-40 mole % Li 2 O+Na 2 O+K 2 O+Cs 2 O+Rb 2 O, and
0.1-20 mole % TiO 2 +ZrO 2 ,
a strontium silicate glass frit comprising:
15-75 mole % SrO,
5-75 mole % B 2 O 3 +SiO 2 ,
0.1-55 mole % ZnO,
0.1-40 mole % Li 2 O+Na 2 O+K 2 O+Cs 2 O+Rb 2 O, and
0.1-20 mole % TiO 2 +ZrO 2 ,
a barium silicate glass frit comprising:
15-75 mole % BaO,
5-75 mole % B 2 O 3 +SiO 2 ,
0.1-55 mole % ZnO,
0.1-40 mole % Li 2 O+Na 2 O+K 2 O+Cs 2 O+Rb 2 O, and
0.1-20 mole % TiO 2 +ZrO 2 , and
combinations thereof.
6. The sintered dielectric material according to claim 1 , wherein the solids portion further comprises 0.1-10 wt % particles having an average size of from 10 nm to 30 um, and
wherein the particles are selected from the group consisting of hollow silica spheres, hollow glass particles, porous silicate glass particles, porous organosilicate glass particles, xerogel particles, aerogel particles, mica particles, zeolite particles, and combinations thereof.
7. The sintered dielectric material according to claim 1 , wherein the solids portion includes 10-95 wt % silica powder and 5-90 wt % glass component.
8. The sintered dielectric material according to claim 1 , further comprising 0.1-30 wt % of an additive including one or more of:
a) nano-sized silica having a D50 particle size of 5-500 nm,
b) Al 2 O 3 powder,
c) ZrO 2 powder,
d) TiO 2 powder,
e) SiC powder,
f) Si 3 N 4 powder,
g) Y 2 O 3 powder, or
h) MgO powder.
9. An electronic component including the sintered dielectric material according to claim 1 .
10. A method of forming a dielectric component, comprising:
providing a dielectric composition including a solids portion, the solids portion including 10-99 wt % silica powder having a D-50 particle size of 0.5-30 μm, and 1-90 wt % glass component including
50-90 mole % SiO 2 ,
0.1-35 mole % B 2 O 3 ,
0.1-25 mole % Al 2 O 3 ,
0.1-10 mole % K 2 O,
0.1-10 mole % Na 2 O,
0.1-20 mole % Li 2 O,
0.1-30 mole % F, and
wherein Li 2 O+Na 2 O+K 2 O is 0.3-30 mole % of the glass component, and
heating the dielectric composition to 700-1100° C. for 10-10000 minutes in order to sinter the solids portion and thereby form the dielectric component;
wherein the dielectric component has a dielectric constant less than 8 and a Q value of greater than 500.
11. The method according to claim 10 , wherein the solids portion further comprises one crystalline compound selected from the group consisting of:
0.1-10 wt % lithium calcium silicate,
0.1-10 wt % β-eucryptite,
0.1-10 wt % lithium aluminum borate,
0.1-10 wt % magnesium aluminum silicate,
0.1-10 wt % sillimanite,
0.1-10 wt % albite,
0.1-10 wt % magnesium phosphate,
0.1-10 wt % aluminum phosphate,
0.1-10 wt % cordierite,
0.1-10 wt % willemite,
0.1-10 wt % mullite,
0.1-10 wt % wollastonite,
0.1-10 wt % calcium borate,
0.1-10 wt % forsterite,
0.1-10 wt % alumina,
0.1-10 wt % porous or hollow glass particles,
0.1-20 wt % alkali fluorides,
0.1-30 wt % aluminum borates,
0.1-20 wt % magnesium borosilicates,
0.1-20 wt % magnesium aluminosilicates,
0.1-20 wt % alkaline earth fluorides,
0.1-20 wt % zinc borates,
0.1-20 wt % zinc titanates, and
combinations thereof.
12. The method according to claim 10 , wherein the silica powder is amorphous silica powder.
13. The method according to claim 10 , wherein the silica powder is crystalline silica powder selected from the group consisting of quartz, cristobalite, tridymite, and combinations thereof.
14. The method according to claim 10 , wherein the solids portion further comprises 5-50 wt % of one selected from the group consisting of:
a Bi—B—Si oxide glass frit comprising:
5-85 mole % Bi 2 O 3 ,
5-75 mole % B 2 O 3 +SiO 2 ,
0.1-40 mole % Li 2 O+Na 2 O+K 2 O,
0.1-55 mole % ZnO, and
0.1-20 mole % TiO 2 +ZrO 2 ,
a zinc oxide based glass frit comprising:
5-65 mole % ZnO,
10-65 mole % SiO 2 , and
5-55 mole % B 2 O 3 ,
an alkali-titanium-silicate glass frit comprising:
5-55 mole % Li 2 O+Na 2 O+K 2 O+Cs 2 O+Rb 2 O,
2-26 mole % TiO 2 +ZrO 2 ,
5-75 mole % B 2 O 3 +SiO 2 ,
0.1-30 mole % TeO 2 +V 2 O 5 +Sb 2 O 5 +P 2 O 5 ,
0.1-20 mole % MgO+CaO+BaO+SrO, and
0.1-20 mole % F,
an alkaline earth silicate glass frit comprising:
15-75 mole % BaO+CaO+SrO+MgO,
5-75 mole % B 2 O 3 +SiO 2 ,
0.1-55 mole % ZnO,
0.1-40 mole % Li 2 O+Na 2 O+K 2 O+Cs 2 O+Rb 2 O, and
0.1-20 mole % TiO 2 +ZrO 2 ,
a magnesium silicate glass frit comprising:
15-75 mole % MgO,
5-75 mole % B 2 O 3 +SiO 2 ,
0.1-55 mole % ZnO,
0.1-40 mole % Li 2 O+Na 2 O+K 2 O+Cs 2 O+Rb 2 O, and
0.1-20 mole % TiO 2 +ZrO 2 ,
a calcium silicate glass frit comprising:
15-75 mole % CaO,
5-75 mole % B 2 O 3 +SiO 2 ,
0.1-55 mole % ZnO,
0.1-40 mole % Li 2 O+Na 2 O+K 2 O+Cs 2 O+Rb 2 O, and
0.1-20 mole % TiO 2 +ZrO 2 ,
a strontium silicate glass frit comprising:
15-75 mole % SrO,
5-75 mole % B 2 O 3 +SiO 2 ,
0.1-55 mole % ZnO,
0.1-40 mole % Li 2 O+Na 2 O+K 2 O+Cs 2 O+Rb 2 O, and
0.1-20 mole % TiO 2 +ZrO 2 ,
a barium silicate glass frit comprising:
15-75 mole % BaO,
5-75 mole % B 2 O 3 +SiO 2 ,
0.1-55 mole % ZnO,
0.1-40 mole % Li 2 O+Na 2 O+K 2 O+Cs 2 O+Rb 2 O, and
0.1-20 mole % TiO 2 +ZrO 2 , and
combinations thereof.
15. The method according to claim 10 , wherein the solids portion further comprises 0.1-10 wt % particles having an average size of from 10 nm to 30 um, and
wherein the particles are selected from the group consisting of hollow silica spheres, hollow glass particles, porous silicate glass particles, porous organosilicate glass particles, xerogel particles, aerogel particles, mica particles, zeolite particles, and combinations thereof.
16. The method according to claim 10 , wherein the solids portion includes 10-95 wt % silica powder and 5-90 wt % glass component.
17. The method according to claim 10 , wherein the solids portion further includes 0.1-30 wt % of an additive including one or more of:
a) nano-sized silica having a D50 particle size of 5-500 nm,
b) Al 2 O 3 powder,
c) ZrO 2 powder,
d) TiO 2 powder,
e) SiC powder,
i) Si 3 N 4 powder,
j) Y 2 O 3 powder, or
f) MgO powder.